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Zhaoning Yu, Ph.D. - Publications

Affiliations: 
2003 Princeton University, Princeton, NJ 
Area:
Biological & Biomedical,Materials & Devices,Nanotechnologies,Photonics
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29 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Ma J, Li Q, Li Y, Wen X, Li Z, Zhang Z, Zhang J, Yu Z, Li N. Expression of recombinant human α-lactalbumin in milk of transgenic cloned pigs is sufficient to enhance intestinal growth and weight gain of suckling piglets. Gene. PMID 26899869 DOI: 10.1016/j.gene.2016.02.024  0.451
2016 Liu M, Li T, Yu ZJ, Gao XH, Zuo CW, Wang RR, Li NX, Wang H, Liu JZ. Characterization of the life cycle of the tick Haemaphysalis tibetensis under field conditions in Qinghai-Tibet plateau. Experimental & Applied Acarology. PMID 26873779 DOI: 10.1007/s10493-016-0020-y  0.445
2016 Tan SJ, Yu C, Yu Z, Lin ZL, Wu GH, Yu WK, Li JS, Li N. High-fat enteral nutrition reduces intestinal mucosal barrier damage after peritoneal air exposure Journal of Surgical Research. 202: 77-86. DOI: 10.1016/j.jss.2015.12.010  0.442
2010 Chaturvedi P, Wu W, Logeeswaran VJ, Yu Z, Islam MS, Wang SY, Williams RS, Fang NX. A smooth optical superlens Applied Physics Letters. 96. DOI: 10.1063/1.3293448  0.347
2009 Picciotto C, Gao J, Yu Z, Wu W. Alignment for imprint lithography using nDSE and shallow molds. Nanotechnology. 20: 255304. PMID 19487804 DOI: 10.1088/0957-4484/20/25/255304  0.379
2009 Wu W, Ponizovskaya E, Kim E, Cho D, Bratkovsky A, Yu Z, Xia Q, Li X, Shen YR, Wang SY, Williams RS. Geometrical dependence of optical negative index meta-materials at 1.55 μm Applied Physics a: Materials Science and Processing. 95: 1119-1122. DOI: 10.1007/S00339-009-5139-9  0.367
2008 Wu W, Tong WM, Bartman J, Chen Y, Walmsley R, Yu Z, Xia Q, Park I, Picciotto C, Gao J, Wang SY, Morecroft D, Yang J, Berggren KK, Williams RS. Sub-10 nm nanoimprint lithography by wafer bowing. Nano Letters. 8: 3865-9. PMID 18837563 DOI: 10.1021/Nl802295N  0.653
2008 Li Z, Li X, Ohlberg DAA, Straznicky J, Wu W, Yu Z, Borghetti J, Tong W, Stewart D, Williams RS. Fabrication and test of nano crossbar switches/MOSFET hybrid circuits by imprinting lithography Proceedings of Spie. 6921: 692108. DOI: 10.1117/12.774144  0.35
2007 Chang ASP, Tan H, Bai S, Wu W, Yu Z, Chou SY. Tunable external cavity laser with a liquid-crystal subwavelength resonant grating filter as wavelength-selective mirror Ieee Photonics Technology Letters. 19: 1099-1101. DOI: 10.1109/Lpt.2007.899437  0.505
2007 Yu Z, Gao H, Chou SY. RIMS (real-time imprint monitoring by scattering of light) study of pressure, temperature and resist effects on nanoimprint lithography Nanotechnology. 18. DOI: 10.1088/0957-4484/18/6/065304  0.591
2007 Wu W, Yu Z, Wang SY, Williams RS, Liu Y, Sun C, Zhang X, Kim E, Shen YR, Fang NX. Midinfrared metamaterials fabricated by nanoimprint lithography Applied Physics Letters. 90. DOI: 10.1063/1.2450651  0.308
2007 Cui B, Yu Z, Ge H, Chou SY. Large area 50 nm period grating by multiple nanoimprint lithography and spatial frequency doubling Applied Physics Letters. 90. DOI: 10.1063/1.2390652  0.634
2007 Wu W, Kim E, Ponizovskaya E, Liu Y, Yu Z, Fang N, Shen YR, Bratkovsky AM, Tong W, Sun C, Zhang X, Wang S-, Williams RS. Optical metamaterials at near and mid-IR range fabricated by nanoimprint lithography Applied Physics A. 87: 143-150. DOI: 10.1007/S00339-006-3834-3  0.346
2006 Jung GY, Johnston-Halperin E, Wu W, Yu Z, Wang SY, Tong WM, Li Z, Green JE, Sheriff BA, Boukai A, Bunimovich Y, Heath JR, Williams RS. Circuit fabrication at 17 nm half-pitch by nanoimprint lithography. Nano Letters. 6: 351-4. PMID 16522021 DOI: 10.1021/Nl052110F  0.398
2006 Yu Z, Wu W, Jung G, Olynick DL, Straznicky J, Li X, Li Z, Tong WM, Liddle JA, Wang S, Williams RS. Fabrication of 30 nm pitch imprint moulds by frequency doubling for nanowire arrays Nanotechnology. 17: 4956-4961. DOI: 10.1088/0957-4484/17/19/030  0.392
2006 Xia Q, Yu Z, Gao H, Chou SY. In situ real time monitoring of nanosecond imprint process Applied Physics Letters. 89. DOI: 10.1063/1.2335952  0.603
2005 Reisner W, Morton KJ, Riehn R, Wang YM, Yu Z, Rosen M, Sturm JC, Chou SY, Frey E, Austin RH. Statics and dynamics of single DNA molecules confined in nanochannels. Physical Review Letters. 94: 196101. PMID 16090189 DOI: 10.1103/Physrevlett.94.196101  0.669
2004 Yu Z, Gao H, Chou SY. In situ real time process characterization in nanoimprint lithography using time-resolved diffractive scatterometry Applied Physics Letters. 85: 4166-4168. DOI: 10.1063/1.1811396  0.589
2004 Austin MD, Ge H, Wu W, Li M, Yu Z, Wasserman D, Lyon SA, Chou SY. Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography Applied Physics Letters. 84: 5299-5301. DOI: 10.1063/1.1766071  0.624
2004 Yu Z, Chou SY. Triangular Profile Imprint Molds in Nanograting Fabrication Nano Letters. 4: 341-344. DOI: 10.1021/Nl034947L  0.562
2003 Yu Z, Gao H, Wu W, Ge H, Chou SY. Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff Journal of Vacuum Science & Technology B. 21: 2874-2877. DOI: 10.1116/1.1619958  0.631
2003 Yu Z, Chen L, Wu W, Ge H, Chou SY. Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography Journal of Vacuum Science & Technology B. 21: 2089-2092. DOI: 10.1116/1.1609471  0.554
2003 Lei X, Wu L, Deshpande P, Yu Z, Wu W, Ge H, Chou SY. 100 nm period gratings produced by lithographically induced self-construction Nanotechnology. 14: 786-790. DOI: 10.1088/0957-4484/14/7/315  0.562
2003 Xia Q, Keimel C, Ge H, Yu Z, Wu W, Chou SY. Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography Applied Physics Letters. 83: 4417-4419. DOI: 10.1063/1.1630162  0.548
2002 Cao H, Yu Z, Wang J, Tegenfeldt JO, Austin RH, Chen E, Wu W, Chou SY. Fabrication of 10 nm enclosed nanofluidic channels Applied Physics Letters. 81: 174-176. DOI: 10.1063/1.1489102  0.531
2001 Yu Z, Wu W, Chen L, Chou SY. Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications Journal of Vacuum Science & Technology B. 19: 2816-2819. DOI: 10.1116/1.1409384  0.585
2000 Yu Z, Deshpande P, Wu W, Wang J, Chou SY. Reflective polarizer based on a stacked double-layer subwavelength metal grating structure fabricated using nanoimprint lithography Applied Physics Letters. 77: 927-929. DOI: 10.1063/1.1288674  0.516
1999 Wang J, Schablitsky S, Yu Z, Wu W, Chou SY. Fabrication of a new broadband waveguide polarizer with a double-layer 190 nm period metal-gratings using nanoimprint lithography Journal of Vacuum Science & Technology B. 17: 2957-2960. DOI: 10.1116/1.590933  0.555
1999 Yu Z, Schablitsky SJ, Chou SY. Nanoscale GaAs metal–semiconductor–metal photodetectors fabricated using nanoimprint lithography Applied Physics Letters. 74: 2381-2383. DOI: 10.1063/1.123858  0.498
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