Year |
Citation |
Score |
2014 |
Yang Y, Lee H, Liu C, Yu H, Tsai K, Li J. Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts Proceedings of Spie. 9050: 905032. DOI: 10.1117/12.2048683 |
0.33 |
|
2013 |
Chen CY, Ng PCW, Liu CH, Shen YT, Tsai KY, Li JH, Shieh JJ, Chen AC. Direct-scatterometry-enabled optical-proximity-correction-model calibration Proceedings of Spie - the International Society For Optical Engineering. 8681. DOI: 10.1117/12.2009064 |
0.316 |
|
2013 |
Liu C, Ng PCW, Shen Y, Chien S, Tsai K. Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam–direct-write lithography Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 31: 21605. DOI: 10.1116/1.4790655 |
0.3 |
|
2013 |
Ng PCW, Tsai K, Melvin LS. Study of etching bias modeling and correction strategies for compensation of patterning process effects Microelectronic Engineering. 110: 147-151. DOI: 10.1016/J.Mee.2013.03.024 |
0.302 |
|
2012 |
Shen YT, Liu CH, Chen CY, Ng HT, Tsai KY, Wang FM, Kuan CH, Lee YM, Cheng HH, Li JH, Chen AC. Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples Proceedings of Spie - the International Society For Optical Engineering. 8324. DOI: 10.1117/12.918109 |
0.309 |
|
2012 |
Chen CY, Tsai KY, Shen YT, Lee YM, Li JH, Shieh JJ, Chen AC. Direct-scatterometry-enabled lithography model calibration Proceedings of Spie - the International Society For Optical Engineering. 8324. DOI: 10.1117/12.917516 |
0.33 |
|
2012 |
Ng H, Shen Y, Chen S, Liu C, Ng PCW, Tsai K. New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints Journal of Micro-Nanolithography Mems and Moems. 11. DOI: 10.1117/1.Jmm.11.3.033007 |
0.31 |
|
2012 |
Liu C, Ng H, Tsai K. New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography Journal of Micro-Nanolithography Mems and Moems. 11: 13009. DOI: 10.1117/1.Jmm.11.1.013009 |
0.313 |
|
2011 |
Ng PCW, Tsai K, Melvin LS. Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects Journal of Micro-Nanolithography Mems and Moems. 10: 33010. DOI: 10.1117/1.3616043 |
0.373 |
|
2011 |
Ng PCW, Tsai K, Lee Y, Wang F, Li J, Chen AC. Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects Journal of Micro-Nanolithography Mems and Moems. 10: 13004. DOI: 10.1117/1.3533222 |
0.312 |
|
2011 |
Chen S, Ng H, Ma S, Chen H, Liu C, Tsai K. Lithography-patterning-fidelity-aware electron-optical system design optimization Journal of Vacuum Science & Technology B. 29. DOI: 10.1116/1.3662402 |
0.312 |
|
2010 |
Chen S, Chen S, Chen H, Tsai K, Pan H. Manufacturability Analysis of a Micro-Electro-Mechanical Systems–Based Electron-Optical System Design for Direct-Write Lithography Japanese Journal of Applied Physics. 49. DOI: 10.1143/Jjap.49.06Ge05 |
0.302 |
|
2010 |
Tsai K, Chen S, Pei T, Li J. Fresnel Zone Plate Manufacturability Analysis for Direct-Write Lithography by Simulating Focusing and Patterning Performance versus Fabrication Errors Japanese Journal of Applied Physics. 49. DOI: 10.1143/Jjap.49.06Gd08 |
0.301 |
|
2010 |
Liu C, Tien P, Ng PCW, Shen Y, Tsai K. Model-based proximity effect correction for electron-beam direct-write lithography Proceedings of Spie. 7637. DOI: 10.1117/12.846706 |
0.316 |
|
2010 |
Ng PCW, Tsai KY, Tang CH, Melvin L. A non-delta-chrome OPC methodology for process models with three-dimensional mask effects Proceedings of Spie - the International Society For Optical Engineering. 7640. DOI: 10.1117/12.846687 |
0.334 |
|
2008 |
Su Y, Ng PCW, Tsai K, Chen Y. Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence Proceedings of Spie. 6924. DOI: 10.1117/12.772397 |
0.317 |
|
2004 |
Tsai K, Hindi HA. DQIT: /spl mu/-synthesis without D-scale fitting Ieee Transactions On Automatic Control. 49: 2028-2032. DOI: 10.1109/Tac.2004.837544 |
0.57 |
|
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