Year |
Citation |
Score |
2012 |
Erb RM, Cherenack KH, Stahel RE, Libanori R, Kinkeldei T, Münzenrieder N, Tröster G, Studart AR. Locally reinforced polymer-based composites for elastic electronics. Acs Applied Materials & Interfaces. 4: 2860-4. PMID 22676211 DOI: 10.1021/Am300508E |
0.325 |
|
2011 |
Sturm JC, Huang Y, Han L, Liu T, Hekmatshoar B, Cherenack K, Lausecker E, Wagner S. Amorphous silicon: The other silicon 2011 12th International Conference On Ultimate Integration On Silicon, Ulis 2011. 34-37. DOI: 10.1109/ULIS.2011.5758011 |
0.54 |
|
2011 |
Münzenrieder NS, Cherenack KH, Tröster G. Testing of flexible InGaZnO-based thin-film transistors under mechanical strain Epj Applied Physics. 55. DOI: 10.1051/epjap/2011100416 |
0.32 |
|
2010 |
Cherenack K, Tröster G. The Path Towards Woven Thin-film Transistors Mrs Proceedings. 1256. DOI: 10.1557/PROC-1256-N11-19 |
0.381 |
|
2010 |
Cherenack KH, Hekmatshoar B, Sturm JC, Wagner S. Self-aligned amorphous silicon thin-film transistors fabricated on clear plastic at 300°C Ieee Transactions On Electron Devices. 57: 2381-2389. DOI: 10.1109/Ted.2010.2056132 |
0.633 |
|
2010 |
Cherenack KH, Munzenrieder NS, Troster G. Impact of mechanical bending on ZnO and IGZO thin-film transistors Ieee Electron Device Letters. 31: 1254-1256. DOI: 10.1109/LED.2010.2068535 |
0.453 |
|
2010 |
Wagner S, Han L, Hekmatshoar B, Song K, Mandlik P, Cherenack KH, Sturm JC. 61.3: Amorphous silicon TFT technology for rollable OLED displays 48th Annual Sid Symposium, Seminar, and Exhibition 2010, Display Week 2010. 2: 917-920. |
0.704 |
|
2010 |
Wagner S, Han L, Hekmatshoar B, Song K, Mandlik P, Cherenack KH, Sturm JC. 61.3: Amorphous silicon TFT technology for rollable OLED displays 48th Annual Sid Symposium, Seminar, and Exhibition 2010, Display Week 2010. 2: 917-920. |
0.664 |
|
2009 |
Cherenack KH, Kattamis AZ, Hekmatshoar B, Sturm JC, Wagner S. Amorphous Silicon Thin-Film Transistors made on Clear Plastic at 300 °C Journal of the Korean Physical Society. 54: 415-420. DOI: 10.3938/Jkps.54.415 |
0.65 |
|
2009 |
Sturm JC, Hekmatshoar B, Cherenack K, Wagner S. 65.1 : Invited Paper: Amorphous Silicon TFT's with 100-Year Lifetimes in a Clear Plastic Compatible Process for AMOLEDs Sid Symposium Digest of Technical Papers. 40: 979. DOI: 10.1889/1.3256963 |
0.477 |
|
2009 |
Han L, Mandlik P, Cherenack KH, Wagner S. Amorphous silicon thin-film transistors with field-effect mobilities of 2 cm2 /V s for electrons and 0.1 cm2 /V s for holes Applied Physics Letters. 94. DOI: 10.1063/1.3119636 |
0.719 |
|
2009 |
Cherenack KH, Kattamis AZ, Hekmatshoar B, Sturm JC, Wagner S. Amorphous silicon thin-film transistors made on clear plastic at 300°C Journal of the Korean Physical Society. 54: 415-420. |
0.615 |
|
2008 |
Hekmatshoar B, Kattamis AZ, Cherenack K, Wagner S, Sturm JC. A novel TFT-OLED integration for OLED-independent pixel programming in amorphous-Si AMOLED pixels Journal of the Society For Information Display. 16: 183-188. DOI: 10.1889/1.2835027 |
0.57 |
|
2008 |
Kattamis AZ, Cherenack KH, Cheng I, Long K, Sturm JC, Wagner S. Fracture Mechanisms of SiN x Thin-films on Compliant Substrates Mrs Proceedings. 1078. DOI: 10.1557/Proc-1078-M14-02 |
0.612 |
|
2008 |
Cherenack KH, Kattamis AZ, Hekmatshoar B, Sturm JC, Wagner S. Self-aligned amorphous silicon thin film transistors with mobility above 1 cm 2V -1s -1 fabricated at 300° C on clear plastic substrates Materials Research Society Symposium Proceedings. 1066: 471-476. DOI: 10.1557/Proc-1066-A20-03 |
0.605 |
|
2008 |
Chen JZ, Cherenack K, Tsay C, Cheng I, Wagner S. Effects of SiN x Passivation and Gate Metal Roughness on the Performance of On-plastic a-Si : H TFTs Electrochemical and Solid State Letters. 11. DOI: 10.1149/1.2812443 |
0.637 |
|
2008 |
Hekmatshoar B, Kattamis AZ, Cherenack KH, Long K, Chen JZ, Wagner S, Sturm JC, Rajan K, Hack M. Reliability of active-matrix organic light-emitting-diode arrays with amorphous silicon thin-film transistor backplanes on clear plastic Ieee Electron Device Letters. 29: 63-66. DOI: 10.1109/Led.2007.910800 |
0.614 |
|
2008 |
Hekmatshoar B, Cherenack KH, Wagner S, Sturm JC. Amorphous silicon thin-film transistors with DC saturation current half-life of more than 100 years Technical Digest - International Electron Devices Meeting, Iedm. DOI: 10.1109/IEDM.2008.4796621 |
0.555 |
|
2008 |
Hekmatshoar B, Cherenack K, Long K, Kattamis A, Wagner S, Sturm JC. Amoled reliability with a-si tft's in normal vs. inverted TFT/OLED integration scheme Device Research Conference - Conference Digest, Drc. 243-244. DOI: 10.1109/DRC.2008.4800822 |
0.47 |
|
2008 |
Hekmatshoar B, Cherenack KH, Kattamis AZ, Long K, Wagner S, Sturm JC. Highly stable amorphous-silicon thin-film transistors on clear plastic Applied Physics Letters. 93. DOI: 10.1063/1.2963481 |
0.662 |
|
2008 |
Kattamis AZ, Cherenack KH, Cheng IC, Long K, Sturm JC, Wagner S. Fracture mechanisms of sink thin-films on compliant substrates Materials Research Society Symposium Proceedings. 1078: 16-21. |
0.464 |
|
2007 |
Cherenack KH, Kattamis AZ, Hekmatshoar B, Sturm JC, Wagner S. Amorphous-silicon thin-film transistors fabricated at 300 °C on a free-standing foil substrate of clear plastic Ieee Electron Device Letters. 28: 1004-1006. DOI: 10.1109/Led.2007.907411 |
0.636 |
|
2007 |
Kattamis AZ, Cherenack KH, Hekmatshoar B, Cheng IC, Gleskova H, Sturm JC, Wagner S. Effect of SiNx gate dielectric deposition power and temperature on a-Si:H TFT stability Ieee Electron Device Letters. 28: 606-608. DOI: 10.1109/Led.2007.900078 |
0.675 |
|
2007 |
Kattamis AZ, Cheng IC, Long K, Hekmatshoar B, Cherenack KH, Wagner S, Sturm JC, Venugopal SM, Loy DE, O'Rourke SM, Allee DR. Amorphous silicon thin-film transistor backplanes deposited at 200 °C on clear plastic for lamination to electrophoretic displays Ieee/Osa Journal of Display Technology. 3: 304-308. DOI: 10.1109/Jdt.2007.900935 |
0.669 |
|
2007 |
Hekmatshoar B, Kattamis AZ, Cherenack K, Wagner S, Sturm JC. Novel amorphous-Si AMOLED pixels with OLED-independent turn-on voltage and driving current 65th Drc Device Research Conference. 95-96. DOI: 10.1109/DRC.2007.4373666 |
0.515 |
|
2007 |
Cheng IC, Wagner S, Kattamis AZ, Hekmatshoar B, Cherenack KH, Gleskova H, Sturm JC. Amorphous silicon thin film transistor backplanes fabricated at high temperature for flexible displays Idmc 2007 - International Display Manufacturing Conference and Fpd Expo - Proceedings. 311-314. |
0.501 |
|
2006 |
Cherenack K, Kattamis A, Long K, Cheng I, Wagner S, Sturm JC. SiNx barrier layers deposited at 250°C on a clear polymer substrate Mrs Proceedings. 936: 7-12. DOI: 10.1557/Proc-0936-L01-05 |
0.601 |
|
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