| Year |
Citation |
Score |
| 2019 |
Jiang J, Jung B, Thompson MO, Ober CK. Chemical reaction and diffusion kinetics during laser-induced submillisecond heating for lithographic applications Journal of Vacuum Science & Technology B. 37: 041601. DOI: 10.1116/1.5086871 |
0.477 |
|
| 2017 |
Jiang J, Jacobs AG, Wenning B, Liedel C, Thompson MO, Ober CK. Ultrafast Self-Assembly of Sub-10 nm Block Copolymer Nanostructures by Solvent-Free High-Temperature Laser Annealing. Acs Applied Materials & Interfaces. PMID 28598156 DOI: 10.1021/Acsami.7B00774 |
0.582 |
|
| 2015 |
Li L, Chakrabarty S, Jiang J, Zhang B, Ober C, Giannelis EP. Solubility studies of inorganic-organic hybrid nanoparticle photoresists with different surface functional groups. Nanoscale. PMID 26695121 DOI: 10.1039/C5Nr07334K |
0.479 |
|
| 2015 |
Jiang J, Jacobs A, Thompson MO, Ober CK. Laser spike annealing of DSA photoresists Journal of Photopolymer Science and Technology. 28: 631-634. DOI: 10.2494/Photopolymer.28.631 |
0.508 |
|
| 2015 |
Jiang J, Zhang B, Yu M, Li L, Neisser M, Chun JS, Giannelis EP, Ober CK. Oxide nanoparticle EUV (ONE) photoresists: Current understanding of the unusual patterning mechanism Journal of Photopolymer Science and Technology. 28: 515-518. DOI: 10.2494/Photopolymer.28.515 |
0.452 |
|
| 2015 |
Ober C, Jiang J, Zhang B, Li L, Giannelis E, Chun JS, Neisser M, Sierra-Alvares R. New developments in ligand-stabilized metal oxide nanoparticle photoresists for EUV lithography Proceedings of Spie. 9422: 942207. DOI: 10.1117/12.2086488 |
0.5 |
|
| 2015 |
Zhang B, Li L, Jiang J, Neisser M, Chun JS, Ober CK, Giannelis EP. Studying the mechanism of hybrid nanoparticle EUV photoresists Proceedings of Spie. 9425. DOI: 10.1117/12.2085662 |
0.464 |
|
| 2015 |
Jiang J, Yu M, Zhang B, Neisser M, Chun JS, Giannelis EP, Ober CK. Systematic study of ligand structures of metal oxide EUV nanoparticle photoresists Proceedings of Spie. 9422: 942222. DOI: 10.1117/12.2084896 |
0.468 |
|
| 2015 |
Jacobs AG, Jung B, Jiang J, Ober CK, Thompson MO. Control of polystyrene-block-poly(methyl methacrylate) directed self-Assembly by laser-induced millisecond thermal annealing Journal of Micro/ Nanolithography, Mems, and Moems. 14. DOI: 10.1117/1.Jmm.14.3.031205 |
0.546 |
|
| 2014 |
Jiang J, Chakrabarty S, Yu M, Ober CK. Metal oxide nanoparticle photoresists for EUV patterning Journal of Photopolymer Science and Technology. 27: 663-666. DOI: 10.2494/Photopolymer.27.663 |
0.441 |
|
| 2014 |
Jiang J, Thompson MO, Ober CK. Line width roughness reduction by rational design of photoacid generator for sub-millisecond laser post-exposure bake Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2046277 |
0.517 |
|
| 2013 |
Jiang J, Jung B, Thompson MO, Ober CK. Line edge roughness of high deprotection activation energy photoresist by using sub-millisecond post exposure bake Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2011667 |
0.491 |
|
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