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Sungseo Cho, Ph.D. - Publications

Affiliations: 
2000 University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
design and synthesis of functional organic materials
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8 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Cha MK, Kang CI, Kim SH, Cho SY, Ha YE, Chung DR, Peck KR, Song JH. Emergence of fluoroquinolone-resistant Stenotrophomonas maltophilia in blood isolates causing bacteremia: molecular epidemiology and microbiologic characteristics. Diagnostic Microbiology and Infectious Disease. PMID 27117514 DOI: 10.1016/j.diagmicrobio.2016.02.020  0.302
2016 Kim S, Kim H, Jung S, Kim MH, Lee SH, Cho S, Park BG. Tuning resistive switching parameters in Si3N4-based RRAM for three-dimensional vertical resistive memory applications Journal of Alloys and Compounds. 663: 419-423. DOI: 10.1016/j.jallcom.2015.10.142  0.334
2015 Kim JE, Kim HJ, Lew BL, Lee KH, Hong SP, Jang YH, Park KY, Seo SJ, Bae JM, Choi EH, Suhr KB, Lee SC, Ko HC, Park YL, Son SW, ... Cho SH, et al. Consensus Guidelines for the Treatment of Atopic Dermatitis in Korea (Part II): Systemic Treatment. Annals of Dermatology. 27: 578-92. PMID 26512172 DOI: 10.5021/ad.2015.27.5.578  0.473
2015 Kim JE, Kim HJ, Lew BL, Lee KH, Hong SP, Jang YH, Park KY, Seo SJ, Bae JM, Choi EH, Suhr KB, Lee SC, Ko HC, Park YL, Son SW, ... Cho SH, et al. Consensus Guidelines for the Treatment of Atopic Dermatitis in Korea (Part I): General Management and Topical Treatment. Annals of Dermatology. 27: 563-77. PMID 26512171 DOI: 10.5021/ad.2015.27.5.563  0.471
2004 Yamada S, Cho S, Lee JH, Zhang T, Zampini A. Design and Study of Silicone-based Materials for Bilayer Resist Application Journal of Photopolymer Science and Technology. 17: 511-518. DOI: 10.2494/Photopolymer.17.511  0.594
2000 Brodsky C, Byers J, Conley W, Hung R, Yamada S, Patterson K, Somervell M, Trinque B, Tran HV, Cho S, Chiba T, Lin SH, Jamieson A, Johnson H, Vander Heyden T, et al. 157 nm resist materials: Progress report Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3396-3401. DOI: 10.1116/1.1321762  0.412
1999 Yamachika M, Patterson K, Cho S, Rager T, Yamada S, Byers J, Paniez PJ, Mortini B, Gally S, Sassoulas PO, Willson CG. Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists Journal of Photopolymer Science and Technology. 12: 553-560. DOI: 10.2494/Photopolymer.12.553  0.696
1998 Byers J, Patterson K, Cho S, McCallum M, Willson CG. Recent Advancements In Cycloolefin Based Resists For ArF Lithography. Journal of Photopolymer Science and Technology. 11: 465-474. DOI: 10.2494/Photopolymer.11.465  0.725
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