Year |
Citation |
Score |
2016 |
Kao TS, Hong KB, Chou YH, Huang JF, Chen FC, Lu TC. Localized surface plasmon for enhanced lasing performance in solution-processed perovskites. Optics Express. 24: 20696-20702. PMID 27607673 DOI: 10.1364/Oe.24.020696 |
0.339 |
|
2016 |
Duan XL, Chen HJ, Huang JY, Liu ZF, Li JK, Yang ZY, Zhang WF, Yu G. Tracking the Evolution of Polymer Interface Films during the Process of Thermal Annealing at the Domain and Single Molecular Levels using Scanning Tunneling Microscopy. Langmuir : the Acs Journal of Surfaces and Colloids. PMID 27605160 DOI: 10.1021/Acs.Langmuir.6B02139 |
0.318 |
|
2013 |
Huang J, Orkoulas G, Christofides PD. Simulation and control of porosity in a three-dimensional thin-film solar cell Industrial and Engineering Chemistry Research. 52: 11246-11252. DOI: 10.1021/Ie4003359 |
0.716 |
|
2013 |
Huang J, Orkoulas G, Christofides PD. Porosity control in thin film solar cells: Two-dimensional case Proceedings of the American Control Conference. 1620-1625. DOI: 10.1016/J.Ces.2013.02.046 |
0.71 |
|
2012 |
Huang J, Orkoulas G, Christofides PD. Surface morphology control of Transparent Conducting Oxide layers for improved light trapping using wafer grating and feedback control Chemical Engineering Science. 81: 191-201. DOI: 10.1016/J.Ces.2012.07.011 |
0.804 |
|
2012 |
Huang J, Orkoulas G, Christofides PD. Modeling and control of Transparent Conducting Oxide layer surface morphology for improved light trapping Chemical Engineering Science. 74: 135-147. DOI: 10.1016/J.Ces.2012.02.030 |
0.799 |
|
2012 |
Huang J, Orkoulas G, Christofides PD. Simulation and control of aggregate surface morphology in a two-stage thin film deposition process for improved light trapping Chemical Engineering Science. 71: 520-530. DOI: 10.1016/J.Ces.2011.11.027 |
0.786 |
|
2012 |
Zhang X, Huang J, Hu G, Orkoulas G, Christofides PD. Controlling aggregate thin film surface morphology for improved light trapping using a patterned deposition rate profile Chemical Engineering Science. 67: 101-110. DOI: 10.1016/J.Ces.2011.03.047 |
0.787 |
|
2012 |
Huang J, Orkoulas G, Christofides PD. Predictive control of aggregate surface morphology in a two-stage thin film deposition process for improved light trapping Proceedings of the American Control Conference. 2208-2213. |
0.759 |
|
2011 |
Zhang X, Huang J, Orkoulas G, Christofides PD. Modeling and control of aggregate thin film surface morphology using stochastic PDEs and a patterned deposition rate profile Proceedings of the Ieee Conference On Decision and Control. 2756-2763. DOI: 10.1109/CDC.2011.6160303 |
0.776 |
|
2011 |
Huang J, Hu G, Orkoulas G, Christofides PD. Dynamics and lattice-size dependence of surface mean slope in thin-film deposition Industrial and Engineering Chemistry Research. 50: 1219-1230. DOI: 10.1021/Ie100012W |
0.795 |
|
2011 |
Huang J, Zhang X, Orkoulas G, Christofides PD. Dynamics and control of aggregate thin film surface morphology for improved light trapping: Implementation on a large-lattice kinetic Monte Carlo model Chemical Engineering Science. 66: 5955-5967. DOI: 10.1016/J.Ces.2011.08.020 |
0.799 |
|
2011 |
Huang J, Hu G, Orkoulas G, Christofides PD. Dependence of film surface roughness on surface migration and lattice size in thin film deposition Proceedings of the American Control Conference. 2957-2962. |
0.797 |
|
2010 |
Huang J, Hu G, Orkoulas G, Christofides PD. Lattice-size dependence and dynamics of surface mean slope in a thin film deposition process Ifac Proceedings Volumes (Ifac-Papersonline). 9: 811-816. DOI: 10.3182/20100705-3-Be-2011.00134 |
0.8 |
|
2010 |
Huang J, Hu G, Orkoulas G, Christofides PD. Dependence of film surface roughness and slope on surface migration and lattice size in thin film deposition processes Chemical Engineering Science. 65: 6101-6111. DOI: 10.1016/J.Ces.2010.08.035 |
0.788 |
|
2009 |
Hu G, Huang J, Orkoulas G, Christofides PD. Investigation of film surface roughness and porosity dependence on lattice size in a porous thin film deposition process. Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics. 80: 041122. PMID 19905288 DOI: 10.1103/Physreve.80.041122 |
0.792 |
|
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