Year |
Citation |
Score |
2014 |
Luo T, Guo L, Cammarata RC. Morphology evolution during stress relaxation of cobalt films due to dissolution in electrolyte solutions Rsc Advances. 4: 37164-37170. DOI: 10.1039/C4Ra06725H |
0.34 |
|
2014 |
Luo T, Guo L, Cammarata RC. On the self-patterning of islands by mechanical constraints during electrochemical deposition Applied Physics a: Materials Science and Processing. 118: 163-172. DOI: 10.1007/S00339-014-8850-0 |
0.369 |
|
2013 |
Guo L, Mason M, Hopstaken M, Kellock A, Romankiw LT, Deligianni H. A Diffusion Barrier for Flexible Thin Film Photovoltaics Journal of the Electrochemical Society. 160. DOI: 10.1149/2.045303Jes |
0.318 |
|
2013 |
Yu L, Guo L, Preisser R, Akolkar R. Autocatalysis during electroless copper deposition using glyoxylic acid as reducing agent Journal of the Electrochemical Society. 160. DOI: 10.1149/2.002312Jes |
0.331 |
|
2011 |
Guo L, Oskam G, Radisic A, Hoffmann PM, Searson PC. Island growth in electrodeposition Journal of Physics D: Applied Physics. 44. DOI: 10.1088/0022-3727/44/44/443001 |
0.723 |
|
2010 |
Guo L, Searson PC. Influence of anion on the kinetics of copper island growth. Nanoscale. 2: 2431-5. PMID 20835446 DOI: 10.1039/C0Nr00431F |
0.633 |
|
2010 |
Guo L, Hung D, Wang W, Shen W, Zhu L, Chien CL, Searson PC. Tunnel barrier photoelectrodes for solar water splitting Applied Physics Letters. 97. DOI: 10.1063/1.3479055 |
0.458 |
|
2010 |
Zhi Luo T, Guo L, Cammarata RC. Real-time intrinsic stress generation during Volmer-Weber growth of Co by electrochemical deposition Journal of Crystal Growth. 312: 1267-1270. DOI: 10.1016/J.Jcrysgro.2009.12.014 |
0.439 |
|
2010 |
Guo L, Thompson A, Searson PC. The kinetics of copper island growth on ruthenium oxide in perchlorate solution Electrochimica Acta. 55: 8416-8421. DOI: 10.1016/J.Electacta.2010.07.034 |
0.653 |
|
2010 |
Guo L, Searson PC. On the influence of the nucleation overpotential on island growth in electrodeposition Electrochimica Acta. 55: 4086-4091. DOI: 10.1016/J.Electacta.2010.02.038 |
0.632 |
|
2010 |
Guo L, Searson PC. Evolution of surface width in electrochemical nucleation and growth Electrochemistry Communications. 12: 431-434. DOI: 10.1016/J.Elecom.2010.01.011 |
0.646 |
|
2009 |
Guo L, Zhang S, Searson P. Growth kinetics of disk-shaped copper islands in electrochemical deposition. Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics. 79: 051601. PMID 19518461 DOI: 10.1103/Physreve.79.051601 |
0.653 |
|
2008 |
Guo L, Searson PC. Anisotropic island growth: a new approach to thin film electrocrystallization. Langmuir : the Acs Journal of Surfaces and Colloids. 24: 10557-9. PMID 18720957 DOI: 10.1021/La801707M |
0.634 |
|
2008 |
Liu Z, Guo L, Chien CL, Searson PC. Formation of a core/shell microstructure in Cu-Ni thin films Journal of the Electrochemical Society. 155. DOI: 10.1149/1.2946709 |
0.629 |
|
2007 |
Guo L, Searson PC. Simulations of Island growth and Island spatial distribution during electrodeposition Electrochemical and Solid-State Letters. 10. DOI: 10.1149/1.2735824 |
0.617 |
|
2006 |
Chen M, Guo L, Ravi R, Searson PC. Kinetics of receptor directed assembly of multisegment nanowires. The Journal of Physical Chemistry. B. 110: 211-7. PMID 16471523 DOI: 10.1021/Jp055204M |
0.481 |
|
2006 |
Guo L, Radisic A, Searson PC. Electrodeposition of copper on oxidized ruthenium Journal of the Electrochemical Society. 153. DOI: 10.1149/1.2354454 |
0.702 |
|
2005 |
Guo L, Radisic A, Searson PC. Kinetic Monte Carlo simulations of nucleation and growth in electrodeposition. The Journal of Physical Chemistry. B. 109: 24008-15. PMID 16375391 DOI: 10.1021/Jp055077U |
0.705 |
|
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