Sung-Yong Chung - Publications

Affiliations: 
Sandisk 
 SK Hynix 
 2001-2005 Spansion 

17 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2009 Yu R, Anisha R, Jin N, Chung S, Berger PR, Gramila TJ, Thompson PE. Observation of strain in pseudomorphic Si1−xGex by tracking phonon participation in Si∕SiGe resonant interband tunnel diodes via electron tunneling spectroscopy Journal of Applied Physics. 106: 034501. DOI: 10.1063/1.3187832  0.825
2008 Jin N, Yu R, Chung S, Berger PR, Thompson PE. Strain-Engineered Si/SiGe Resonant Interband Tunneling Diodes Grown on $\hbox{Si}_{0.8}\hbox{Ge}_{0.2}$ Virtual Substrates With Strained Si Cladding Layers Ieee Electron Device Letters. 29: 599-602. DOI: 10.1109/Led.2008.923208  0.825
2008 Anisha R, Jin N, Chung S, Yu R, Berger PR, Thompson PE. Strain engineered Si∕SiGe resonant interband tunneling diodes with outside barriers grown on Si0.8Ge0.2 virtual substrates Applied Physics Letters. 93: 102113. DOI: 10.1063/1.2981211  0.837
2007 Chung S, Jin N, Pavlovicz RE, Yu R, Berger PR, Thompson PE. Analysis of the Voltage Swing for Logic and Memory Applications in Si/SiGe Resonant Interband Tunnel Diodes Grown by Molecular Beam Epitaxy Ieee Transactions On Nanotechnology. 6: 158-163. DOI: 10.1109/Tnano.2007.891831  0.813
2006 Jin N, Chung S, Yu R, Heyns RM, Berger PR, Thompson PE. The Effect of Spacer Thicknesses on Si-Based Resonant Interband Tunneling Diode Performance and Their Application to Low-Power Tunneling Diode SRAM Circuits Ieee Transactions On Electron Devices. 53: 2243-2249. DOI: 10.1109/Ted.2006.879678  0.836
2006 Chung S, Yu R, Jin N, Park S, Berger PR, Thompson PE. Si/SiGe resonant interband tunnel diode with f/sub r0/ 20.2 GHz and peak current density 218 kA/cm/sup 2/ for K-band mixed-signal applications Ieee Electron Device Letters. 27: 364-367. DOI: 10.1109/Led.2006.873379  0.805
2005 Jin N, Chung S, Yu R, Giacomo SJD, Berger PR, Thompson PE. RF performance and modeling of Si/SiGe resonant interband tunneling diodes Ieee Transactions On Electron Devices. 52: 2129-2135. DOI: 10.1109/Ted.2005.856183  0.842
2005 Jin N, Yu R, Chung S, Berger PR, Thompson PE, Fay P. High sensitivity Si-based backward diodes for zero-biased square-law detection and the effect of post-growth annealing on performance Ieee Electron Device Letters. 26: 575-578. DOI: 10.1109/Led.2005.852738  0.831
2005 Yoon WJ, Chung SY, Berger PR, Asar SM. Room-temperature negative differential resistance in polymer tunnel diodes using a thin oxide layer and demonstration of threshold logic Applied Physics Letters. 87: 1-3. DOI: 10.1063/1.2130395  0.737
2005 Jin N, Chung SY, Heyns RM, Berger PR, Yu R, Thompson PE, Rommel SL. Phosphorus diffusion in Si-based resonant interband tunneling diodes and tri-state logic using vertically stacked diodes Materials Science in Semiconductor Processing. 8: 411-416. DOI: 10.1016/J.Mssp.2004.09.080  0.831
2004 Jin N, Chung SY, Heyns RM, Berger PR, Yu R, Thompson PE, Rommel SL. Tri-state logic using vertically integrated Si-SiGe resonant interband tunneling diodes with double NDR Ieee Electron Device Letters. 25: 646-648. DOI: 10.1109/Led.2004.833845  0.816
2004 Chung S, Jin N, Pavlovicz RE, Berger PR, Yu R, Fang Z, Thompson PE. Annealing of defect density and excess currents in Si-based tunnel diodes grown by low-temperature molecular-beam epitaxy Journal of Applied Physics. 96: 747-753. DOI: 10.1063/1.1755436  0.836
2004 Chung SY, Jin N, Berger PR, Yu R, Thompson PE, Lake R, Rommel SL, Kurinec SK. Three-terminal Si-based negative differential resistance circuit element with adjustable peak-to-valley current ratios using a monolithic vertical integration Applied Physics Letters. 84: 2688-2690. DOI: 10.1063/1.1690109  0.825
2003 Jin N, Chung SY, Rice AT, Berger PR, Thompson PE, Rivas C, Lake R, Sudirgo S, Kempisty JJ, Curanovic B, Rommel SL, Hirschman KD, Kurinec SK, Chi PH, Simons DS. Diffusion barrier cladding in Si/SiGe resonant interband tunneling diodes and their patterned growth on PMOS source/drain regions Ieee Transactions On Electron Devices. 50: 1876-1884. DOI: 10.1109/Ted.2003.815375  0.806
2003 Jin N, Chung SY, Rice AT, Berger PR, Yu R, Thompson PE, Lake R. 151 kA/cm2 peak current densities in Si/SiGe resonant interband tunneling diodes for high-power mixed-signal applications Applied Physics Letters. 83: 3308-3310. DOI: 10.1063/1.1618927  0.811
2003 Chung SY, Jin N, Rice AT, Berger PR, Yu R, Fang ZQ, Thompson PE. Growth temperature and dopant species effects on deep levels in Si grown by low temperature molecular beam epitaxy Journal of Applied Physics. 93: 9104-9110. DOI: 10.1063/1.1569029  0.782
2002 Chung S, Berger PR, Fang Z, Thompson PE. Growth Temperature Effects on Deep-Levels in Si Grown by Low Temperature Molecular Beam Epitaxy Mrs Proceedings. 745. DOI: 10.1557/Proc-745-N6.9  0.733
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