Yi-Mu Lee, Ph.D.

ultra-thin Si oxyitride devices

Gerald Lucovsky	grad student	2003	NCSU
(Breakdown and reliability of CMOS devices with stacked oxide /nitride and oxynitride gate dielectrics prepared by RPECVD.)

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Park K, Ikushiro H, Seo HS, et al. (2016) ER stress stimulates production of the key antimicrobial peptide, cathelicidin, by forming a previously unidentified intracellular S1P signaling complex. Proceedings of the National Academy of Sciences of the United States of America
Lee YM, Song BC, Yeum KJ. (2015) Impact of Volatile Anesthetics on Oxidative Stress and Inflammation. Biomed Research International. 2015: 242709
Lee YM, Wu Y, Lucovsky G. (2004) Breakdown and reliability of p-MOS devices with stacked RPECVD oxide/nitride gate dielectric under constant voltage stress Microelectronics Reliability. 44: 207-212
Lee YM, Wu Y, Bae C, et al. (2003) Structural dependence of breakdown characteristics and electrical degradation in ultrathin RPECVD oxide/nitride gate dielectrics under constant voltage stress Solid-State Electronics. 47: 71-76
Lee Y, Wu Y, Hong JG, et al. (2002) Degradation and SILC Effects of RPECVD sub-2.0nm Oxide/Nitride and Oxynitride Dielectrics Under Constant Current Stress Mrs Proceedings. 716
Lucovsky G, Wu Y, Lee Y, et al. (1999) Independent Tunneling Reductions Relative to Homogeneous Oxide Dielectrics From i) Nitrided Interfaces, and ii) Physically-Thicker Stacked Oxide/Nitride and Oxide/Oxynitride Gate Dielectrics Mrs Proceedings. 592