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Chris H. Clifford, Ph.D. - Publications

Affiliations: 
2010 Electrical Engineering & Computer Sciences University of California, Berkeley, Berkeley, CA, United States 
Area:
Integrated Circuits (INC); Solid-State Devices
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26 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2017 Lam M, Clifford C, Raghunathan A, Fenger G, Adam K. Enabling full field physics based OPC via dynamic model generation Proceedings of Spie. 10143: 1014316. DOI: 10.1117/12.2261222  0.459
2017 Chen A, Foong YM, Thaler T, Buttgereit U, Chung A, Burbine A, Sturtevant J, Clifford C, Adam K, DeBisschop P. Effective use of aerial image metrology for calibration of OPC models Proceedings of Spie. 10147. DOI: 10.1117/12.2258632  0.538
2017 Clifford C, Lam M, Raghunathan A, Jiang F, Fenger G, Adam K. Optical proximity correction for anamorphic extreme ultraviolet lithography Journal of Micro-Nanolithography Mems and Moems. 16: 41004. DOI: 10.1117/1.Jmm.16.4.041004  0.433
2017 Lam M, Clifford C, Raghunathan A, Fenger G, Adam K. Enabling full-field physics-based optical proximity correction via dynamic model generation Journal of Micro-Nanolithography Mems and Moems. 16: 33502-33502. DOI: 10.1117/1.Jmm.16.3.033502  0.462
2016 Lam MC, Clifford C, Oliver M, Fryer D, Tejnil E, Adam K. Accurate, full-chip, three-dimensional electromagnetic field model for non-Manhattan mask corners Journal of Micro/ Nanolithography, Mems, and Moems. 15. DOI: 10.1117/1.Jmm.15.2.021204  0.674
2015 Lam M, Clifford C, Oliver M, Fryer D, Tejnil E, Adam K. Accurate, full chip 3D electromagnetic field model for non-Manhattan mask corners Proceedings of Spie - the International Society For Optical Engineering. 9426. DOI: 10.1117/12.2085671  0.658
2015 Civay D, Verduijn E, Clifford C, Mangat P, Wallow T. Subresolution assist features in extreme ultraviolet lithography Journal of Micro/ Nanolithography, Mems, and Moems. 14. DOI: 10.1117/1.Jmm.14.2.023501  0.31
2014 Sturtevant J, Buck P, Schulze S, Fryer D, Tejnil E, Adam K, Lam M, Clifford C, Oliver M, Armeanu A, Kalk F, Nakagawa K, Ning G, Ackmann P, Gans F, et al. 14-nm photomask simulation sensitivity Proceedings of Spie - the International Society For Optical Engineering. 9231. DOI: 10.1117/12.2066483  0.507
2014 Fryer D, Lam M, Adam K, Clifford C, Oliver M, Zuniga C, Sturtevant J, Wang C, Mansfield S. Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk Proceedings of Spie - the International Society For Optical Engineering. 9052. DOI: 10.1117/12.2046489  0.644
2013 Lam MC, Adam K, Fryer D, Zuniga C, Wei H, Oliver M, Clifford CH. Accurate 3DEMF mask model for full-chip simulation Proceedings of Spie - the International Society For Optical Engineering. 8683. DOI: 10.1117/12.2013167  0.674
2013 Coskun TH, Clifford C, Fenger G, Chua GS, Standiford K, Schlief R, Higgins C, Zou Y. Evaluation of methods to improve EUV OPC model accuracy Proceedings of Spie - the International Society For Optical Engineering. 8679. DOI: 10.1117/12.2009281  0.422
2012 Clifford CH, Zou Y, Latypov A, Kritsun O, Wallow T, Levinson HJ, Jiang F, Civay D, Standiford K, Schlief R, Sun L, Wood OR, Raghunathan S, Mangat P, Koh HP, et al. EUV OPC for the 20nm node and beyond Proceedings of Spie - the International Society For Optical Engineering. 8322. DOI: 10.1117/12.916171  0.337
2011 Pang L, Clifford C, Hu P, Peng D, Li Y, Chen D, Satake M, Tolani V, He L. Compensation for EUV multilayer defects within arbitrary layouts by absorber pattern modification Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.879556  0.455
2011 Pang L, Peng D, Hu P, Chen D, He L, Li Y, Clifford C, Tolani V. Expanding the applications of computational lithography and inspection (CLI) in mask inspection, metrology, review, and repair Proceedings of Spie - the International Society For Optical Engineering. 7971. DOI: 10.1117/12.879535  0.378
2011 Clifford CH, Chan TT, Neureuther AR. Compensation methods for buried defects in extreme ultraviolet lithography masks Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 29: 0110221-0110226. DOI: 10.1117/12.846671  0.576
2010 Neureuther AR, Rubinstein J, Chin E, Wang L, Miller M, Clifford C, Yamazoe K. Modeling optical lithography physics Japanese Journal of Applied Physics. 49: 06GA011-06GA017. DOI: 10.1143/Jjap.49.06Ga01  0.614
2009 Clifford CH, Chan TT, Neureuther AR, Goldberg KA, Mochi I, Liang T. Investigation of buried EUV mask defect printability using actinic inspection and fast simulation Proceedings of Spie - the International Society For Optical Engineering. 7488. DOI: 10.1117/12.829716  0.528
2009 Clifford CH, Wiraatmadja S, Chan TT, Neureuther AR, Goldberg KA, Mochi I, Liang T. Comparison of fast 3D simulation and actinic inspection for EUV masks with buried defects Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.813846  0.578
2009 Clifford CH, Neureuther AR. Fast simulation methods and modeling for extreme ultraviolet masks with buried defects Journal of Micro/Nanolithography, Mems, and Moems. 8. DOI: 10.1117/1.3152372  0.617
2009 Clifford CH, Wiraatmadja S, Chan TT, Neureuther AR, Goldberg KA, Mochi I, Liang T. Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2888-2893. DOI: 10.1116/1.3244624  0.589
2008 Gallagher E, Badger K, Lawliss M, Kodera Y, Azpiroz JT, Pang S, Zhang H, Eugenieva E, Clifford C, Goonesekera A, Tian Y. Wafer Plane Inspection Evaluated for Photomask Production Proceedings of Spie - the International Society For Optical Engineering. 7122. DOI: 10.1117/12.801945  0.399
2008 Clifford CH, Neureuther AR. Smoothing based model for images of buried EUV multilayer defects near absorber features Proceedings of Spie - the International Society For Optical Engineering. 7122. DOI: 10.1117/12.801311  0.587
2008 Clifford CH, Neureuther AR. Smoothing based model for images of isolated buried EUV multilayer defects Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.771530  0.624
2007 Clifford CH, Neureuther AR. Fast three-dimensional simulation of buried EUV mask defect interaction with absorber features Proceedings of Spie - the International Society For Optical Engineering. 6730. DOI: 10.1117/12.746486  0.581
2007 Neureuther A, Poppe W, Holwill J, Chin E, Wang L, Yang JS, Miller M, Ceperley D, Clifford C, Kikuchi K, Choi J, Dornfeld D, Friedberg P, Spanos C, Hoang J, et al. Collaborative platform, tool-kit, and physical models for DfM Proceedings of Spie - the International Society For Optical Engineering. 6521. DOI: 10.1117/12.721199  0.582
2007 Clifford CH, Neureuther AR. Fast simulation of buried EUV mask defect interaction with absorber features Proceedings of Spie - the International Society For Optical Engineering. 6517. DOI: 10.1117/12.711173  0.619
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