Rina Maeda

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2014 MSE Cornell University, Ithaca, NY, United States 
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"Rina Maeda"
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Uenuma S, Maeda R, Yokoyama H, et al. (2019) Formation of well-defined supramolecular microstructures consisting of γ-cyclodextrin and polyether —rods, cubes, plates, and nanosheets—guided by guest polymer structure Polymer. 179: 121689
Nakatani R, Takano H, Chandra A, et al. (2017) Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High-χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing. Acs Applied Materials & Interfaces
Seshimo T, Maeda R, Odashima R, et al. (2016) Perpendicularly oriented sub-10-nm block copolymer lamellae by atmospheric thermal annealing for one minute. Scientific Reports. 6: 19481
Nakatani R, Takano H, Wang L, et al. (2016) Precise synthesis of fluorine-containing block copolymers via RAFT Journal of Photopolymer Science and Technology. 29: 705-708
Seshimo T, Odashima R, Maeda R, et al. (2016) Perpendicularly Oriented Cylinders of Si-containing Block Copolymers by Atmospheric Thermal Annealing Journal of Photopolymer Science and Technology. 29: 689-693
Uenuma S, Maeda R, Takahashi S, et al. (2016) Self-assembled Structure of Polyrotaxane Consisting of β-Cyclodextrin and Poly(ethylene oxide)-block-poly(propylene oxide)-block-poly(ethylene oxide) Triblock Copolymer in Bulk System Chemistry Letters. 45: 991-993
Maeda R, Okuhara K, Nakamura A, et al. (2016) Higher-order-structure Formation in Liquid Crystal Epoxy Thermosets Investigated by Synchrotron Radiation–Wide-angle X-ray Diffraction Chemistry Letters. 45: 795-797
Maeda R, Higuchi T, Okuhara K, et al. (2016) Interface manipulated two-phase nanostructure in a triblock terpolymer with a short middle segment Polymer Journal. 48: 533-538
Seshimo T, Utsumi Y, Dazai T, et al. (2016) Perpendicular orientation control in thin films of POSS-containing block copolymer domains with a top-coat surface treatment Polymer Journal. 48: 407-411
Takano H, Wang L, Tanaka Y, et al. (2015) Vertical oriented lamellar formation of fluorine- and silicon-containing block copolymers without neutral layers Journal of Photopolymer Science and Technology. 28: 649-652
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