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Bo Cui, Ph.D. - Publications

Affiliations: 
2003 Princeton University, Princeton, NJ 
Area:
Biological & Biomedical,Materials & Devices,Nanotechnologies,Photonics
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Year Citation  Score
2020 Islam R, Cui B, Miao G. Dry etching strategy of spin-transfer-torque magnetic random access memory: A review Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 38: 50801. DOI: 10.1116/6.0000205  0.317
2020 Dey RK, Ekinci H, Cui B. Effects of mask material conductivity on lateral undercut etching in silicon nano-pillar fabrication Journal of Vacuum Science & Technology B. 38: 012207. DOI: 10.1116/1.5123601  0.368
2020 Aydinoglu F, Pan A, Zhu C, Cui B. Effect of oxygen plasma cleaning on nonswitching pseudo-Bosch etching of high aspect ratio silicon pillars Journal of Vacuum Science & Technology B. 38: 012804. DOI: 10.1116/1.5122822  0.314
2019 Li Y, Zhang H, Yang R, Laffitte Y, Schmill U, Hu W, Kaddoura M, Blondeel EJM, Cui B. Fabrication of sharp silicon hollow microneedles by deep-reactive ion etching towards minimally invasive diagnostics. Microsystems & Nanoengineering. 5: 41. PMID 31636931 DOI: 10.1038/S41378-019-0077-Y  0.328
2019 Ekinci H, Dey RK, Cui B. Two-step potassium hydroxide etching to enhance aspect ratio in trench fabrication Journal of Vacuum Science & Technology B. 37: 062001. DOI: 10.1116/1.5123530  0.345
2019 Shen J, Aydinoglu F, Soltani M, Cui B. E-beam lithography using dry powder resist of hydrogen silsesquioxane having long shelf life Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 37: 21601. DOI: 10.1116/1.5079657  0.32
2019 Li Y, Zhang H, Yang R, Tazrin F, Zhu C, Kaddoura M, Blondeel EJ, Cui B. In-plane silicon microneedles with open capillary microfluidic networks by deep reactive ion etching and sacrificial layer based sharpening Sensors and Actuators a: Physical. 292: 149-157. DOI: 10.1016/J.Sna.2019.04.008  0.326
2018 Liu Y, Soltani M, Dey RK, Cui B, Lee R, Podmore H. Moth-eye antireflection nanostructure on glass for CubeSats Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 36. DOI: 10.1116/1.5050986  0.326
2018 Rezeq M, Ali A, Patole SP, Eledlebi K, Dey RK, Cui B. The dependence of Schottky junction (I–V) characteristics on the metal probe size in nano metal–semiconductor contacts Aip Advances. 8: 55122. DOI: 10.1063/1.5035400  0.332
2017 Con C, Cui B. Surface Nanostructures Formed by Phase Separation of Metal Salt-Polymer Nanocomposite Film for Anti-reflection and Super-hydrophobic Applications. Nanoscale Research Letters. 12: 628. PMID 29247270 DOI: 10.1186/S11671-017-2402-4  0.397
2017 Yamada H, Aydinoglu F, Liu Y, Dey RK, Cui B. Single layer surface-grafted PMMA as negative tone e-beam resist. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 29131642 DOI: 10.1021/Acs.Langmuir.7B03135  0.312
2017 Aydinoglu F, Yamada H, Dey RK, Cui B. Grafted polystyrene monolayer brush as both negative and positive tone electron beam resist. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 28459586 DOI: 10.1021/Acs.Langmuir.7B00412  0.332
2017 Zheng S, Zhu C, Dey RK, Cui B. Batch fabrication of AFM probes with direct positioning capability Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35: 06GC02. DOI: 10.1116/1.5010814  0.333
2017 Aydinoglu F, Saffih F, Dey RK, Cui B. Chromium oxide as a hard mask material better than metallic chromium Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35: 06GB01. DOI: 10.1116/1.4998480  0.319
2016 Zheng S, Dey RK, Aydinoglu F, Cui B. Mixture of ZEP and PMMA with varying ratios for tunable sensitivity as a lift-off resist with controllable undercut Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 34: 06K603. DOI: 10.1116/1.4967932  0.346
2016 Ayari-Kanoun A, Aydinoglu F, Cui B, Saffih F. Silicon nanostructures with very large negatively tapered profile by inductively coupled plasma-RIE Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 34: 4. DOI: 10.1116/1.4964402  0.311
2016 Dey RK, Aydinoglu F, Cui B. Electron Beam Lithography on Irregular Surface Using Grafted PMMA Monolayer as Resist Advanced Materials Interfaces. 4: 1600780. DOI: 10.1002/Admi.201600780  0.337
2015 Zhang J, Cao K, Wang XS, Cui B. Metal-carbonyl organometallic polymers, PFpP, as resists for high-resolution positive and negative electron beam lithography. Chemical Communications (Cambridge, England). PMID 26481609 DOI: 10.1039/C5Cc07117H  0.335
2015 Dai M, Wan W, Zhu X, Song B, Liu X, Lu M, Cui B, Chen Y. Broadband and wide angle infrared wire-grid polarizer. Optics Express. 23: 15390-7. PMID 26193519 DOI: 10.1364/Oe.23.015390  0.311
2015 Zhang J, Irannejad M, Yavuz M, Cui B. Gold Nanohole Array with Sub-1 nm Roughness by Annealing for Sensitivity Enhancement of Extraordinary Optical Transmission Biosensor. Nanoscale Research Letters. 10: 944. PMID 26058510 DOI: 10.1186/S11671-015-0944-X  0.374
2015 Con C, Aydinoglu F, Cui B. High resolution nanofabrication using self-assembly of metal salt-polymer nanocomposite film Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 33. DOI: 10.1116/1.4935654  0.371
2015 Viscomi FN, Dey RK, Caputo R, Cui B. Enhanced adhesion of electron beam resist by grafted monolayer poly(methylmethacrylate- co -methacrylic acid) brush Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 33. DOI: 10.1116/1.4935506  0.361
2015 Irannejad M, Cui B, Yavuz M. Optical Properties and Liquid Sensitivity of Au-SiO2-Au Nanobelt Structure Plasmonics. DOI: 10.1007/S11468-015-9977-3  0.305
2015 Irannejad M, Cui B, Yavuz M. The Effects of Varying Dielectric Spacer Height on the Reflection Resonance Spectrum of Gold Nanorod-on-Mirror Grating Structure Plasmonics. 10: 901-909. DOI: 10.1007/S11468-015-9878-5  0.329
2014 Dey RK, Cui B. Electron beam lithography with feedback using in situ self-developed resist. Nanoscale Research Letters. 9: 184. PMID 24739818 DOI: 10.1186/1556-276X-9-184  0.334
2014 Con C, Zhang J, Cui B. Nanofabrication of high aspect ratio structures using an evaporated resist containing metal. Nanotechnology. 25: 175301. PMID 24717720 DOI: 10.1088/0957-4484/25/17/175301  0.39
2014 Zhang J, Con C, Cui B. Electron beam lithography on irregular surfaces using an evaporated resist. Acs Nano. 8: 3483-9. PMID 24669781 DOI: 10.1021/Nn4064659  0.363
2014 Saffih F, Con C, Alshammari A, Yavuz M, Cui B. Fabrication of silicon nanostructures with large taper angle by reactive ion etching Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 32. DOI: 10.1116/1.4901420  0.336
2014 Dey RK, Cui B. Lift-off with solvent for negative resist using low energy electron beam exposure Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 32. DOI: 10.1116/1.4901012  0.303
2014 Abbas AS, Yavuz M, Cui B. Polycarbonate electron beam resist using solvent developer Microelectronic Engineering. 113: 140-142. DOI: 10.1016/J.Mee.2013.08.006  0.338
2014 Zhang J, Irannejad M, Cui B. Bowtie Nanoantenna with Single-Digit Nanometer Gap for Surface-Enhanced Raman Scattering (SERS) Plasmonics. 10: 831-837. DOI: 10.1007/S11468-014-9870-5  0.334
2014 Irannejad M, Zhang J, Yavuz M, Cui B. Numerical Study of Optical Behavior of Nano-Hole Array with Non-Vertical Sidewall Profile Plasmonics. 9: 537-544. DOI: 10.1007/S11468-013-9656-1  0.361
2014 Wan W, Lin L, Xu Y, Guo X, Liu X, Ge H, Lu M, Cui B, Chen Y. Planar self-aligned imprint lithography for coplanar plasmonic nanostructures fabrication Applied Physics a: Materials Science and Processing. 116: 657-662. DOI: 10.1007/S00339-014-8323-5  0.345
2013 Con C, Cui B. Effect of mold treatment by solvent on PDMS molding into nanoholes. Nanoscale Research Letters. 8: 394. PMID 24059263 DOI: 10.1186/1556-276X-8-394  0.358
2013 Chen JY, Con C, Yu MH, Cui B, Sun KW. Efficiency enhancement of PEDOT:PSS/Si hybrid solar cells by using nanostructured radial junction and antireflective surface. Acs Applied Materials & Interfaces. 5: 7552-8. PMID 23845069 DOI: 10.1021/Am4018412  0.322
2013 Liu R, Zhang F, Con C, Cui B, Sun B. Lithography-free fabrication of silicon nanowire and nanohole arrays by metal-assisted chemical etching. Nanoscale Research Letters. 8: 155. PMID 23557325 DOI: 10.1186/1556-276X-8-155  0.357
2013 Irannejad M, Yavuz M, Cui B. Finite difference time domain study of light transmission through multihole nanostructures in metallic film Photonics Research. 1: 154-159. DOI: 10.1364/Prj.1.000154  0.33
2013 Irannejad M, Cui B. Effects of Refractive Index Variations on the Optical Transmittance Spectral Properties of the Nano-Hole Arrays Plasmonics. 8: 1245-1251. DOI: 10.1007/S11468-013-9540-Z  0.357
2012 Zhang J, Shokouhi B, Cui B. Tilted nanostructure fabrication by electron beam lithography Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.4754809  0.347
2012 Liu W, Ferguson M, Yavuz M, Cui B. Porous TEM windows fabrication using CsCl self-assembly Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.4751550  0.332
2012 Con C, Zhang J, Jahed Z, Tsui TY, Yavuz M, Cui B. Thermal nanoimprint lithography using fluoropolymer mold Microelectronic Engineering. 98: 246-249. DOI: 10.1016/J.Mee.2012.07.007  0.377
2012 Con C, Dey R, Ferguson M, Zhang J, Mansour R, Yavuz M, Cui B. High molecular weight polystyrene as very sensitive electron beam resist Microelectronic Engineering. 98: 254-257. DOI: 10.1016/J.Mee.2012.07.005  0.314
2011 Ma S, Con C, Yavuz M, Cui B. Polystyrene negative resist for high-resolution electron beam lithography. Nanoscale Research Letters. 6: 446. PMID 21749679 DOI: 10.1186/1556-276X-6-446  0.355
2011 Shokouhi B, Zhang J, Cui B. Very high sensitivity ZEP resist using MEK:MIBK developer Micro and Nano Letters. 6: 992-994. DOI: 10.1049/Mnl.2011.0548  0.336
2011 Zhang J, Cui B, Ge H. Fabrication of flexible mold for hybrid nanoimprint-soft lithography Microelectronic Engineering. 88: 2192-2195. DOI: 10.1016/J.Mee.2010.12.107  0.377
2010 Saydur Rahman SM, Cui B. Mold Fabrication for 3D Dual Damascene Imprinting. Nanoscale Research Letters. 5: 545-549. PMID 20671781 DOI: 10.1007/S11671-010-9540-2  0.368
2010 Cui B, Keimel C, Chou SY. Ultrafast direct imprinting of nanostructures in metals by pulsed laser melting. Nanotechnology. 21: 045303. PMID 20009206 DOI: 10.1088/0957-4484/21/4/045303  0.549
2010 Veres T, Cui B, Clime L. Fabrication of nanostar arrays by nanoimprint lithography Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C6O26-C6O29. DOI: 10.1116/1.3504890  0.377
2009 Malic L, Cui B, Tabrizian M, Veres T. Nanoimprinted plastic substrates for enhanced surface plasmon resonance imaging detection. Optics Express. 17: 20386-92. PMID 19997267 DOI: 10.1364/Oe.17.020386  0.329
2009 Li Z, Gu Y, Wang L, Ge H, Wu W, Xia Q, Yuan C, Chen Y, Cui B, Williams RS. Hybrid nanoimprint-soft lithography with sub-15 nm resolution. Nano Letters. 9: 2306-10. PMID 19422192 DOI: 10.1021/Nl9004892  0.677
2009 Geissler M, Li K, Cui B, Clime L, Veres T. Plastic substrates for surface-enhanced raman scattering Journal of Physical Chemistry C. 113: 17296-17300. DOI: 10.1021/Jp9038607  0.336
2009 Hajiaboli AR, Cui B, Kahrizi M, Truong V. Optical properties of thick metal nanohole arrays fabricated by electron-beam and nanosphere lithography Physica Status Solidi (a). 206: 976-979. DOI: 10.1002/Pssa.200881294  0.352
2008 Li K, Clime L, Cui B, Veres T. Surface enhanced Raman scattering on long-range ordered noble-metal nanocrescent arrays. Nanotechnology. 19: 145305. PMID 21817759 DOI: 10.1088/0957-4484/19/14/145305  0.32
2008 Cui B, Wu L, Chou SY. Fabrication of high aspect ratio metal nanotips by nanosecond pulse laser melting. Nanotechnology. 19: 345303. PMID 21730645 DOI: 10.1088/0957-4484/19/34/345303  0.549
2008 Li K, Clime L, Tay L, Cui B, Geissler M, Veres T. Multiple surface plasmon resonances and near-infrared field enhancement of gold nanowells. Analytical Chemistry. 80: 4945-50. PMID 18507399 DOI: 10.1021/Ac800149D  0.339
2008 Li K, Cui B, Clime L, Veres T. Fabrication of SERS active substrates by nanoimprint lithography Materials Research Society Symposium Proceedings. 1054: 146-151. DOI: 10.1557/Proc-1054-Ff01-03  0.368
2008 Cui B, Clime L, Li K, Veres T. Fabrication of large area nanoprism arrays and their application for surface enhanced Raman spectroscopy Nanotechnology. 19. DOI: 10.1088/0957-4484/19/14/145302  0.406
2008 Cui B, Veres T. High resolution electron beam lithography of PMGI using solvent developers Microelectronic Engineering. 85: 810-813. DOI: 10.1016/J.Mee.2008.01.008  0.339
2007 Malic L, Cui B, Veres T, Tabrizian M. Enhanced surface plasmon resonance imaging detection of DNA hybridization on periodic gold nanoposts Optics Letters. 32: 3092-3094. PMID 17975607 DOI: 10.1364/Ol.32.003092  0.362
2007 Cui B, Yu Z, Ge H, Chou SY. Large area 50 nm period grating by multiple nanoimprint lithography and spatial frequency doubling Applied Physics Letters. 90. DOI: 10.1063/1.2390652  0.639
2007 Alvarez-Puebla R, Cui B, Bravo-Vasquez JP, Veres T, Fenniri H. Nanoimprinted SERS-active substrates with tunable surface plasmon resonances Journal of Physical Chemistry C. 111: 6720-6723. DOI: 10.1021/Jp070906S  0.318
2007 Cui B, Veres T. Fabrication of metal nanoring array by nanoimprint lithography (NIL) and reactive ion etching Microelectronic Engineering. 84: 1544-1547. DOI: 10.1016/J.Mee.2007.01.158  0.37
2006 Cui B, Wu W, Keimel C, Chou SY. Filling of nano-via holes by laser-assisted direct imprint Microelectronic Engineering. 83: 1547-1550. DOI: 10.1016/J.Mee.2006.01.087  0.559
2006 Cui B, Cortot Y, Veres T. Polyimide nanostructures fabricated by nanoimprint lithography and its applications Microelectronic Engineering. 83: 906-909. DOI: 10.1016/J.Mee.2006.01.014  0.354
2006 Cui B, Veres T. Pattern replication of 100 nm to millimeter-scale features by thermal nanoimprint lithography Microelectronic Engineering. 83: 902-905. DOI: 10.1016/J.Mee.2006.01.013  0.362
2002 Feng J, Cui B, Zhan Y, Chou SY. Flexible metal film with micro- and nanopatterns transferred by electrochemical deposition Electrochemistry Communications. 4: 102-104. DOI: 10.1016/S1388-2481(01)00282-X  0.525
1999 Cui B, Wu W, Kong L, Sun X, Chou SY. Perpendicular quantized magnetic disks with 45 Gbits on a 4×4 cm2 area Journal of Applied Physics. 85: 5534-5536. DOI: 10.1063/1.369885  0.543
1999 Kong L, Pan Q, Cui B, Li M, Chou SY. Magnetotransport and domain structures in nanoscale NiFe/Cu/Co spin valve Journal of Applied Physics. 85: 5492-5494. DOI: 10.1063/1.369872  0.609
1998 Kong L, Zhuang L, Li M, Cui B, Chou SY. Fabrication, Writing, and Reading of 10 Gbits/in2 Longitudinal Quantized Magnetic Disks with a Switching Field over 1000 Oe Japanese Journal of Applied Physics. 37: 5973-5975. DOI: 10.1143/Jjap.37.5973  0.688
1998 Wu W, Cui B, Sun X, Zhang W, Zhuang L, Kong L, Chou SY. Large area high density quantized magnetic disks fabricated using nanoimprint lithography Journal of Vacuum Science & Technology B. 16: 3825-3829. DOI: 10.1116/1.590417  0.652
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