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Kenneth A Goldberg, Ph.D. - Publications

Affiliations: 
1992-1997 Physics University of California, Berkeley, Berkeley, CA, United States 
Area:
Short-wavelength optics, synchrotron instrumentation, interferometry, imaging, EUV Lithography
Website:
http://goldberg.lbl.gov
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Year Citation  Score
2020 Sanchez Del Rio M, Wojdyla A, Goldberg KA, Cutler GD, Cocco D, Padmore HA. Compensation of heat load deformations using adaptive optics for the ALS upgrade: a wave optics study. Journal of Synchrotron Radiation. 27: 1141-1152. PMID 32876588 DOI: 10.1107/S1600577520009522  0.404
2020 Goldberg KA, Bryant D, Wojdyla A, Helmbrecht M, Gullikson E. Reflective binary amplitude grating for soft x-ray shearing and Hartmann wavefront sensing. Optics Letters. 45: 4694-4697. PMID 32870834 DOI: 10.1364/Ol.398737  0.392
2020 Cocco D, Hardin C, Morton D, Lee L, Ng ML, Zhang L, Assoufid L, Grizolli W, Shi X, Walko DA, Cutler G, Goldberg KA, Wojdyla A, Idir M, Huang L, et al. Adaptive shape control of wavefront-preserving X-ray mirrors with active cooling and heating. Optics Express. 28: 19242-19254. PMID 32672205 DOI: 10.1364/Oe.394310  0.36
2020 Gunjala G, Wojdyla A, Sherwin S, Shanker A, Benk MP, Goldberg KA, Naulleau PP, Waller L. Extreme ultraviolet microscope characterization using photomask surface roughness. Scientific Reports. 10: 11673. PMID 32669602 DOI: 10.1038/S41598-020-68588-W  0.421
2017 Naulleau PP, Benk M, Goldberg KA, Gullikson EM, Wojdyla A, Wang YG, Neureuther A. Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging. Applied Optics. 56: 3325-3328. PMID 28430243 DOI: 10.1364/Ao.56.003325  0.333
2017 Levinson Z, Burbine A, Verduijn E, Wood O, Goldberg KA, Benk MP, Wojdyla A, Smith BW. Image-based pupil plane characterization via a space-domain basis Journal of Micro-Nanolithography Mems and Moems. 16: 23509-23509. DOI: 10.1117/1.Jmm.16.2.023509  0.415
2016 Goldberg KA, Yashchuk VV. Optimized mirror shape tuning using beam weightings based on distance, angle of incidence, reflectivity, and power. The Review of Scientific Instruments. 87: 051805. PMID 27250372 DOI: 10.1063/1.4950747  0.353
2016 Shanker A, Wojdyla A, Gunjala G, Dong J, Benk M, Neureuther A, Goldberg K, Waller L. Off-axis Aberration Estimation in an EUV Microscope Using Natural Speckle Rundbrief Der Gi-Fachgruppe 5.10 Informationssystem-Architekturen. DOI: 10.1364/Isa.2016.Ith1F.2  0.361
2016 Levinson Z, Burbine A, Verduijn E, Wood O, Mangat P, Goldberg KA, Benk MP, Wojdyla A, Smith BW. Image-Based Pupil Plane Characterization via Principal Component Analysis for EUVL Tools Proceedings of Spie. 9776: 977618. DOI: 10.1117/12.2219745  0.347
2016 Wojdyla A, Donoghue A, Benk MP, Naulleau PP, Goldberg KA. Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks Proceedings of Spie - the International Society For Optical Engineering. 9776. DOI: 10.1117/12.2219513  0.429
2016 Benk MP, Wojdyla A, Chao W, Salmassi F, Oh S, Wang YG, Miyakawa RH, Naulleau PP, Goldberg KA. Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope Journal of Micro/ Nanolithography, Mems, and Moems. 15. DOI: 10.1117/1.Jmm.15.3.033501  0.474
2016 Levinson Z, Verduijn E, Wood OR, Mangat P, Goldberg KA, Benk MP, Wojdyla A, Smith BW. Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology Journal of Micro-Nanolithography Mems and Moems. 15: 23508-23508. DOI: 10.1117/1.Jmm.15.2.023508  0.387
2016 Assoufid L, Goldberg K, Yashchuk VV. Preface: The 5th International Workshop on X-ray Mirror Design, Fabrication, and Metrology Review of Scientific Instruments. 87. DOI: 10.1063/1.4950776  0.326
2015 Naulleau P, Anderson C, Chau W, Goldberg K, Wojdyla A, Bhattarai S, Neureuther A, Goodwin F, Neisser M. Enabling euv resist research at the 1x and smaller regime Journal of Photopolymer Science and Technology. 28: 789-794. DOI: 10.2494/Photopolymer.28.777  0.411
2015 Claus RA, Wang Y, Benk MP, Goldberg KA, Naulleau PP, Neureuther AR, Waller L. Partially Coherent Quantitative Phase Retrieval for EUV Lithography Rundbrief Der Gi-Fachgruppe 5.10 Informationssystem-Architekturen. DOI: 10.1364/Isa.2015.Ith2A.4  0.302
2015 Mochi I, Goldberg KA. Modal wavefront reconstruction from its gradient Applied Optics. 54: 3780-3785. DOI: 10.1364/Ao.54.003780  0.317
2015 Mangat P, Verduijn E, Wood OR, Benk MP, Wojdyla A, Goldberg KA. Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging Proceedings of Spie - the International Society For Optical Engineering. 9658. DOI: 10.1117/12.2201048  0.333
2015 Goldberg KA, Benk MP, Wojdyla A, Johnson DG, Donoghue AP. New ways of looking at masks with the SHARP EUV microscope Proceedings of Spie - the International Society For Optical Engineering. 9422. DOI: 10.1117/12.2175553  0.494
2015 Wang YG, Miyakawa R, Chao W, Benk M, Wojdyla A, Donoghue A, Johnson D, Goldberg K, Neureuther A, Liang T, Naulleau P. Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection Proceedings of Spie - the International Society For Optical Engineering. 9422. DOI: 10.1117/12.2087532  0.359
2015 Claus RA, Wojdyla A, Benk MP, Goldberg KA, Neureuther AR, Naulleau PP, Waller L. Aberration estimation using EUV mask roughness Proceedings of Spie - the International Society For Optical Engineering. 9422. DOI: 10.1117/12.2087513  0.378
2015 Claus RA, Wang YG, Wojdyla A, Benk MP, Goldberg KA, Neureuther AR, Naulleau PP, Waller L. Phase measurements of EUV mask defects Proceedings of Spie - the International Society For Optical Engineering. 9422. DOI: 10.1117/12.2087195  0.374
2015 Levinson Z, Raghunathan S, Verduijn E, Wood O, Mangat P, Goldberg K, Benk M, Wojdyla A, Philipsen V, Hendrickx E, Smith BW. A method of image-based aberration metrology for EUVL tools Proceedings of Spie - the International Society For Optical Engineering. 9422. DOI: 10.1117/12.2087177  0.336
2015 Yan PY, Zhang G, Gullikson EM, Goldberg KA, Benk MP. Understanding EUV mask blank surface roughness induced LWR and associated roughness requirement Proceedings of Spie - the International Society For Optical Engineering. 9422. DOI: 10.1117/12.2087041  0.325
2015 Upadhyaya M, Jindal V, Basavalingappa A, Herbol H, Harris-Jones J, Jang IY, Goldberg KA, Mochi I, Marokkey S, Demmerle W, Pistor TV, Denbeaux G. Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach Journal of Micro/ Nanolithography, Mems, and Moems. 14. DOI: 10.1117/1.Jmm.14.2.023505  0.317
2015 Benk MP, Miyakawa RH, Chao W, Wang YG, Wojdyla A, Johnson DG, Donoghue AP, Goldberg KA. Broader view on extreme ultraviolet masks: Adding complementary imaging modes to the SHARP microscope Journal of Micro/ Nanolithography, Mems, and Moems. 14. DOI: 10.1117/1.Jmm.14.1.013507  0.417
2015 Benk MP, Goldberg KA, Wojdyla A, Anderson CN, Salmassi F, Naulleau PP, Kocsis M. Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 33. DOI: 10.1116/1.4929509  0.461
2015 Upadhyaya M, Basavalingappa A, Herbol H, Denbeaux G, Jindal V, Harris-Jones J, Jang IY, Goldberg KA, Mochi I, Marokkey S, Demmerle W, Pistor TV. Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 33. DOI: 10.1116/1.4913315  0.334
2014 Yamazoe K, Mochi I, Goldberg KA. Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 31: B34-43. PMID 25606778 DOI: 10.1364/Josaa.31.000B34  0.403
2014 Naulleau PP, Anderson CN, Anderson EH, Andreson N, Chao W, Choi C, Goldberg KA, Gullikson EM, Kim SS, Lee D, Miyakawa R, Park J, Rekawa S, Salmassi F. Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source. Optics Express. 22: 20144-54. PMID 25321224 DOI: 10.1364/Oe.22.020144  0.489
2014 Yamazoe K, Mochi I, Goldberg KA. Gradient descent algorithm applied to wavefront retrieval from through-focus images by an extreme ultraviolet microscope with partially coherent source Journal of the Optical Society of America a: Optics and Image Science, and Vision. 31: B34-B43. DOI: 10.1364/JOSAA.31.000B34  0.316
2014 Goldberg KA, Benk MP, Wojdyla A, Mochi I, Rekawa SB, Allezy AP, Dickinson MR, Cork CW, Chao W, Zehm DJ, Macdougall JB, Naulleau PP, Rudack A. Actinic mask imaging: Recent results and future directions from the SHARP EUV microscope Proceedings of Spie - the International Society For Optical Engineering. 9048. DOI: 10.1117/12.2048364  0.437
2014 Raghunathan S, Wood OR, Mangat P, Verduijn E, Philipsen V, Hendrickx E, Jonckheere R, Goldberg KA, Benk MP, Kearney P, Levinson Z, Smith BW. Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 32. DOI: 10.1116/1.4901876  0.418
2013 Mochi I, Goldberg KA, Benk MP, Naulleau PP. Pupil shaping and coherence control in an EUV mask-imaging microscope Proceedings of Spie - the International Society For Optical Engineering. 8880. DOI: 10.1117/12.2026498  0.374
2013 Goldberg KA, Mochi I, Benk MP, Lin C, Allezy A, Dickinson M, Cork CW, Macdougall JB, Anderson EH, Chao W, Salmassi F, Gullikson EM, Zehm D, Vytla V, Cork W, et al. The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope Proceedings of Spie - the International Society For Optical Engineering. 8880. DOI: 10.1117/12.2026496  0.345
2013 Goldberg KA, Mochi I, Benk M, Allezy AP, Dickinson MR, Cork CW, Zehm D, MacDougall JB, Anderson E, Salmassi F, Chao WL, Vytla VK, Gullikson EM, DePonte JC, Gideon Jones MS, et al. Commissioning an EUV mask microscope for lithography generations reaching 8 nm Proceedings of Spie - the International Society For Optical Engineering. 8679. DOI: 10.1117/12.2011688  0.451
2013 Merthe DJ, Yashchuk VV, Goldberg KA, Kunz M, Tamura N, McKinney WR, Artemiev NA, Celestre RS, Morrison GY, Anderson EH, Smith BV, Domning EE, Rekawa SB, Howard AP. Methodology for optimal in situ alignment and setting of bendable optics for nearly diffraction-limited focusing of soft x-rays Optical Engineering. 52. DOI: 10.1117/1.OE.52.3.033603  0.34
2013 Goldberg KA, Yashchuk VV, Artemiev NA, Celestre R, Chao W, Gullikson EM, Lacey I, McKinney WR, Merthe D, Padmore HA. Metrology for the Advancement of X-ray Optics at the ALS Synchrotron Radiation News. 26: 4-12. DOI: 10.1080/08940886.2013.832583  0.374
2013 Merthe DJ, Goldberg KA, Yashchuk VV, McKinney WR, Celestre R, Mochi I, MacDougall J, Morrison GY, Rekawa SB, Anderson E, Smith BV, Domning EE, Padmore H. In situ fine tuning of bendable soft x-ray mirrors using a lateral shearing interferometer Nuclear Instruments and Methods in Physics Research, Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 710: 82-86. DOI: 10.1016/J.Nima.2012.10.105  0.356
2012 McKinney WR, Yashchuk VV, Merthe DJ, Artemiev NA, Goldberg K. Ex situ tuning of bendable x-ray mirrors for optimal beamline performance Proceedings of Spie - the International Society For Optical Engineering. 8501. DOI: 10.1117/12.930156  0.436
2012 Merthe DJ, Yashchuk VV, Goldberg KA, Kunz M, Tamura N, Mckinney WR, Artemiev NA, Celestre RS, Morrison GY, Anderson E, Smith BV, Domning EE, Rekawa SB, Padmore HA. Methodology for optimal in situ alignment and setting of bendable optics for diffraction-limited focusing of soft x-rays Proceedings of Spie - the International Society For Optical Engineering. 8501. DOI: 10.1117/12.930023  0.34
2012 Yan PY, Mochi I, Goldberg K. EUV actinic imaging tool aerial image evaluation of EUVL embedded phase shift mask performance Proceedings of Spie - the International Society For Optical Engineering. 8322. DOI: 10.1117/12.919710  0.458
2012 Anderson C, Ashworth D, Baclea-An LM, Bhattari S, Chao R, Claus R, Denham P, Goldberg K, Grenville A, Jones G, Miyakawa R, Murayama K, Nakagawa H, Rekawa S, Stowers J, et al. The SEMATECH Berkeley MET: Demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm Proceedings of Spie - the International Society For Optical Engineering. 8322. DOI: 10.1117/12.917386  0.394
2012 Kwon HJ, Harris-Jones J, Cordes A, Satake M, Li Y, Mochi I, Goldberg KA. EUV mask multilayer defects and their printability under different multilayer deposition conditions Proceedings of Spie - the International Society For Optical Engineering. 8322. DOI: 10.1117/12.916374  0.348
2012 Kim TG, Seo HS, Kang IY, Jeong CY, Huh S, Na J, Kim SS, Jeon CU, Mochi I, Goldberg KA. Printability study of pattern defects in the EUV mask as a function of hp nodes Proceedings of Spie - the International Society For Optical Engineering. 8322. DOI: 10.1117/12.916052  0.321
2011 Naulleau PP, Mochi I, Goldberg KA. Optical modeling of Fresnel zoneplate microscopes. Applied Optics. 50: 3678-84. PMID 21743581 DOI: 10.1364/Ao.50.003678  0.486
2011 McKinney WR, Yashchuk VV, Goldberg KA, Howells M, Artemiev NA, Merthe DJ, Yuan S. Design optimization of bendable x-ray mirrors Proceedings of Spie. 8141. DOI: 10.1117/12.894175  0.405
2011 Merthe DJ, Goldberg KA, Yashchuk VV, Yuan S, McKinney WR, Celestre R, Mochi I, Macdougall J, Morrison GY, Rakawa SB, Anderson E, Smith BV, Domning EE, Warwick T, Padmore H. An experimental apparatus for diffraction-limited soft x-ray nano-focusing Proceedings of Spie. 8139: 813907. DOI: 10.1117/12.894116  0.457
2011 Naulleau PP, Anderson CN, Baclea-An LM, Denham P, George S, Goldberg KA, Jones G, McClinton B, Miyakawa R, Rekawa S, Smith N. Critical challenges for EUV resist materials Proceedings of Spie - the International Society For Optical Engineering. 7972. DOI: 10.1117/12.882955  0.41
2011 Mochi I, Goldberg KA, Xie R, Yan P, Yamazoe K. Quantitative evaluation of mask phase defects from through-focus EUV aerial images Proceedings of Spie. 7969. DOI: 10.1117/12.881652  0.381
2011 Goldberg KA, Mochi I, Rekawa SB, Smith NS, MacDougall JB, Naulleau PP. An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.881651  0.494
2011 Anderson CN, Baclea-An LM, Denham PE, George SA, Goldberg KA, Jones MS, Smith NS, Wallow TI, Montgomery W, Naulleau PP. The SEMATECH Berkeley MET: Extending EUV learning to 16-nm half pitch Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.881573  0.509
2011 George SA, Naulleau PP, Gullikson EM, Mochi I, Salmassi F, Goldberg KA, Anderson EH. Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.881524  0.41
2011 Huh S, Kang I, Kim S, Seo H, Kim D, Park J, Kim S, Cho H, Goldberg K, Mochi I, Shoki T, Inderhees G. Printability and Inspectability of Defects on the EUV Mask for sub32nm Half Pitch HVM Application Proceedings of Spie. 7969: 796902. DOI: 10.1117/12.879384  0.337
2011 Goldberg KA, Mochi I. Actinic characterization of extreme ultraviolet bump-type phase defects Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 29. DOI: 10.1116/1.3653257  0.366
2011 Naulleau P, McClinton B, Goldberg KA, Mochi I, Rastegar A. Mask roughness challenges in extreme ultraviolet mask development Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 29. DOI: 10.1116/1.3632989  0.359
2011 Boogaard AJRvd, Louis E, Zoethout E, Goldberg KA, Bijkerk F. Characterization of Mo/Si multilayer growth on stepped topographies Journal of Vacuum Science & Technology B. 29: 51803. DOI: 10.1116/1.3628640  0.312
2011 Yuan SS, Yashchuk VV, Goldberg KA, Celestre R, McKinney WR, Morrison GY, Warwick T, Padmore HA. Development of in situ, at-wavelength metrology for soft X-ray nano-focusing Nuclear Instruments & Methods in Physics Research Section a-Accelerators Spectrometers Detectors and Associated Equipment. 649: 160-162. DOI: 10.1016/J.Nima.2010.10.134  0.43
2010 Brizuela F, Carbajo S, Sakdinawat A, Alessi D, Martz DH, Wang Y, Luther B, Goldberg KA, Mochi I, Attwood DT, La Fontaine B, Rocca JJ, Menoni CS. Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks. Optics Express. 18: 14467-73. PMID 20639931 DOI: 10.1364/Oe.18.014467  0.499
2010 Yuan SS, Goldberg KA, Yashchuk VV, Celestre R, Mochi I, Macdougall J, Morrison GY, Smith BV, Domning EE, McKinney WR, Warwick T. At-wavelength optical metrology development at the ALS Proceedings of Spie. 7801. DOI: 10.1117/12.859946  0.403
2010 Naulleau P, Anderson CN, Baclea-An LM, Chan D, Denham P, George S, Goldberg KA, Hoef B, Jones G, Koh C, La Fontaine B, McClinton B, Miyakawa R, Montgomery W, Rekawa S, et al. The SEMATECH Berkeley MET pushing EUV development beyond 22nm half pitch Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.848438  0.467
2010 Kang I, Seo H, Ahn B, Lee D, Kim D, Huh S, Koh C, Cha B, Kim S, Cho H, Mochi I, Goldberg K. Printability and inspectability of programmed pit defects on the masks in EUV lithography Proceedings of Spie. 7636. DOI: 10.1117/12.847956  0.372
2010 Rastegar A, Eichenlaub S, Kadaksham AJ, Lee B, House M, Huh S, Cha B, Yun H, Mochi I, Goldberg K. Particle removal challenges of EUV patterned masks for the sub-22nm HP node Proceedings of Spie. 7636. DOI: 10.1117/12.847056  0.352
2010 Fan YJ, Yankulin L, Thomas P, Mbanaso C, Antohe A, Garg R, Wang Y, Murray T, Wüest A, Goodwin F, Huh S, Cordes A, Naulleau P, Goldberg K, Mochi I, et al. Carbon contamination topography analysis of EUV masks Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.846996  0.348
2010 Huh S, Ren L, Chan D, Wurm S, Goldberg K, Mochi I, Nakajima T, Kishimoto M, Ahn B, Kang I, Park JO, Cho K, Han SI, Laursen T. A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.846922  0.318
2010 Mochi I, Goldberg KA, Fontaine BL, Tchikoulaeva A, Holfeld C. Actinic imaging of native and programmed defects on a full-field mask Proceedings of Spie. 7636. DOI: 10.1117/12.846670  0.419
2010 Boogaard AJRvd, Louis E, Goldberg KA, Mochi I, Bijkerk F. EUV-multilayers on grating-like topographies Proceedings of Spie. 7636. DOI: 10.1117/12.846564  0.347
2010 Wintz DT, Goldberg KA, Mochi I, Huh S. Photon flux requirements for EUV reticle imaging microscopy in the 22- and 16nm nodes Proceedings of Spie. 7636. DOI: 10.1117/12.846528  0.472
2010 Miyakawa R, Naulleau P, Zakhor A, Goldberg K. Iterative procedure for in-situ optical testing with an incoherent source Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.846235  0.468
2010 Wintz DT, Goldberg KA, Mochi I, Huh S. Photon flux requirements for extreme ultraviolet reticle imaging in the 22- and 16-nm nodes Journal of Micro-Nanolithography Mems and Moems. 9: 41205. DOI: 10.1117/1.3491512  0.445
2010 George SA, Naulleau PP, Mochi I, Salmassi F, Gullikson EM, Goldberg KA, Anderson EH. Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C6E23-C6E30. DOI: 10.1116/1.3502436  0.408
2010 Goldberg KA, Mochi I. Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28. DOI: 10.1116/1.3498757  0.374
2010 Mochi I, Goldberg KA, Huh S. Actinic imaging and evaluation of phase structures on extreme ultraviolet lithography masks Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28. DOI: 10.1116/1.3498756  0.36
2010 Fan YJ, Yankulin L, Antohe A, Thomas P, Mbanaso C, Garg R, Wang Y, Wüest A, Goodwin F, Huh S, Naulleau P, Goldberg K, Mochi I, Denbeaux G. Effect of carbon contamination on the printing performance of extreme ultraviolet masks Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 321-328. DOI: 10.1116/1.3333434  0.366
2010 Carbajo S, Brizuela F, Martz DH, Alessi D, Wang Y, Marconi MC, Rocca JJ, Menoni CS, Sakdinawat A, Anderson E, Goldberg KA, Attwood DT, La Fontaine B. Laser based aerial microscope for at-wavelength characterization of extreme ultraviolet lithography masks 2010 23rd Annual Meeting of the Ieee Photonics Society, Photinics 2010. 584-585. DOI: 10.1109/Photonics.2010.5699022  0.42
2009 Brizuela F, Wang Y, Brewer CA, Pedaci F, Chao W, Anderson EH, Liu Y, Goldberg KA, Naulleau P, Wachulak P, Marconi MC, Attwood DT, Rocca JJ, Menoni CS. Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination. Optics Letters. 34: 271-3. PMID 19183628 DOI: 10.1364/Ol.34.000271  0.476
2009 Brizuela F, Wang Y, Brewer CA, Pedaci F, Chao W, Anderson EH, Liu Y, Goldberg KA, Naulleau P, Wachulak P, Marconi MC, Attwood DT, Rocca JJ, Menoni CS. Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination Optics Letters. 34: 271-273. DOI: 10.1364/OL.34.000271  0.386
2009 Menoni CS, Brizuela F, Wang Y, Brewer CA, Luther BM, Pedaci F, Wachulak PW, Marconi MC, Rocca JJ, Chao W, Anderson EH, Liu Y, Goldberg KA, Attwood DT, Vinogradov AV, et al. Advances in full field microscopy with table-top soft x-ray lasers Proceedings of Spie - the International Society For Optical Engineering. 7451. DOI: 10.1117/12.826419  0.452
2009 Goldberg KA, Mochi I, Huh S. Collecting EUV mask images through focus by wavelength tuning Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.824433  0.463
2009 Brizuela F, Wang Y, Brewer CA, Pedaci F, Chao W, Anderson EH, Liu Y, Goldberg KA, Naulleau P, Wachulak P, Marconi MC, Attwood DT, Rocca JJ, Menoni CS. Inspection 13.2 nm table-top full-field microscope Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814320  0.496
2009 Mochi I, Goldberg KA, Naulleau P, Huh S. Improving the performance of the actinic inspection tool with an optimized alignment procedure Proceedings of Spie. 7271: 727123. DOI: 10.1117/12.814261  0.448
2009 Huh S, Kearney P, Wurm S, Goodwin F, Goldberg K, Mochi I, Gullikson E. Mask defect verification using actinic inspection and defect mitigation technology Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814249  0.344
2009 Naulleau PP, Anderson CN, Baclea-an LM, Denham P, George S, Goldberg KA, Goldstein M, Hoef B, Hudyma R, Jones G, Koh C, La Fontaine B, McClinton B, Miyakawa R, Montgomery W, et al. The SEMATECH Berkeley microfield exposure tool: Learning at the 22-nm node and beyond Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814232  0.416
2009 Fan YJ, Yankulin L, Antohe A, Garg R, Thomas P, Mbanaso C, Wüest A, Goodwin F, Huh S, Naulleau P, Goldberg K, Mochi I, Denbeaux G. Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814196  0.382
2009 Clifford CH, Wiraatmadja S, Chan TT, Neureuther AR, Goldberg KA, Mochi I, Liang T. Comparison of fast 3D simulation and actinic inspection for EUV masks with buried defects Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.813846  0.431
2009 Miyakawa R, Naulleau P, Goldberg KA. Analysis of systematic errors in lateral shearing interferometry for EUV optical testing Proceedings of Spie. 7272. DOI: 10.1117/12.812340  0.399
2009 Goldberg KA, Mochi I, Naulleau P, Liang T, Yan P-, Huh S. EUV pattern defect detection sensitivity based on aerial image linewidth measurements Journal of Vacuum Science & Technology B. 27: 2916-2921. DOI: 10.1116/1.3264676  0.464
2009 Clifford CH, Wiraatmadja S, Chan TT, Neureuther AR, Goldberg KA, Mochi I, Liang T. Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2888-2893. DOI: 10.1116/1.3244624  0.376
2009 Naulleau PP, Anderson CN, Baclea-An LM, Denham P, George S, Goldberg KA, Goldstein M, Hoef B, Jones G, Koh C, La Fontaine B, Montgomery W, Wallow T. Pushing extreme ultraviolet lithography development beyond 22 nm half pitch Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2911-2915. DOI: 10.1116/1.3237092  0.464
2009 Naulleau PP, Anderson CN, Chiu J, Denham P, George S, Goldberg KA, Goldstein M, Hoef B, Hudyma R, Jones G, Koh C, Fontaine BL, Ma A, Montgomery W, Niakoula D, et al. 22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool Microelectronic Engineering. 86: 448-455. DOI: 10.1016/J.Mee.2009.03.013  0.401
2008 Goldberg KA, Mochi I, Naulleau PP, Han H, Huh S. Benchmarking EUV mask inspection beyond 0.25 NA Proceedings of Spie - the International Society For Optical Engineering. 7122. DOI: 10.1117/12.801529  0.463
2008 Naulleau PP, Anderson CN, Chiu J, Dean K, Denham P, Goldberg KA, Hoef B, Huh S, Jones G, La Fontaine B, Ma A, Niakoula D, Park JO, Wallow T. Advanced extreme ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.773833  0.349
2008 Goldberg KA, Rekawa SB, Kemp CD, Barty A, Anderson E, Kearney P, Han H. EUV mask reflectivity measurements with micron-scale spatial resolution Proceedings of Spie. 6921. DOI: 10.1117/12.772971  0.371
2008 Han H, Cho W, Goldberg KA, Gullikson EM, Jeon CU, Wurm S. Determining the critcial size of EUV mask substrate defects Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772590  0.369
2008 Goldberg KA, Naulleau P, Mochi I, Anderson EH, Rekawa SB, Kemp CD, Gunion RF, Han H-, Huh S. Actinic extreme ultraviolet mask inspection beyond 0.25numericalaperture Journal of Vacuum Science & Technology B. 26: 2220-2224. DOI: 10.1116/1.3002490  0.484
2007 Goldberg KA, Naulleau PP, Barty A, Rekawa SB, Kemp CD, Gunion RF, Salmassi F, Gullikson EM, Anderson EH, Han HS. Performance of actinic EUVL mask imaging using a zoneplate microscope Proceedings of Spie - the International Society For Optical Engineering. 6730. DOI: 10.1117/12.746756  0.485
2007 Naulleau PP, Anderson CN, Dean K, Denham P, Goldberg KA, Hoef B, La Fontaine B, Wallow T. Recent results from the Berkeley 0.3-NA EUV microfield exposure tool Proceedings of Spie - the International Society For Optical Engineering. 6517. DOI: 10.1117/12.713440  0.341
2007 Goldberg KA, Barty A, Seidel P, Edinger K, Fettig R, Kearney P, Han H, Wood OR. EUV and non-EUV inspection of reticle defect repair sites Proceedings of Spie. 6517. DOI: 10.1117/12.712202  0.328
2007 Naulleau PP, Anderson CN, Dean K, Denham P, Goldberg KA, Hoef B, Niakoula D, La Fontaine B, Wallow T. Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 2132-2135. DOI: 10.1116/1.2781522  0.406
2006 Naulleau PP, Cain JP, Goldberg KA. Lithographic characterization of the spherical error in an extreme-ultraviolet optic by use of a programmable pupil-fill illuminator. Applied Optics. 45: 1957-63. PMID 16579565 DOI: 10.1364/Ao.45.001957  0.439
2006 Naulleau P, Cain J, Dean K, Goldberg KA. Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure tool Proceedings of Spie - the International Society For Optical Engineering. 6151. DOI: 10.1117/12.656990  0.313
2006 Goldberg KA, Barty A, Liu Y, Kearney P, Tezuka Y, Terasawa T, Taylor JS, Han H, Wood OR. Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements Journal of Vacuum Science & Technology B. 24: 2824-2828. DOI: 10.1116/1.2375085  0.401
2006 Naulleau P, Goldberg KA, Cain JP, Anderson EH, Dean KR, Denham P, Hoef B, Jackson KH. Extreme ultraviolet lithography capabilities at the advanced light source using a 0.3-NA optic Ieee Journal of Quantum Electronics. 42: 44-50. DOI: 10.1109/Jqe.2005.858450  0.451
2005 Mercère P, Bucourt S, Cauchon G, Douillet D, Dovillaire G, Goldberg KA, Idir M, Levecq X, Moreno T, Naulleau PP, Rekawa S, Zeitoun P. X-ray beam metrology and X-ray optic alignment by Hartmann wavefront sensing Proceedings of Spie - the International Society For Optical Engineering. 5921: 1-10. DOI: 10.1117/12.622799  0.43
2005 Goldberg KA, Naulleau PP, Rekawa SB, Denham PE, Alexander Liddle J, Gullikson EM, Jackson KH, Anderson EH, Taylor JS, Sommargren GE, Chapman HN, Phillion DW, Johnson M, Barty A, Soufli R, et al. Ultra-high accuracy optical testing: Creating diffraction-limited short-wavelength optical systems Proceedings of Spie - the International Society For Optical Engineering. 5900: 1-10. DOI: 10.1117/12.618066  0.406
2005 Goldberg KA, Teyssier ME, Liddle JA. EUV focus sensor: Design and modeling Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 312-319. DOI: 10.1117/12.601522  0.476
2005 Naulleau P, Goldberg KA, Anderson E, Cain JP, Denham P, Hoef B, Jackson K, Morlens AS, Rekawa S, Dean K. EUV microexposures at the ALS using the 0.3-NA MET projection optics Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5751: 56-63. DOI: 10.1117/12.600388  0.386
2005 Goldberg KA, Teyssier MM, Liddle JA. Extreme ultraviolet focus sensor design optimization Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2885-2890. DOI: 10.1116/1.2134719  0.478
2005 Shumway MD, Naulleau P, Goldberg KA, Bokor J. Measuring line roughness through aerial image contrast variation using coherent exteme ultraviolet spatial filtering techniques Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2844-2847. DOI: 10.1116/1.2134717  0.763
2005 Naulleau P, Cain JP, Anderson E, Dean K, Denham P, Goldberg KA, Hoef B, Jackson K. Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2840-2843. DOI: 10.1116/1.2127940  0.366
2005 Naulleau PP, Cain JP, Goldberg KA. Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2003-2006. DOI: 10.1116/1.2037647  0.448
2004 Shumway MD, Snow EL, Goldberg KA, Naulleau P, Cao H, Chandhok M, Liddle A, Anderson E, Bokor J. EUV resist imaging below 50 nm using coherent spatial filtering techniques Proceedings of Spie - the International Society For Optical Engineering. 5374: 454-459. DOI: 10.1117/12.535666  0.756
2004 Goldberg KA, Naulleau PP, Denham PE, Rekawa SB, Jackson K, Anderson EH, Liddle JA. At-wavelength alignment and testing of the 0.3 NA MET optic Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 2956-2961. DOI: 10.1116/1.1815303  0.511
2004 Naulleau PP, Goldberg KA, Anderson E, Cain JP, Denham P, Jackson K, Morlens AS, Rekawa S, Salmassi F. Extreme ultraviolet microexposures at the advanced light source using the 0.3 numerical aperture micro-exposure tool optic Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 2962-2965. DOI: 10.1116/1.1802851  0.447
2004 Zeitoun P, Balcou P, Bucourt S, Delmotte F, Dovillaire G, Douillet D, Dunn J, Faivre G, Fajardo M, Goldberg KA, Hubert S, Hunter JR, Idir M, Jacquemot S, Kazamias S, et al. Recent developments in X-UV optics and X-UV diagnostics Applied Physics B. 78: 983-988. DOI: 10.1007/S00340-004-1430-9  0.383
2003 Mercère P, Zeitoun P, Idir M, Le Pape S, Douillet D, Levecq X, Dovillaire G, Bucourt S, Goldberg KA, Naulleau PP, Rekawa S. Hartmann wave-front measurement at 13.4 nm with lambdaEUV/120 accuracy. Optics Letters. 28: 1534-6. PMID 12956370 DOI: 10.1364/Ol.28.001534  0.383
2003 Naulleau PP, Goldberg KA, Batson P, Bokor J, Denham P, Rekawa S. Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography. Applied Optics. 42: 820-6. PMID 12593485 DOI: 10.1364/Ao.42.000820  0.608
2003 Shumway MD, Naulleau P, Goldberg KA. Resist evaluation at 50 nm in the EUV using interferometric spatial frequency doubled imaging Proceedings of Spie - the International Society For Optical Engineering. 5037: 910-916. DOI: 10.1117/12.484677  0.76
2003 Goldberg KA, Naulleau PP, Denham PE, Rekawa SB, Jackson KH, Liddle JA, Harteneck B, Gullikson E, Anderson EH. Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic Journal of Vacuum Science & Technology B. 21: 2706-2710. DOI: 10.1116/1.1627809  0.502
2003 Naulleau P, Goldberg KA, Anderson EH, Bokor J, Harteneck B, Jackson K, Olynick D, Salmassi F, Baker S, Mirkarimi P, Spiller E, Walton C, O’Connell D, Yan P, Zhang G. Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma Journal of Vacuum Science & Technology B. 21: 2697-2700. DOI: 10.1116/1.1621669  0.589
2003 Naulleau P, Goldberg KA, Anderson EH, Bokor J, Gullikson E, Harteneck B, Jackson K, Olynick D, Salmassi F, Baker S, Mirkarimi P, Spiller E, Walton C, Zhang G. Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 1286. DOI: 10.1116/1.1580839  0.487
2002 Chang C, Anderson E, Naulleau P, Gullikson E, Goldberg K, Attwood D. Direct measurement of index of refraction in the extreme-ultraviolet wavelength region with a novel interferometer. Optics Letters. 27: 1028-30. PMID 18026354 DOI: 10.1364/Ol.27.001028  0.433
2002 Goldberg KA, Naulleau P, Bokor J. Fourier transform interferometer alignment method. Applied Optics. 41: 4477-83. PMID 12153074 DOI: 10.1364/Ao.41.004477  0.518
2002 Leung AH, Tichenor DA, Replogle WC, Goldsmith JEM, Kubiak GD, Stulen RH, Ballard WP, Jefferson KL, Klebanoff LE, O'Connell DJ, Wronosky JB, Taylor JS, Folta JA, Hale LC, Chapman HN, ... ... Goldberg KA, et al. Current Status of the EUV Engineering Test Stand. Journal of Photopolymer Science and Technology. 15: 351-360. DOI: 10.2494/Photopolymer.15.351  0.44
2002 Naulleau P, Goldberg KA, Anderson EH, Attwood D, Batson P, Bokor J, Denham P, Gullikson E, Harteneck B, Hoef B, Jackson K, Olynick D, Rekawa S, Salmassi F, Blaedel K, et al. Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20: 2829. DOI: 10.1116/1.1524976  0.612
2002 Goldberg KA, Naulleau P, Bokor J, Chapman HN, Barty A. Testing extreme ultraviolet optics with visible-light and extreme ultraviolet interferometry Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20: 2834. DOI: 10.1116/1.1523401  0.605
2001 Naulleau PP, Goldberg KA, Batson PJ, Jeong S, Underwood JH. Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme-ultraviolet metrology. Applied Optics. 40: 3703-9. PMID 18360402 DOI: 10.1364/Ao.40.003703  0.422
2001 Goldberg KA, Bokor J. Fourier-transform method of phase-shift determination. Applied Optics. 40: 2886-94. PMID 18357307 DOI: 10.1364/Ao.40.002886  0.479
2001 Lee SH, Naulleau P, Goldberg KA, Cho CH, Jeong S, Bokor J. Extreme-ultraviolet lensless Fourier-transform holography. Applied Optics. 40: 2655-61. PMID 18357280 DOI: 10.1364/Ao.40.002655  0.641
2001 Tichenor DA, Ray-Chaudhuri AK, Lee SH, Chapman HN, Replogle WC, Berger KW, Stulen RH, Kubiak GD, Klebanoff LE, Wronosky JB, O'Connell DJ, Leung AH, Jefferson KL, Ballard WP, Hale LC, ... ... Goldberg KA, et al. Initial results from the EUV engineering test stand Proceedings of Spie - the International Society For Optical Engineering. 4506: 9-18. DOI: 10.1117/12.450953  0.348
2001 Shumway MD, Sang Hun Lee, Chang Hyun Cho, Naulleau P, Goldberg KA, Bokor J. Extremely fine-pitch printing with a 10x Schwarzschild optic at extreme ultraviolet wavelengths Proceedings of Spie - the International Society For Optical Engineering. 4343: 357-362. DOI: 10.1117/12.436690  0.756
2001 Tichenor DA, Ray-Chaudhuri AK, Replogle WC, Stulen RH, Kubiak GD, Rockett PD, Klebanoff LE, Jefferson KL, Leung AH, Wronosky JB, Hale LC, Chapman HN, Taylor JS, Folta JA, Montcalm C, ... ... Goldberg KA, et al. System integration and performance of the EUV engineering test stand Proceedings of Spie - the International Society For Optical Engineering. 4343: 19-37. DOI: 10.1117/12.436665  0.585
2001 Naulleau PP, Goldberg KA, Anderson EH, Batson PJ, Denham P, Jackson KH, Rekawa S, Bokor J. Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer Lawrence Berkeley National Laboratory. 4343: 639-645. DOI: 10.1117/12.436633  0.6
2001 Naulleau P, Goldberg KA, Anderson EH, Batson P, Denham PE, Jackson KH, Gullikson EM, Rekawa S, Bokor J. At-wavelength characterization of the extreme ultraviolet engineering test stand set-2 optic Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2396-2400. DOI: 10.1116/1.1421545  0.588
2001 Chapman HN, Ray-Chaudhuri AK, Tichenor DA, Replogle WC, Stulen RH, Kubiak GD, Rockett PD, Klebanoff LE, O'Connell D, Leung AH, Jefferson KL, Wronosky JB, Taylor JS, Hale LC, Blaedel K, ... ... Goldberg KA, et al. First lithographic results from the extreme ultraviolet engineering test stand Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2389-2395. DOI: 10.1116/1.1414017  0.562
2000 Lee SH, Naulleau P, Goldberg KA, Piao F, Oldham W, Bokar J. Phase-shifting point-diffraction interferometry at 193 nm Applied Optics. 39: 5768-5772. PMID 18354576 DOI: 10.1364/Ao.39.005768  0.432
2000 Naulleau P, Goldberg KA, Gullikson EM, Bokor J. At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems. Applied Optics. 39: 2941-7. PMID 18345220 DOI: 10.1364/Ao.39.002941  0.584
2000 Naulleau PP, Goldberg KA, Bokor J. Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 2939-2943. DOI: 10.1116/1.1321290  0.538
2000 Goldberg KA, Naulleau P, Batson P, Denham P, Anderson EH, Chapman H, Bokor J. Extreme ultraviolet alignment and testing of a four-mirror ring field extreme ultraviolet optical system Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18: 2911. DOI: 10.1116/1.1319703  0.609
2000 Lee SH, Bokor J, Naulleau P, Jeong ST, Goldberg KA. Extreme ultraviolet holographic microscopy and its application to extreme ultraviolet mask-blank defect characterization Journal of Vacuum Science & Technology B. 18: 2935-2938. DOI: 10.1116/1.1314382  0.62
1999 Naulleau PP, Goldberg KA, Lee SH, Chang C, Attwood D, Bokor J. Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy. Applied Optics. 38: 7252-63. PMID 18324274 DOI: 10.1364/Ao.38.007252  0.541
1999 Naulleau PP, Goldberg KA, Gullikson EM, Bokor J. Interferometric at-wavelength flare characterization of extreme ultraviolet optical systems Journal of Vacuum Science & Technology B. 17: 2987-2991. DOI: 10.1116/1.590940  0.589
1999 Goldberg KA, Naulleau PP, Bokor J. Extreme ultraviolet interferometric measurements of diffraction-limited optics Journal of Vacuum Science & Technology B. 17: 2982-2986. DOI: 10.1116/1.590939  0.61
1999 Attwood DT, Naulleau P, Goldberg KA, Tejnil E, Chang C, Beguiristain R, Batson P, Bokor J, Gullikson EM, Koike M, Medecki H, Underwood JH. Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions Ieee Journal of Quantum Electronics. 35: 709-719. DOI: 10.1109/3.760317  0.543
1998 Tejnil E, Goldberg KA, Bokor J. Phase effects owing to multilayer coatings in a two-mirror extreme-ultraviolet schwarzschild objective. Applied Optics. 37: 8021-9. PMID 18301694 DOI: 10.1364/Ao.37.008021  0.549
1998 Goldberg KA, Naulleau P, Lee S, Bresloff C, Henderson C, Attwood D, Bokor J. High-accuracy interferometry of extreme ultraviolet lithographic optical systems Journal of Vacuum Science & Technology B. 16: 3435-3439. DOI: 10.1116/1.590498  0.615
1998 Lee SH, Naulleau P, Goldberg K, Tejnil E, Medecki H, Bresloff C, Chang C, Attwood D, Bokor J. At-wavelength interferometry of extreme ultraviolet lithographic optics Characterization and Metrology For Ulsi Technology. 449: 553-557. DOI: 10.1063/1.56843  0.592
1997 Tejnil E, Goldberg KA, Lee S, Medecki H, Batson PJ, Denham PE, MacDowell AA, Bokor J, Attwood D. At-wavelength interferometry for extreme ultraviolet lithography Journal of Vacuum Science & Technology B. 15: 2455-2461. DOI: 10.1116/1.589666  0.61
1996 Medecki H, Tejnil E, Goldberg KA, Bokor J. Phase-shifting point diffraction interferometer. Optics Letters. 21: 1526-8. PMID 19881713  0.542
1996 Beguiristain R, Goldberg KA, Tejnil E, Bokor J, Medecki H, Attwood DT, Jackson K. Interferometry using undulator sources (invited, abstract) Review of Scientific Instruments. 67: 3353-3353. DOI: 10.1063/1.1147396  0.559
1995 Goldberg KA, Beguiristain R, Bokor J, Medecki H, Attwood DT, Jackson K, Tejnil E, Sommargren GE. Progress towards λ/20 extreme ultraviolet interferometry Journal of Vacuum Science & Technology B. 13: 2923-2927. DOI: 10.1116/1.588280  0.565
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