☰

Kuen-Yu Tsai, Ph.D. - Publications

Affiliations: 
2003 Stanford University, Palo Alto, CA 
Tree Info Similar researchers PubMed Report error

17 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2014 Yang Y, Lee H, Liu C, Yu H, Tsai K, Li J. Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts Proceedings of Spie. 9050: 905032. DOI: 10.1117/12.2048683  0.33
2013 Chen CY, Ng PCW, Liu CH, Shen YT, Tsai KY, Li JH, Shieh JJ, Chen AC. Direct-scatterometry-enabled optical-proximity-correction-model calibration Proceedings of Spie - the International Society For Optical Engineering. 8681. DOI: 10.1117/12.2009064  0.316
2013 Liu C, Ng PCW, Shen Y, Chien S, Tsai K. Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam–direct-write lithography Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 31: 21605. DOI: 10.1116/1.4790655  0.3
2013 Ng PCW, Tsai K, Melvin LS. Study of etching bias modeling and correction strategies for compensation of patterning process effects Microelectronic Engineering. 110: 147-151. DOI: 10.1016/J.Mee.2013.03.024  0.302
2012 Shen YT, Liu CH, Chen CY, Ng HT, Tsai KY, Wang FM, Kuan CH, Lee YM, Cheng HH, Li JH, Chen AC. Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples Proceedings of Spie - the International Society For Optical Engineering. 8324. DOI: 10.1117/12.918109  0.309
2012 Chen CY, Tsai KY, Shen YT, Lee YM, Li JH, Shieh JJ, Chen AC. Direct-scatterometry-enabled lithography model calibration Proceedings of Spie - the International Society For Optical Engineering. 8324. DOI: 10.1117/12.917516  0.33
2012 Ng H, Shen Y, Chen S, Liu C, Ng PCW, Tsai K. New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints Journal of Micro-Nanolithography Mems and Moems. 11. DOI: 10.1117/1.Jmm.11.3.033007  0.31
2012 Liu C, Ng H, Tsai K. New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography Journal of Micro-Nanolithography Mems and Moems. 11: 13009. DOI: 10.1117/1.Jmm.11.1.013009  0.313
2011 Ng PCW, Tsai K, Melvin LS. Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects Journal of Micro-Nanolithography Mems and Moems. 10: 33010. DOI: 10.1117/1.3616043  0.373
2011 Ng PCW, Tsai K, Lee Y, Wang F, Li J, Chen AC. Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects Journal of Micro-Nanolithography Mems and Moems. 10: 13004. DOI: 10.1117/1.3533222  0.312
2011 Chen S, Ng H, Ma S, Chen H, Liu C, Tsai K. Lithography-patterning-fidelity-aware electron-optical system design optimization Journal of Vacuum Science & Technology B. 29. DOI: 10.1116/1.3662402  0.312
2010 Chen S, Chen S, Chen H, Tsai K, Pan H. Manufacturability Analysis of a Micro-Electro-Mechanical Systems–Based Electron-Optical System Design for Direct-Write Lithography Japanese Journal of Applied Physics. 49. DOI: 10.1143/Jjap.49.06Ge05  0.302
2010 Tsai K, Chen S, Pei T, Li J. Fresnel Zone Plate Manufacturability Analysis for Direct-Write Lithography by Simulating Focusing and Patterning Performance versus Fabrication Errors Japanese Journal of Applied Physics. 49. DOI: 10.1143/Jjap.49.06Gd08  0.301
2010 Liu C, Tien P, Ng PCW, Shen Y, Tsai K. Model-based proximity effect correction for electron-beam direct-write lithography Proceedings of Spie. 7637. DOI: 10.1117/12.846706  0.316
2010 Ng PCW, Tsai KY, Tang CH, Melvin L. A non-delta-chrome OPC methodology for process models with three-dimensional mask effects Proceedings of Spie - the International Society For Optical Engineering. 7640. DOI: 10.1117/12.846687  0.334
2008 Su Y, Ng PCW, Tsai K, Chen Y. Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence Proceedings of Spie. 6924. DOI: 10.1117/12.772397  0.317
2004 Tsai K, Hindi HA. DQIT: /spl mu/-synthesis without D-scale fitting Ieee Transactions On Automatic Control. 49: 2028-2032. DOI: 10.1109/Tac.2004.837544  0.57
Show low-probability matches.