Year |
Citation |
Score |
2014 |
Hutagalung SD, Lew KC, Darsono T. Nanoscale patterning by afm lithography and its application on the fabrication of silicon nanowire devices Sains Malaysiana. 43: 267-272. |
0.376 |
|
2012 |
Hutagalung SD, Lew KC. Effect of TMAH etching duration on the formation of silicon nanowire transistor patterned by AFM nanolithography Sains Malaysiana. 41: 1023-1028. |
0.464 |
|
2011 |
Hutagalung SD, Lew KC. Current-voltage characteristics of side-gated silicon nanowire transistor fabricated by AFM lithography Advanced Materials Research. 277: 84-89. DOI: 10.4028/www.scientific.net/AMR.277.84 |
0.373 |
|
2010 |
Lew KC, Hutagalung SD. Silicon nanowire transistor fabricated by AFM nanolithography followed by wet chemical etching process International Journal of Nanoscience. 9: 289-293. DOI: 10.1142/S0219581X1000682X |
0.422 |
|
2010 |
Hutagalung SD, Lew KC. Electrical characteristics of silicon nanowire transistor fabricated by AFM lithography Ieee International Conference On Semiconductor Electronics, Proceedings, Icse. 358-362. DOI: 10.1109/SMELEC.2010.5549507 |
0.425 |
|
2009 |
Redwing JM, Nimmatoori P, Lew KK, Zhang X, Zhang Q, Clark TE, Pan L, Dickey EC. Growth mechanisms and size-dependent characteristics of Si and Si 1-xGex nanowires Ecs Transactions. 25: 1145-1152. DOI: 10.1149/1.3207718 |
0.813 |
|
2009 |
Chen KP, Yoon SF, Ng TK, Tanoto H, Lew KL, Dohrman CL, Fitzgerald EA. Study of surface microstructure origin and evolution for GaAs grown on Ge/Si1-xGex/Si substrate Journal of Physics D: Applied Physics. 42. DOI: 10.1088/0022-3727/42/3/035303 |
0.409 |
|
2009 |
Tanoto H, Yoon SF, Lew KL, Loke WK, Dohrman C, Fitzgerald EA, Tang LJ. Electroluminescence and structural characteristics of InAs/ In0.1 Ga0.9 As quantum dots grown on graded Si1-x Gex /Si substrate Applied Physics Letters. 95. DOI: 10.1063/1.3243984 |
0.352 |
|
2009 |
VanMil BL, Lew KK, Myers-Ward RL, Holm RT, Gaskill DK, Eddy CR, Wang L, Zhao P. Etch rates near hot-wall CVD growth temperature for Si-face 4H-SiC using H2 and C3H8 Journal of Crystal Growth. 311: 238-243. DOI: 10.1016/j.jcrysgro.2008.11.030 |
0.354 |
|
2009 |
Ng TK, Yoon SF, Tan KH, Chen KP, Tanoto H, Lew KL, Wicaksono S, Loke WK, Dohrman C, Fitzgerald EA. Molecular beam epitaxy growth of bulk GaNAsSb on Ge/graded-SiGe/Si substrate Journal of Crystal Growth. 311: 1754-1757. DOI: 10.1016/J.Jcrysgro.2008.09.207 |
0.4 |
|
2008 |
Ho TT, Wang Y, Eichfeld S, Lew KK, Liu B, Mohney SE, Redwing JM, Mayer TS. In situ axially doped n-channel silicon nanowire field-effect transistors. Nano Letters. 8: 4359-64. PMID 19367848 DOI: 10.1021/Nl8022059 |
0.746 |
|
2008 |
Li M, Bhiladvala RB, Morrow TJ, Sioss JA, Lew KK, Redwing JM, Keating CD, Mayer TS. Bottom-up assembly of large-area nanowire resonator arrays. Nature Nanotechnology. 3: 88-92. PMID 18654467 DOI: 10.1038/Nnano.2008.26 |
0.562 |
|
2008 |
Clark TE, Nimmatoori P, Lew KK, Pan L, Redwing JM, Dickey EC. Diameter dependent growth rate and interfacial abruptness in vapor-liquid-solid Si/Si1-xGex heterostructure nanowires. Nano Letters. 8: 1246-52. PMID 18321076 DOI: 10.1021/Nl072849K |
0.799 |
|
2008 |
VanMil BL, Stahlbush RE, Myers-Ward RL, Lew KK, Eddy CR, Gaskill DK. Basal plane dislocation reduction for 8° off-cut, 4H-SiC using in situ variable temperature growth interruptions Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 1504-1507. DOI: 10.1116/1.2918317 |
0.327 |
|
2008 |
Liu B, Wang Y, Ho TT, Lew KK, Eichfeld SM, Redwing JM, Mayer TS, Mohney SE. Oxidation of silicon nanowires for top-gated field effect transistors Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 370-374. DOI: 10.1116/1.2899333 |
0.754 |
|
2008 |
Hu J, Xin X, Li X, Zhao JH, VanMil BL, Lew KK, Myers-Ward RL, Eddy CR, Gaskill DK. 4H-SiC visible-blind single-photon avalanche diode for ultraviolet detection at 280 and 350 nm Ieee Transactions On Electron Devices. 55: 1977-1983. DOI: 10.1109/Ted.2008.926669 |
0.314 |
|
2008 |
Chen KP, Yoon SF, Ng TK, Tanoto H, Lew KL, Dohrman CL, Fitzgerald EA. Characterization of GaAs grown on SiGe/Si graded substrates using p-n junction diodes Journal of Applied Physics. 104. DOI: 10.1063/1.2988294 |
0.485 |
|
2008 |
Lew KL, Yoon SF, Tanoto H, Chen KP, Dohrman CL, Isaacson DM, Fitzgerald EA. InGaP/GaAs heterojunction bipolar transistor grown on Si substrate with SiGe graded buffer layer Electronics Letters. 44: 243-244. DOI: 10.1049/El:20083328 |
0.418 |
|
2008 |
Lu Q, Adu KW, Gutiérrez HR, Chen G, Lew KK, Nimmatoori P, Zhang X, Dickey EC, Redwing JM, Eklund PC. Raman scattering from Si1-xGex alloy nanowires Journal of Physical Chemistry C. 112: 3209-3215. DOI: 10.1021/Jp074764D |
0.786 |
|
2008 |
Vanmil BL, Lew KK, Myers-Ward RL, Eddy CR, Gaskill DK. Real-time in situ tracking of gas-phase carbon-to-silicon ratio during hot-wall CVD growth of SiC Journal of Electronic Materials. 37: 685-690. DOI: 10.1007/s11664-007-0306-2 |
0.389 |
|
2007 |
Zhang X, Lew KK, Nimmatoori P, Redwing JM, Dickey EC. Diameter-dependent composition of vapor-liquid-solid grown Si(1-x)Ge(x) nanowires. Nano Letters. 7: 3241-5. PMID 17894516 DOI: 10.1021/Nl071132U |
0.769 |
|
2007 |
Goodey AP, Eichfeld SM, Lew KK, Redwing JM, Mallouk TE. Silicon nanowire array photelectrochemical cells. Journal of the American Chemical Society. 129: 12344-5. PMID 17892289 DOI: 10.1021/Ja073125D |
0.8 |
|
2007 |
Lew KL, Yoon SF, Loke WK, Tanoto H, Dohrman CL, Isaacson DM, Fitzgerald EA. High gain AlGaAsGaAs heterojunction bipolar transistor fabricated on SiGeSi substrate Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 902-905. DOI: 10.1116/1.2740278 |
0.305 |
|
2007 |
Ho TT, Wang Y, Liu B, Eichfeld S, Lew KK, Mohney S, Redwing J, Mayer T. Top-gated field effect transistors fabricated using thermally-oxidized silicon nanowires synthesized by vapor-liquid solid growth 2007 International Semiconductor Device Research Symposium, Isdrs. DOI: 10.1109/ISDRS.2007.4422515 |
0.737 |
|
2006 |
Lew KK, Pan L, Dickey EC, Redwing JM. Effect of growth conditions on the composition and structure of Si1-xGex nanowires grown by vapor-liquid-solid growth Journal of Materials Research. 21: 2876-2881. DOI: 10.1557/Jmr.2006.0349 |
0.748 |
|
2006 |
Shir D, Liu BZ, Mohammad AM, Lew KK, Mohney SE. Oxidation of silicon nanowires Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 1333-1336. DOI: 10.1116/1.2198847 |
0.399 |
|
2005 |
Wang Y, Lew KK, Ho TT, Pan L, Novak SW, Dickey EC, Redwing JM, Mayer TS. Use of phosphine as an n-type dopant source for vapor-liquid-solid growth of silicon nanowires. Nano Letters. 5: 2139-43. PMID 16277441 DOI: 10.1021/Nl051442H |
0.598 |
|
2005 |
Pan L, Lew KK, Redwing JM, Dickey EC. Stranski-Krastanow growth of germanium on silicon nanowires. Nano Letters. 5: 1081-5. PMID 15943447 DOI: 10.1021/Nl050605Z |
0.752 |
|
2005 |
Dilts SM, Mohmmad A, Lew KK, Redwing JM, Mohney SE. Fabrication and electrical characterization of silicon nanowire arrays Materials Research Society Symposium Proceedings. 832: 287-292. DOI: 10.1557/Proc-832-F9.10 |
0.687 |
|
2005 |
Redwing JM, Dilts SM, Lew KK, Cranmer A, Mohney SE. High density group iv semiconductor nanowire arrays fabricated in nanoporous alumina templates Proceedings of Spie - the International Society For Optical Engineering. 6003. DOI: 10.1117/12.632745 |
0.691 |
|
2005 |
Wang Y, Lew KK, Mattzela J, Redwing J, Mayer T. Top-gated field effect devices using oxidized silicon nanowires Device Research Conference - Conference Digest, Drc. 2005: 159-160. DOI: 10.1109/DRC.2005.1553101 |
0.413 |
|
2005 |
Pan L, Lew KK, Redwing JM, Dickey EC. Effect of diborane on the microstructure of boron-doped silicon nanowires Journal of Crystal Growth. 277: 428-436. DOI: 10.1016/J.Jcrysgro.2005.01.091 |
0.73 |
|
2005 |
Bogart TE, Dey S, Lew KK, Mohney SE, Redwing JM. Diameter-controlled synthesis of silicon nanowires using nanoporous alumina membranes Advanced Materials. 17: 114-117. DOI: 10.1002/Adma.200400373 |
0.587 |
|
2004 |
Lew KK, Pan L, Bogart TE, Dilts SM, Dickey EC, Redwing JM, Wang Y, Cabassi M, Mayer TS, Novak SW. Structural and electrical properties of trimethylboron-doped silicon nanowires Applied Physics Letters. 85: 3101-3103. DOI: 10.1063/1.1792800 |
0.632 |
|
2004 |
Dickey EC, Pan L, Lew KK, Redwing JM. Development of doped and heterostructured Si-Ge nanowires Microscopy and Microanalysis. 10: 22-23. DOI: 10.1017/S143192760488574X |
0.714 |
|
2003 |
Mohammad AM, Dey S, Lew KK, Redwing JM, Mohney SE. Fabrication of Cobalt Silicide Nanowire Contacts to Silicon Nanowires Journal of the Electrochemical Society. 150. DOI: 10.1149/1.1598966 |
0.699 |
|
2003 |
Lew KK, Redwing JM. Growth characteristics of silicon nanowires synthesized by vapor-liquid-solid growth in nanoporous alumina templates Journal of Crystal Growth. 254: 14-22. DOI: 10.1016/S0022-0248(03)01146-1 |
0.684 |
|
2003 |
Lew KK, Pan L, Dickey EC, Redwing JM. Vapor-Liquid-Solid Growth of Silicon-Germanium Nanowires Advanced Materials. 15: 2073-2076. DOI: 10.1002/Adma.200306035 |
0.687 |
|
2002 |
Lew KK, Reuther C, Carim AH, Redwing JM, Martin BR. Template-directed vapor-liquid-solid growth of silicon nanowires Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 389-392. DOI: 10.1116/1.1430240 |
0.753 |
|
2001 |
Carim AH, Lew K, Redwing JM. Bicrystalline Silicon Nanowires Advanced Materials. 13: 1489-1491. DOI: 10.1002/1521-4095(200110)13:19<1489::AID-ADMA1489>3.0.CO;2-E |
0.499 |
|
Show low-probability matches. |