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Jaehyuk Chang, Ph.D. - Publications

Affiliations: 
2003 University of Wisconsin, Madison, Madison, WI 
Area:
Mechanical Engineering
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5 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2004 Eguchi H, Susa T, Sumida T, Kurosu T, Yoshii T, Yotsui K, Itoh K, Tamura A, Engelstad RL, Lovell EG, Azkorra X, Mikkelson A, Chang J, Janowski SM. Stress and image-placement distortions of 200 mm low-energy electron projection lithography masks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3087-3091. DOI: 10.1116/1.1824054  0.563
2004 Chang J, Engelstad RL, Lovell EG, Trybula WJ, Wood OR. Assessment of image placement errors induced in electron projection lithography masks by chucking Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3077-3081. DOI: 10.1116/1.1808737  0.618
2004 Wei A, Abdo A, Nellis G, Engelstad RL, Chang J, Lovell EG, Beckman W. Modeling fluid thermomechanical response for immersion lithography scanning Microelectronic Engineering. 73: 29-34. DOI: 10.1016/J.Mee.2004.02.011  0.626
2003 Chang J, Nellis GF, Engelstad RL, Lovell EG, Sogard MR. Wafer heating analysis for electron-beam projection lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 2657-2662. DOI: 10.1116/1.1625960  0.621
2003 Wei A, Abdo A, Nellis G, Engelstad R, Chang J, Lovell E, Beckman W. Simulating fluid flow characteristics during the scanning process for immersion lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 2788-2793. DOI: 10.1116/1.1622939  0.61
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