Drew C. Forman, Ph.D. - Publications
Affiliations: | 2011 | Cornell University, Ithaca, NY, United States |
Area:
polymersYear | Citation | Score | |||
---|---|---|---|---|---|
2014 | Okamura H, Forman DC, Ober CK. C60-containing polymers for electron beam lithography Polymer Bulletin. 71: 2395-2405. DOI: 10.1007/S00289-014-1197-Z | 0.458 | |||
2012 | Wieberger F, Forman DC, Neuber C, Gröschel AH, Böhm M, Müller AHE, Schmidt HW, Ober CK. Tailored star-shaped statistical teroligomers via ATRP for lithographic applications Journal of Materials Chemistry. 22: 73-79. DOI: 10.1039/C1Jm11922B | 0.478 | |||
2010 | Forman DC, Wieberger F, Groeschel A, Müller AHE, Schmidt HW, Ober CK. Comparison of star and linear ArF resists Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.848344 | 0.531 | |||
2008 | De Silva A, Felix N, Forman D, Jing S, Ober CK. New architectures for high resolution patterning Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772667 | 0.385 | |||
2006 | De Silva A, Forman D, Ober CK. Molecular glass resists for EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 6153. DOI: 10.1117/12.656559 | 0.43 | |||
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