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Xu Ma, Ph.D. - Publications

Affiliations: 
2009 Department of Electrical and Computer Engineering University of Delaware, Newark, DE, United States 
Area:
Electronics and Electrical Engineering
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74 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2023 Zhang S, Ma X, Zhang J. Fast inverse lithography approach based on a model-driven graph convolutional network. Optics Express. 31: 36451-36467. PMID 38017798 DOI: 10.1364/OE.493178  0.407
2023 Li Z, Jing X, Dong L, Ma X, Wei Y. Fast diffraction model of an EUV mask based on asymmetric patch data fitting. Applied Optics. 62: 6561-6570. PMID 37706786 DOI: 10.1364/AO.499361  0.307
2023 Qiu Y, Zhao S, Ma X, Zhang T, Arce GR. Hyperspectral image reconstruction via patch attention driven network. Optics Express. 31: 20221-20236. PMID 37381421 DOI: 10.1364/OE.479549  0.556
2022 Pan Y, Ma X. Informatics-based computational lithography for phase-shifting mask optimization. Optics Express. 30: 21282-21294. PMID 36224851 DOI: 10.1364/OE.459095  0.381
2022 Li Z, Dong L, Jing X, Ma X, Wei Y. High-precision lithography thick-mask model based on a decomposition machine learning method. Optics Express. 30: 17680-17697. PMID 36221585 DOI: 10.1364/OE.454513  0.304
2022 Lin J, Dong L, Fan T, Ma X, Wei Y. Fast aerial image model for EUV lithography using the adjoint fully convolutional network. Optics Express. 30: 11944-11958. PMID 35473126 DOI: 10.1364/OE.452420  0.367
2022 Mao T, Ma X, Cuadros AP, Dai X, Wang Z, Zhang X, Zhu S, Zhu J, Arce GR. Static coded aperture in robotic X-ray tomography systems. Optics Express. 30: 7677-7693. PMID 35299524 DOI: 10.1364/OE.449505  0.545
2022 Zhao X, Ma X. Off-axis aberration correction for a reflective coded aperture snapshot spectral imager. Optics Letters. 47: 1202-1205. PMID 35230327 DOI: 10.1364/OL.439022  0.356
2022 Cuadros AP, Liu X, Parsons PE, Ma X, Arce GR. Experimental demonstration and optimization of X-ray StaticCodeCT. Applied Optics. 60: 9543-9552. PMID 34807098 DOI: 10.1364/AO.438727  0.537
2021 Zhang H, Ma X, Zhao X, Arce GR. Compressive hyperspectral image classification using a 3D coded convolutional neural network. Optics Express. 29: 32875-32891. PMID 34809110 DOI: 10.1364/OE.437717  0.564
2021 Wu R, Dong L, Ma X, Wei Y. Compensation of EUV lithography mask blank defect based on an advanced genetic algorithm. Optics Express. 29: 28872-28885. PMID 34615008 DOI: 10.1364/OE.434787  0.407
2021 Zhao Q, Ma X, Arce GR, Wang Z. Compressive X-ray tomosynthesis using model-driven deep learning. Optics Express. 29: 24576-24591. PMID 34614699 DOI: 10.1364/OE.433888  0.602
2021 Ma X, Xu H, Restrepo CM, Arce GR. Multi-objective optimization for structured illumination in dynamic x-ray tomosynthesis. Applied Optics. 60: 6177-6188. PMID 34613284 DOI: 10.1364/AO.428871  0.571
2021 Pan Y, Ma X, Zhang S, Garcia-Frias J, Arce GR. Efficient informatics-based source and mask optimization for optical lithography. Applied Optics. 60: 8307-8315. PMID 34612927 DOI: 10.1364/AO.433962  0.676
2021 Cuadros AP, Ma X, Restrepo CM, Arce GR. StaticCodeCT: single coded aperture tensorial X-ray CT. Optics Express. 29: 20558-20576. PMID 34266143 DOI: 10.1364/OE.427382  0.575
2021 Cuadros AP, Ma X, Restrepo CM, Arce GR. StaticCodeCT: single coded aperture tensorial X-ray CT. Optics Express. 29: 20558-20576. PMID 34266143 DOI: 10.1364/OE.427382  0.575
2021 Zhang T, Zhao S, Ma X, Cuadros AP, Zhao Q, Arce GR. Nonlinear reconstruction of coded spectral X-ray CT based on material decomposition. Optics Express. 29: 19319-19339. PMID 34266043 DOI: 10.1364/OE.426732  0.579
2021 Zhang T, Zhao S, Ma X, Cuadros AP, Zhao Q, Arce GR. Nonlinear reconstruction of coded spectral X-ray CT based on material decomposition. Optics Express. 29: 19319-19339. PMID 34266043 DOI: 10.1364/OE.426732  0.579
2021 Fang Z, Ma X, Restrepo C, Arce GR. Blue noise coding for a coherent x-ray diffraction imaging system. Applied Optics. 60: 2751-2760. PMID 33798148 DOI: 10.1364/AO.416226  0.585
2020 Zheng X, Ma X, Zhao Q, Pan Y, Arce GR. Model-informed deep learning for computational lithography with partially coherent illumination. Optics Express. 28: 39475-39491. PMID 33379496 DOI: 10.1364/OE.413721  0.596
2020 Zhao Q, Ma X, Cuadros A, Mao T, Arce GR. Single-snapshot X-ray imaging for nonlinear compressive tomosynthesis. Optics Express. 28: 29390-29407. PMID 33114840 DOI: 10.1364/Oe.392054  0.639
2020 Ma X, Zheng X, Arce GR. Fast inverse lithography based on dual-channel model-driven deep learning. Optics Express. 28: 20404-20421. PMID 32680101 DOI: 10.1364/Oe.396661  0.642
2020 Lin J, Dong L, Fan T, Ma X, Chen R, Wei Y. Fast extreme ultraviolet lithography mask near-field calculation method based on machine learning. Applied Optics. 59: 2829-2838. PMID 32225832 DOI: 10.1364/Ao.384407  0.376
2020 Zhang H, Ma X, Arce GR. Compressive spectral imaging approach using adaptive coded apertures. Applied Optics. 59: 1924-1938. PMID 32225709 DOI: 10.1364/Ao.382854  0.622
2020 Xu C, Xu T, Yan G, Ma X, Zhang Y, Wang X, Zhao F, Arce GR. Super-resolution compressive spectral imaging via two-tone adaptive coding: publisher’s note Photonics Research. 8: 892. DOI: 10.1364/Prj.395178  0.584
2020 Xu C, Xu T, Yan G, Ma X, Zhang Y, Wang X, Zhao F, Arce GR. Super-resolution compressive spectral imaging via two-tone adaptive coding Photonics Research. 8: 395. DOI: 10.1364/Prj.377665  0.643
2020 Wang Z, Ma X, Chen R, Zhang S, Arce GR. Fast Pixelated Lithographic Source and Mask Joint Optimization Based on Compressive Sensing Ieee Transactions On Computational Imaging. 6: 981-992. DOI: 10.1109/Tci.2020.3000010  0.594
2020 Zhang H, Ma X, Lau DL, Zhu J, Arce GR. Compressive Spectral Imaging Based on Hexagonal Blue Noise Coded Apertures Ieee Transactions On Computational Imaging. 6: 749-763. DOI: 10.1109/Tci.2020.2979373  0.631
2020 Mao T, Cuadros AP, Ma X, He W, Chen Q, Arce GR. Coded Aperture Optimization in X-Ray Tomography via Sparse Principal Component Analysis Ieee Transactions On Computational Imaging. 6: 73-86. DOI: 10.1109/Tci.2019.2919228  0.653
2019 Ma X, Wang Z, Zhu J, Zhang S, Arce GR, Zhao S. Nonlinear compressive inverse lithography aided by low-rank regularization. Optics Express. 27: 29992-30008. PMID 31684254 DOI: 10.1364/Oe.27.029992  0.673
2019 Lin J, Dong L, Fan T, Ma X, Wei Y, Ye T. Learning-based compressive sensing method for EUV lithographic source optimization. Optics Express. 27: 22563-22581. PMID 31510546 DOI: 10.1364/Oe.27.022563  0.546
2019 Cuadros A, Ma X, Arce GR. Compressive spectral X-ray tomography based on spatial and spectral coded illumination. Optics Express. 27: 10745-10764. PMID 31052928 DOI: 10.1364/Oe.27.010745  0.636
2019 Ma X, Deng X, Qi L, Jiang Y, Li H, Wang Y, Xing X. Fully convolutional network for rice seedling and weed image segmentation at the seedling stage in paddy fields. Plos One. 14: e0215676. PMID 30998770 DOI: 10.1371/journal.pone.0215676  0.307
2019 Ma X, Zhao Q, Cuadros A, Mao T, Arce GR. Source and coded aperture joint optimization for compressive X-ray tomosynthesis. Optics Express. 27: 6640-6659. PMID 30876245 DOI: 10.1364/Oe.27.006640  0.654
2019 Zhang Y, Wang X, Tan H, Xu C, Ma X, Xu T. Region Merging Method for Remote Sensing Spectral Image Aided by Inter-Segment and Boundary Homogeneities Remote Sensing. 11: 1414. DOI: 10.3390/Rs11121414  0.357
2019 Ma X, Wang Z, Chen X, Li Y, Arce GR. Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography Ieee Transactions On Computational Imaging. 5: 120-135. DOI: 10.1109/Tci.2018.2880342  0.785
2018 Ma X, Zhao Q, Zhang H, Wang Z, Arce GR. Model-driven convolution neural network for inverse lithography. Optics Express. 26: 32565-32584. PMID 30645421 DOI: 10.1364/Oe.26.032565  0.661
2018 Wang X, Zhang Y, Ma X, Xu T, Arce GR. Compressive spectral imaging system based on liquid crystal tunable filter. Optics Express. 26: 25226-25243. PMID 30469627 DOI: 10.1364/Oe.26.025226  0.631
2018 Mao T, Cuadros AP, Ma X, He W, Chen Q, Arce GR. Fast optimization of coded apertures in X-ray computed tomography. Optics Express. 26: 24461-24478. PMID 30469563 DOI: 10.1364/Oe.26.024461  0.66
2018 Wang Z, Ma X, Arce GR, Garcia-Frias J. Information theoretical approaches in computational lithography. Optics Express. 26: 16736-16751. PMID 30119496 DOI: 10.1364/Oe.26.016736  0.639
2018 Ma X, Wang Z, Li Y, Arce GR, Dong L, Garcia-Frias J. Fast optical proximity correction method based on nonlinear compressive sensing. Optics Express. 26: 14479-14498. PMID 29877485 DOI: 10.1364/Oe.26.014479  0.759
2018 Ma X, Wang Z, Lin H, Li Y, Arce GR, Zhang L. Optimization of lithography source illumination arrays using diffraction subspaces. Optics Express. 26: 3738-3755. PMID 29475354 DOI: 10.1364/Oe.26.003738  0.781
2017 Ma X, Zhao X, Wang Z, Li Y, Zhao S, Zhang L. Fast lithography aerial image calculation method based on machine learning. Applied Optics. 56: 6485-6495. PMID 29047938 DOI: 10.1364/Ao.56.006485  0.687
2017 Ma X, Lin H, Jiao G, Li Y, Arce GR. Fast lithographic source optimization using a batch-processing sequential least square estimator. Applied Optics. 56: 5903-5913. PMID 29047910 DOI: 10.1364/Ao.56.005903  0.772
2017 Galvis L, Lau D, Ma X, Arguello H, Arce GR. Coded aperture design in compressive spectral imaging based on side information. Applied Optics. 56: 6332-6340. PMID 29047832 DOI: 10.1364/Ao.56.006332  0.634
2017 Ma X, Shi D, Wang Z, Li Y, Arce GR. Lithographic source optimization based on adaptive projection compressive sensing. Optics Express. 25: 7131-7149. PMID 28381053 DOI: 10.1364/Oe.25.007131  0.744
2017 Ma X, Arce GR, Wang Z, Li Y, Zhao S, Zhang L. Compressive Position and Attitude Estimation Using Ground-Based Beacon Journal of Guidance, Control, and Dynamics. 40: 2630-2645. DOI: 10.2514/1.G002292  0.527
2017 Ma X, Zhang H, Wang Z, Li Y, Arce GR, Garcia-Frias J, Zhang L. Information theoretical aspects in coherent optical lithography systems Optics Express. 25: 29043. DOI: 10.1364/Oe.25.029043  0.6
2017 Ma X, Jiang S, Wang J, Wu B, Song Z, Li Y. A fast and manufacture-friendly optical proximity correction based on machine learning Microelectronic Engineering. 168: 15-26. DOI: 10.1016/J.Mee.2016.10.006  0.684
2015 Ma X, Wang J, Chen X, Li Y, Arce GR. Gradient-based inverse extreme ultraviolet lithography. Applied Optics. 54: 7284-300. PMID 26368764 DOI: 10.1364/Ao.54.007284  0.778
2015 Han C, Li Y, Ma X, Liu L. Robust hybrid source and mask optimization to lithography source blur and flare. Applied Optics. 54: 5291-302. PMID 26192826 DOI: 10.1364/Ao.54.005291  0.709
2015 Ma X, Gao J, Chen X, Dong L, Li Y. A fast and flexible library-based thick-mask near-field calculation method Proceedings of Spie. 9426. DOI: 10.1117/12.2085010  0.396
2015 Ma X, Dong L, Han C, Gao J, Li Y, Arce GR. Gradient-based joint source polarization mask optimization for optical lithography Journal of Micro/Nanolithography, Mems, and Moems. 14: 023504. DOI: 10.1117/1.Jmm.14.2.023504  0.77
2014 Han C, Li Y, Dong L, Ma X, Guo X. Inverse pupil wavefront optimization for immersion lithography. Applied Optics. 53: 6861-71. PMID 25322394 DOI: 10.1364/Ao.53.006861  0.734
2014 Song Z, Ma X, Gao J, Wang J, Li Y, Arce GR. Inverse lithography source optimization via compressive sensing. Optics Express. 22: 14180-98. PMID 24977516 DOI: 10.1364/Oe.22.014180  0.786
2014 Ma X, Gao J, Han C, Li Y, Dong L, Liu L. Efficient source polarization optimization for robust optical lithography Proceedings of Spie. 9052. DOI: 10.1117/12.2045724  0.529
2014 Guo X, Li Y, Dong L, Liu L, Ma X, Han C. Parametric source-mask-numerical aperture co-optimization for immersion lithography Journal of Micro/Nanolithography, Mems, and Moems. 13: 043013. DOI: 10.1117/1.Jmm.13.4.043013  0.714
2014 Ma X, Wu B, Song Z, Jiang S, Li Y. Fast pixel-based optical proximity correction based on nonparametric kernel regression Journal of Micro/Nanolithography, Mems, and Moems. 13: 043007. DOI: 10.1117/1.Jmm.13.4.043007  0.687
2013 Li G, Li Y, Liu K, Ma X, Wang H. Improving wavefront reconstruction accuracy by using integration equations with higher-order truncation errors in the Southwell geometry. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 30: 1448-59. PMID 24323162 DOI: 10.1364/Josaa.30.001448  0.657
2013 Ma X, Han C, Li Y, Wu B, Song Z, Dong L, Arce GR. Hybrid source mask optimization for robust immersion lithography. Applied Optics. 52: 4200-11. PMID 23842161 DOI: 10.1364/Ao.52.004200  0.783
2013 Ma X, Song Z, Li Y, Arce GR. Block-based mask optimization for optical lithography. Applied Optics. 52: 3351-63. PMID 23669851 DOI: 10.1364/Ao.52.003351  0.786
2013 Ma X, Han C, Li Y, Dong L, Arce GR. Pixelated source and mask optimization for immersion lithography. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 30: 112-23. PMID 23456007 DOI: 10.1364/Josaa.30.000112  0.787
2012 Ma X, Li Y, Dong L. Mask optimization approaches in optical lithography based on a vector imaging model. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 29: 1300-12. PMID 22751396 DOI: 10.1364/Josaa.29.001300  0.749
2012 Ma X, Li Y, Guo X, Dong L. Robust resolution enhancement optimization methods to process variations based on vector imaging model Proceedings of Spie. 8326. DOI: 10.1117/12.916147  0.556
2012 Ma X, Li Y, Dong L. Gradient-based resolution enhancement optimization methods based on vector imaging model Proceedings of Spie. 8326. DOI: 10.1117/12.916144  0.574
2012 Ma X, Li Y, Guo X, Dong L, Arce GR. Vectorial mask optimization methods for robust optical lithography Journal of Micro/Nanolithography, Mems, and Moems. 11: 043008. DOI: 10.1117/1.Jmm.11.4.043008  0.774
2011 Ma X, Arce GR, Li Y. Optimal 3D phase-shifting masks in partially coherent illumination. Applied Optics. 50: 5567-76. PMID 22016227 DOI: 10.1364/Ao.50.005567  0.753
2011 Ma X, Arce GR. Pixel-based OPC optimization based on conjugate gradients. Optics Express. 19: 2165-80. PMID 21369034 DOI: 10.1364/Oe.19.002165  0.701
2010 Ma X, Arce GR. Binary mask optimization for forward lithography based on boundary layer model in coherent systems: erratum. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 27: 82-4. PMID 20035306 DOI: 10.1364/Josaa.27.000082  0.564
2009 Ma X, Arce GR. Binary mask optimization for forward lithography based on the boundary layer model in coherent systems. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 26: 1687-95. PMID 19568305 DOI: 10.1364/Josaa.26.001687  0.655
2009 Ma X, Arce GR. Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography. Optics Express. 17: 5783-93. PMID 19333347 DOI: 10.1364/Oe.17.005783  0.681
2008 Ma X, Arce G. Binary mask optimization for inverse lithography with partially coherent illumination. Journal of the Optical Society of America. a, Optics, Image Science, and Vision. 25: 2960-70. PMID 19037387 DOI: 10.1364/Josaa.25.002960  0.65
2008 Ma X, Arce GR. PSM design for inverse lithography with partially coherent illumination. Optics Express. 16: 20126-41. PMID 19030098 DOI: 10.1364/Oe.16.020126  0.672
2007 Ma X, Arce GR. Generalized inverse lithography methods for phase-shifting mask design. Optics Express. 15: 15066-79. PMID 19550790 DOI: 10.1364/Oe.15.015066  0.629
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