Ana R. Ivanova, Ph.D.
Affiliations: | 2000 | State University of New York, Albany, Albany, NY, United States |
Area:
Materials Science Engineering, Condensed Matter Physics, Chemical EngineeringGoogle:
"Ana Ivanova"Parents
Sign in to add mentorAlain E. Kaloyeros | grad student | 2000 | SUNY Albany | |
(The mechanisms of formation of epitaxial cobalt silicide from chemical vapor deposited cobalt for microelectronics applications.) |
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Publications
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Ivanova AR, Galewski CJ, Sans CA, et al. (1999) Integration of PECVD tungsten nitride as a barrier layer for copper metallization Materials Research Society Symposium - Proceedings. 564: 321-326 |
Ivanova AR, Nuesca G, Chen X, et al. (1999) Effects of processing parameters in the chemical vapor deposition of cobalt from cobalt tricarbonyl nitrosyl Journal of the Electrochemical Society. 146: 2139-2145 |
Faltermeier CG, Goldberg C, Jones M, et al. (1998) The effects of processing parameters in the low-temperature chemical vapor deposition of titanium nitride from tetraiodotitanium Journal of the Electrochemical Society. 145: 676-683 |