Year |
Citation |
Score |
2019 |
Chang Y, Kishore J, Shadman F. Run-Away Energetic Reactions in the Exhaust of Deposition Reactors Advances in Chemical Engineering and Science. 9: 223-238. DOI: 10.4236/Aces.2019.92017 |
0.365 |
|
2019 |
Wu J, Shadman F. A Controlled Mixing Method for Stabilizing the Purity and Reducing the Waste in Gas Delivery Systems Advances in Chemical Engineering and Science. 9: 11-26. DOI: 10.4236/Aces.2019.91002 |
0.377 |
|
2018 |
Li M, Shadman F, Ogden KL. Algae-based sorbents for removal of gallium from semiconductor manufacturing wastewater Clean Technologies and Environmental Policy. 20: 899-907. DOI: 10.1007/S10098-018-1497-3 |
0.423 |
|
2017 |
Zeng C, Shadman F, Sierra-Alvarez R. Transport and abatement of fluorescent silica nanoparticle (SiO2 NP) in granular filtration: effect of porous media and ionic strength Journal of Nanoparticle Research. 19: 105. DOI: 10.1007/S11051-017-3808-8 |
0.307 |
|
2016 |
Zhao M, Alobeidli A, Chen X, Yam P, Zanelli C, Maraviov S, Nagel M, Shadman F, Keswani MK. Investigation of Acoustic Cavitation in Aqueous Surfactant Solutions for Cleaning Applications Mrs Advances. 1: 2255-2260. DOI: 10.1557/Adv.2016.313 |
0.318 |
|
2016 |
Zhao M, Jakes K, Luke K, Kishore J, Gouk R, Verhaverbeke S, Shadman F, Keswani MK. Application of Process Simulation for Comparison of Contactless and Conventional Electrodeposition Methods for 3D Packaging Ecs Journal of Solid State Science and Technology. 5. DOI: 10.1149/2.0111609Jss |
0.308 |
|
2015 |
Zhao M, Balachandran R, Patterson Z, Gouk R, Verhaverbeke S, Shadman F, Keswani M. Contactless bottom-up electrodeposition of nickel for 3D integrated circuits Rsc Advances. 5: 45291-45299. DOI: 10.1039/C5Ra03683F |
0.382 |
|
2015 |
Speed D, Westerhoff P, Sierra-Alvarez R, Draper R, Pantano P, Aravamudhan S, Chen KL, Hristovski K, Herckes P, Bi X, Yang Y, Zeng C, Otero-Gonzalez L, Mikoryak C, Wilson BA, ... ... Shadman F, et al. Physical, chemical, and in vitro toxicological characterization of nanoparticles in chemical mechanical planarization suspensions used in the semiconductor industry: Towards environmental health and safety assessments Environmental Science: Nano. 2: 227-244. DOI: 10.1039/C5En00046G |
0.306 |
|
2015 |
Kishore J, Shadman F, Dittler R, Carl G. Pressure cycling for purging of dead spaces in high-purity gas delivery systems Aiche Journal. 61: 3973-3980. DOI: 10.1002/Aic.14890 |
0.778 |
|
2014 |
Dittler R, Kishore J, Geisert C, Shadman F. Contamination of Ultra-High-Purity (UHP) Gas Distribution Systems by Back Diffusion of Impurities Journal of the Iest. 57: 63-76. DOI: 10.17764/Jiet.57.1.Lj5X82412J018246 |
0.774 |
|
2014 |
Dodge MR, Shadman F. Computer modeling of surface interactions and contaminant transport in microstructures during the rinsing of patterned semiconductor wafers Computers and Chemical Engineering. 68: 182-189. DOI: 10.1016/J.Compchemeng.2014.05.018 |
0.384 |
|
2013 |
Zamani D, Dhane K, Mahdavi O, McBride MA, Yan J, Shadman F. Surface cleaning of small structures during spin rinsing of patterned substrates Microelectronic Engineering. 108: 57-65. DOI: 10.1016/J.Mee.2013.02.092 |
0.766 |
|
2013 |
Rottman J, Sierra-Alvarez R, Shadman F. Real-time monitoring of nanoparticle retention in porous media Environmental Chemistry Letters. 11: 71-76. DOI: 10.1007/S10311-012-0381-3 |
0.309 |
|
2013 |
Wang H, Shadman F. Effect of particle size on the adsorption and desorption properties of oxide nanoparticles Aiche Journal. 59: 1502-1510. DOI: 10.1002/Aic.13936 |
0.406 |
|
2012 |
Rottman J, Shadman F, Sierra-Alvarez R. Interactions of inorganic oxide nanoparticles with sewage biosolids. Water Science and Technology : a Journal of the International Association On Water Pollution Research. 66: 1821-7. PMID 22925851 DOI: 10.2166/Wst.2012.354 |
0.35 |
|
2012 |
Zamani D, Keswani M, Mahdavi O, Yan J, Raghavan S, Shadman F. Dynamics of interactions between HF and hafnium oxide during surface preparation of high-k dielectrics Ieee Transactions On Semiconductor Manufacturing. 25: 511-515. DOI: 10.1109/Tsm.2012.2196295 |
0.824 |
|
2011 |
Zamani D, Keswani M, Yan J, Raghavan S, Shadman F. Determining the fundamental kinetic parameters for rinsing and cleaning of hafnium-based high-k materials Ecs Transactions. 41: 45-50. DOI: 10.1149/1.3630825 |
0.814 |
|
2011 |
Dhane K, Han J, Yan J, Mahdavi O, Zamani D, Vermeire B, Shadman F. Dynamics of cleaning and rinsing of micro and nano structures in single-wafer cleaning tools Ieee Transactions On Semiconductor Manufacturing. 24: 125-133. DOI: 10.1109/Tsm.2010.2089542 |
0.767 |
|
2011 |
Wang H, Yao J, Shadman F. Characterization of the surface properties of nanoparticles using moisture adsorption dynamic profiling Chemical Engineering Science. 66: 2545-2553. DOI: 10.1016/J.Ces.2011.02.057 |
0.57 |
|
2010 |
Zhang X, Yan J, Vermeire B, Shadman F, Chae J. Passive Wireless Monitoring of Wafer Cleanliness during Rinsing of Semiconductor Wafers Ieee Sensors Journal. 10: 1048-1055. DOI: 10.1109/Jsen.2010.2042443 |
0.33 |
|
2010 |
Yao J, Wang H, Dittler R, Geisert C, Shadman F. Application of pressure-cycle purge (PCP) in dry-down of ultra-high-purity gas distribution systems Chemical Engineering Science. 65: 5041-5050. DOI: 10.1016/J.Ces.2010.06.002 |
0.787 |
|
2009 |
Juneja HS, Yao J, Shadman F. Effect of sampling line characteristics on the dynamic monitoring of fluid concentrations Industrial and Engineering Chemistry Research. 48: 5481-5488. DOI: 10.1021/Ie8016169 |
0.662 |
|
2009 |
Yan J, Dhane K, Vermeire B, Shadman F. In situ and real-time metrology during rinsing of micro- and nano-structures Microelectronic Engineering. 86: 199-205. DOI: 10.1016/J.Mee.2008.10.014 |
0.775 |
|
2007 |
Yao J, Iqbal A, Juneja H, Shadman F. Moisture uptake and outgassing in patterned and capped porous low- k dielectric films Journal of the Electrochemical Society. 154. DOI: 10.1149/1.2759829 |
0.761 |
|
2006 |
Juneja HS, Iqbal A, Yao J, Shadman F. Mechanism and kinetics of nonequilibrium and multilayer adsorption and desorption of gases on solids Industrial and Engineering Chemistry Research. 45: 6585-6593. DOI: 10.1021/Ie060475K |
0.791 |
|
2006 |
Iqbal A, Juneja H, Yao J, Shadman F. Removal of moisture contamination from porous polymeric low-k dielectric films Aiche Journal. 52: 1586-1593. DOI: 10.1002/Aic.10760 |
0.776 |
|
2004 |
Sorooshian J, DeNardis D, Charns L, Li Z, Shadman F, Boning D, Hetherington D, Philipossian A. Arrhenius Characterization of ILD and Copper CMP Processes Journal of the Electrochemical Society. 151. DOI: 10.1149/1.1635388 |
0.354 |
|
2004 |
Yan J, Seif D, Raghavan S, Barnaby HJ, Vermeire B, Peterson T, Shadman F. Sensor for monitoring the rinsing of patterned wafers Ieee Transactions On Semiconductor Manufacturing. 17: 531-537. DOI: 10.1109/Tsm.2004.837001 |
0.312 |
|
2004 |
Raghu P, Yim C, Iqbal A, Shadman F, Shero E, Verghese M. Mechanistic study of surface contamination of dielectric oxides using isotope labeling Industrial and Engineering Chemistry Research. 43: 2977-2985. DOI: 10.1021/Ie0305972 |
0.742 |
|
2004 |
Morris RE, Krikanova E, Shadman F. Photocatalytic membrane for removal of organic contaminants during ultra-purification of water Clean Technologies and Environmental Policy. 6: 96-104. DOI: 10.1007/S10098-003-0198-7 |
0.376 |
|
2004 |
Raghu P, Yim C, Shadman F, Shero E. Susceptibility of SiO2, ZrO2, and HfO2 dielectrics to moisture contamination Aiche Journal. 50: 1881-1888. DOI: 10.1002/Aic.10148 |
0.675 |
|
2003 |
Raghu P, Rana N, Yim C, Shero E, Shadman F. Adsorption of Moisture and Organic Contaminants on Hafnium Oxide, Zirconium Oxide, and Silicon Oxide Gate Dielectrics Journal of the Electrochemical Society. 150. DOI: 10.1149/1.1605747 |
0.806 |
|
2003 |
Rana NB, Shadman F. Effect of interfacial and bulk organic contamination on the quality of thin silicon oxide Ieee Transactions On Semiconductor Manufacturing. 16: 76-81. DOI: 10.1109/Tsm.2002.807736 |
0.785 |
|
2002 |
Rana N, Raghu P, Shadman F. Kinetics and mechanism of carbon incorporation in ultrathin silicon-based dielectric films Journal of the Electrochemical Society. 149. DOI: 10.1149/1.1466863 |
0.798 |
|
2002 |
Rana N, Raghu P, Shero E, Shadman F. Interactions of moisture and organic contaminants with SiO2 and ZrO2 gate dielectric films Applied Surface Science. 205: 160-175. DOI: 10.1016/S0169-4332(02)01014-0 |
0.794 |
|
2002 |
Schmotzer M, Castro ME, Shadman F. Activated carbon removal of organic contaminants in ultra-pure water systems with recycle Clean Technologies and Environmental Policy. 4: 125-132. DOI: 10.1007/S10098-002-0141-3 |
0.429 |
|
2000 |
Shadman F, Seif D, Peterson T. Fundamentals of wafer rinse processes and the interactions with water conservation and recycling in semiconductor manufacturing plants Diffusion and Defect Data Pt.B: Solid State Phenomena. 76: 189-190. DOI: 10.4028/Www.Scientific.Net/Ssp.76-77.189 |
0.397 |
|
2000 |
Kin KT, Shadman F. Mechanisms for synergistic oxidation of organics in ultrapure water systems Ieee Transactions On Semiconductor Manufacturing. 13: 1-9. DOI: 10.1109/66.827334 |
0.404 |
|
2000 |
Wu B, Peterson TW, Shadman F, Senior CL, Morency JR, Huggins FE, Huffman GP. Interactions between vapor-phase mercury compounds and coal char in synthetic flue gas Fuel Processing Technology. 63: 93-107. DOI: 10.1016/S0378-3820(99)00091-0 |
0.386 |
|
1998 |
Kin K, DeGenova J, Shadman F. Oxidation of organic impurities in the recycle and reclaim loops of ultra-pure water plants Clean Products and Processes. 1: 31-38. DOI: 10.1007/S100980050005 |
0.736 |
|
1997 |
Degenova J, Shadman F. Recovery, reuse, and recycle of water in semiconductor wafer fabrication facilities Environmental Progress. 16: 263-267. DOI: 10.1002/Ep.3300160414 |
0.353 |
|
1996 |
Verma NK, Ma C, Shero E, Shadman F. Sources and transport mechanisms of gaseous impurities in vertical thermal reactors Ieee Transactions On Semiconductor Manufacturing. 9: 312-319. DOI: 10.1109/66.536104 |
0.401 |
|
1995 |
Wu B, Jaanu KK, Shadman F. Multi-functional sorbents for the removal of sulfur and metallic contaminants from high-temperature gases Environmental Science and Technology. 29: 1660-1665. DOI: 10.1021/Es00006A033 |
0.385 |
|
1994 |
Scotto MV, Uberoi M, Peterson TW, Shadman F, Wendt JOL. Metal capture by sorbents in combustion processes Fuel Processing Technology. 39: 357-372. DOI: 10.1016/0378-3820(94)90192-9 |
0.353 |
|
1993 |
Verma NK, Haider AM, Shadman F. Contamination of Ultrapure Systems by Back‐Diffusion of Gaseous Impurities Journal of the Electrochemical Society. 140: 1459-1463. DOI: 10.1149/1.2221579 |
0.347 |
|
1992 |
Parks HG, O'Hanlon JF, Shadman F. Research accomplishments at the University of Arizona SEMATECH Center of Excellence for contamination/defect assessment and control Ieee/Semi Advanced Semiconductor Manufacturing Conference and Workshop. 9-16. DOI: 10.1109/66.216932 |
0.335 |
|
1992 |
Governal RA, Bonner A, Shadman F. Effect of System Interactions on the Removal of Total Oxidizable Carbon from DI Water Polishing Loops Ieee Transactions On Semiconductor Manufacturing. 5: 70-73. DOI: 10.1109/66.121983 |
0.313 |
|
1991 |
Governal RA, Bonner A, Shadman F. Effect of Component Interactions on the Removal of Organic Impurities in Ultrapure Water Systems Ieee Transactions On Semiconductor Manufacturing. 4: 298-303. DOI: 10.1109/66.97813 |
0.319 |
|
1991 |
Haider AM, Shadman F. Desorption of Moisture from Stainless Steel Tubes and Alumina Filters in High Purity Gas Distribution Systems Ieee Transactions On Components, Hybrids, and Manufacturing Technology. 14: 507-511. DOI: 10.1109/33.83935 |
0.399 |
|
1991 |
Uberoi M, Shadman F. Simultaneous condensation and reaction of metal compound vapors in porous solids Industrial & Engineering Chemistry Research. 30: 624-631. DOI: 10.1021/Ie00052A004 |
0.33 |
|
1991 |
Uberol M, Shadman F. High-temperature removal of cadmium compounds using solid sorbents Environmental Science and Technology. 25: 1285-1289. DOI: 10.1021/Es00019A009 |
0.376 |
|
1991 |
Governal RA, Yahya MT, Gerba CP, Shadman F. Oligotrophic bacteria in ultra-pure water systems: Media selection and process component evaluations Journal of Industrial Microbiology. 8: 223-227. DOI: 10.1007/Bf01576059 |
0.301 |
|
1990 |
Uberoi M, Punjak WA, Shadman F. The kinetics and mechanism of alkali removal from flue gases by solid sorbents Progress in Energy and Combustion Science. 16: 205-211. DOI: 10.1016/0360-1285(90)90029-3 |
0.409 |
|
1990 |
Zhao Y, Shadman F. Kinetics and mechanism of ilmenite reduction with carbon monoxide Aiche Journal. 36: 1433-1438. DOI: 10.1002/Aic.690360917 |
0.335 |
|
1989 |
Shadman F. Kinetics of soot combustion during regeneration of surface filters Combustion Science and Technology. 63: 183-191. DOI: 10.1080/00102208908947126 |
0.312 |
|
1989 |
Punjak WA, Uberoi M, Shadman F. High-temperature adsorption of alkali vapors on solid sorbents Aiche Journal. 35: 1186-1194. DOI: 10.1002/Aic.690350714 |
0.417 |
|
1988 |
Punjak WA, Shadman F. Aluminosilicate sorbents for control of alkali vapors during coal combustion and gasification Energy and Fuels. 2: 702-708. DOI: 10.1021/Ef00011A017 |
0.387 |
|
1988 |
Shadman F, Punjak WA. Thermochemistry of alkali interactions with refractory adsorbents Thermochimica Acta. 131: 141-152. DOI: 10.1016/0040-6031(88)80069-8 |
0.434 |
|
1988 |
Shadman F, Dombek PE. Enhancement of SO2 sorption on lime by structure modifiers Canadian Journal of Chemical Engineering. 66: 930-935. DOI: 10.1002/Cjce.5450660606 |
0.35 |
|
1987 |
Morris RE, Shadman F. Control of sulphur oxides emission during the roasting of lime-coated metal sulphide pellets Chemical Engineering Science. 42: 9-15. DOI: 10.1016/0009-2509(87)80204-X |
0.309 |
|
1986 |
Sams DA, Shadman F. Mechanism of potassium‐catalyzed carbon/CO2 reaction Aiche Journal. 32: 1132-1137. DOI: 10.1002/Aic.690320710 |
0.319 |
|
1985 |
Bissett EJ, Shadman F. Thermal regeneration of diesel-particulate monolithic filters Aiche Journal. 31: 753-758. DOI: 10.1002/Aic.690310508 |
0.303 |
|
1984 |
Hamilton RT, Sams DA, Shadman F. Variation of rate during potassium-catalysed CO2 gasification of coal char Fuel. 63: 1008-1012. DOI: 10.1016/0016-2361(84)90326-0 |
0.335 |
|
1983 |
Hahn WA, Shadman F. Effect of Solid Structural Change on the Rate of NO Formation During Char Combustion Combustion Science and Technology. 30: 89-104. DOI: 10.1080/00102208308923613 |
0.336 |
|
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