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Jason A. Kenney, Ph.D. - Publications

Affiliations: 
2006 Chemical Engineering University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
Chemical Engineering
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19 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2018 Wang J, Tian W, Rauf S, Sadighi S, Kenney J, Stout P, Vidyarthi VS, Guo J, Zhou T, Delfin K, Lundy N, Pandey SC, Guo S, Sandhu GS. A model for etching of three-dimensional high aspect ratio silicon structures in pulsed inductively coupled plasmas Plasma Sources Science and Technology. 27: 94003. DOI: 10.1088/1361-6595/Aadb4B  0.392
2017 Agarwal A, Bera K, Kenney J, Likhanskii A, Rauf S. Modeling of low pressure plasma sources for microelectronics fabrication Journal of Physics D. 50: 424001. DOI: 10.1088/1361-6463/Aa88F0  0.443
2017 Dorf L, Wang J, Rauf S, Monroy GA, Zhang Y, Agarwal A, Kenney J, Ramaswamy K, Collins K. Etching with atomic precision by using low electron temperature plasma Journal of Physics D. 50: 274003. DOI: 10.1088/1361-6463/Aa7357  0.424
2016 Dorf L, Wang J-, Rauf S, Zhang Y, Agarwal A, Kenney J, Ramaswamy K, Collins K. Atomic precision etch using a low-electron temperature plasma Proceedings of Spie. 9782. DOI: 10.1117/12.2222309  0.414
2014 Agarwal A, Kenney JA, Rauf S, Collins K. Fully self-consistent 3-D modeling of inductively coupled plasmas Ieee Transactions On Plasma Science. 42: 2832-2833. DOI: 10.1109/Tps.2014.2336881  0.39
2013 Rauf S, Dorf L, Kenney J, Collins K. Energy distribution of electron flux at electrodes in a low pressure capacitively coupled plasma Journal of Applied Physics. 113: 023306. DOI: 10.1063/1.4774306  0.331
2011 Chen Z, Kenney J, Rauf S, Collins K, Tanaka T, Hammond N, Kudela J. Effect of segmenting powered electrode on plasma uniformity in large-area capacitively coupled plasma discharge Ieee Transactions On Plasma Science. 39: 2526-2527. DOI: 10.1109/Tps.2011.2157118  0.429
2011 Kenney JA, Rauf S, Collins K. Capacitively coupled plasma with an asymmetric dielectric plate Ieee Transactions On Plasma Science. 39: 2524-2525. DOI: 10.1109/Tps.2011.2132148  0.443
2010 Bera K, Rauf S, Kenney J, Dorf L, Collins K. Influence of inhomogeneous magnetic field on the characteristics of very high frequency capacitively coupled plasmas Journal of Applied Physics. 107: 053302. DOI: 10.1063/1.3296349  0.357
2009 Kenney JA, Rauf S, Collins K. Effect of azimuthally asymmetric reactor components on a parallel plate capacitively coupled plasma Journal of Applied Physics. 106. DOI: 10.1063/1.3259420  0.441
2009 Rauf S, Kenney J, Collins K. Three-dimensional model of magnetized capacitively coupled plasmas Journal of Applied Physics. 105: 103301. DOI: 10.1063/1.3126718  0.428
2008 Kenney JA, Paek E, Hwang GS. Stochastic plasma charging of nanopatterned dielectric surfaces Ieee Transactions On Plasma Science. 36: 878-879. DOI: 10.1109/Tps.2008.927030  0.592
2008 Kenney JA, Rauf S, Collins K. Capacitively coupled plasma with widely spaced confinement grid Ieee Transactions On Plasma Science. 36: 1364-1365. DOI: 10.1109/Tps.2008.917787  0.385
2007 Kenney JA, Hwang GS. Prediction of stochastic behavior in differential charging of nanopatterned dielectric surfaces during plasma processing Journal of Applied Physics. 101. DOI: 10.1063/1.2433134  0.578
2006 Kenney JA, Hwang GS. Computational analysis of intratool interactions in electrochemical micromachining with multitip tool electrodes Electrochemical and Solid-State Letters. 9. DOI: 10.1149/1.2214359  0.497
2006 Kenney JA, Hwang GS. Etch trends in electrochemical machining with ultrashort voltage pulses Electrochemical and Solid-State Letters. 9. DOI: 10.1149/1.2136250  0.515
2005 Kenney JA, Hwang GS. Electrochemical machining with ultrashort voltage pulses: modelling of charging dynamics and feature profile evolution. Nanotechnology. 16: S309-13. PMID 21727446 DOI: 10.1088/0957-4484/16/7/001  0.545
2004 Kenney JA, Hwang GS, Shin W. Two-dimensional computational model for electrochemical micromachining with ultrashort voltage pulses Applied Physics Letters. 84: 3774-3776. DOI: 10.1063/1.1738937  0.541
2004 Kenney JA, Hwang GS. Two-dimensional computational model for electrochemical micromachining with ultrashort voltages pulses Proceedings - Electrochemical Society. 412-419.  0.341
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