Year |
Citation |
Score |
2002 |
Ullal SJ, Singh H, Daugherty J, Vahedi V, Aydil ES. Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 1939-1946. DOI: 10.1116/1.1502698 |
0.544 |
|
2002 |
Ullal SJ, Singh H, Daugherty J, Vahedi V, Aydil ES. Maintaining reproducible plasma reactor wall conditions: SF6 plasma cleaning of films deposited on chamber walls during Cl2/O2 plasma etching of Si Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 20: 1195-1201. DOI: 10.1116/1.1479733 |
0.55 |
|
2002 |
Ullal SJ, Singh H, Vahedi V, Aydil ES. Deposition of silicon oxychloride films on chamber walls during Cl2/O2 plasma etching of Si Journal of Vacuum Science and Technology, Part a: Vacuum, Surfaces and Films. 20: 499-506. DOI: 10.1116/1.1450578 |
0.331 |
|
2001 |
Singh H, Coburn JW, Graves DB. Measurements of neutral and ion composition, neutral temperature, and electron energy distribution function in a CF4 inductively coupled plasma Journal of Vacuum Science and Technology, Part a: Vacuum, Surfaces and Films. 19: 718-729. DOI: 10.1116/1.1354603 |
0.518 |
|
2000 |
Singh H, Coburn JW, Graves DB. Appearance potential mass spectrometry: discrimination of dissociative ionization products Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 18: 299-305. DOI: 10.1116/1.582183 |
0.491 |
|
2000 |
Singh H, Coburn JW, Graves DB. Surface loss coefficients of CFx and F radicals on stainless steel Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 18: 2680-2684. DOI: 10.1116/1.1308585 |
0.507 |
|
2000 |
Singh H, Graves DB. Measurements of the electron energy distribution function in molecular gases in a shielded inductively coupled plasma Journal of Applied Physics. 88: 3889-3898. DOI: 10.1063/1.373036 |
0.501 |
|
2000 |
Singh H, Coburn JW, Graves DB. Recombination coefficients of O and N radicals on stainless steel Journal of Applied Physics. 88: 3748-3755. DOI: 10.1063/1.1289046 |
0.517 |
|
1999 |
Singh H, Coburn JW, Graves DB. Mass spectrometric detection of reactive neutral species: Beam-to-background ratio Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 17: 2447-2455. DOI: 10.1116/1.581981 |
0.485 |
|
Show low-probability matches. |