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Benjamen M. Rathsack, Ph.D. - Publications

Affiliations: 
2001 University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
design and synthesis of functional organic materials
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16 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2015 Somervell M, Yamauchi T, Okada S, Tomita T, Nishi T, Kawakami S, Muramatsu M, Iijima E, Rastogi V, Nakano T, Iwao F, Nagahara S, Iwaki H, Dojun M, Yatsuda K, ... ... Rathsack B, et al. Driving DSA into volume manufacturing Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2085776  0.691
2015 Peters BL, Rathsack B, Somervell M, Nakano T, Schmid G, De Pablo JJ. Graphoepitaxial assembly of cylinder forming block copolymers in cylindrical holes Journal of Polymer Science, Part B: Polymer Physics. 53: 430-441. DOI: 10.1002/Polb.23652  0.697
2014 Somervell M, Yamauchi T, Okada S, Tomita T, Nishi T, Iijima E, Nakano T, Ishiguro T, Nagahara S, Iwaki H, Dojun M, Ozawa M, Yatsuda K, Tobana T, Romo Negreira A, ... ... Rathsack B, et al. High-volume manufacturing equipment and processing for directed self-assembly applications Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2045975  0.695
2013 Rathsack B, Somervell M, Muramatsu M, Tanouchi K, Kitano T, Nishimura E, Yatsuda K, Nagahara S, Iwaki H, Akai K, Ozawa M, Negreira AR, Tahara S, Nafus K. Advances in directed self assembly integration and manufacturability at 300 mm Proceedings of Spie - the International Society For Optical Engineering. 8682. DOI: 10.1117/12.2012018  0.686
2013 Schmid G, Farrell R, Xu J, Park C, Preil M, Chakrapani V, Mohanty N, Ko A, Cicoria M, Hetzer D, Somervell M, Rathsack B. Fabrication of 28nm pitch Si fins with DSA lithography Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2011607  0.721
2013 Harukawa R, Aoki M, Cross A, Nagaswami V, Tomita T, Nagahara S, Muramatsu M, Kawakami S, Kosugi H, Rathsack B, Kitano T, Sweis J, Mokhberi A. DSA hole defectivity analysis using advanced optical inspection tool Proceedings of Spie - the International Society For Optical Engineering. 8681. DOI: 10.1117/12.2011177  0.39
2012 Somervell M, Gronheid R, Hooge J, Nafus K, Delgadillo PR, Thode C, Younkin T, Matsunaga K, Rathsack B, Scheer S, Nealey P. Comparison of directed self-assembly integrations Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.916406  0.673
2012 Rathsack B, Somervell M, Hooge J, Muramatsu M, Tanouchi K, Kitano T, Nishimura E, Yatsuda K, Nagahara S, Hiroyuki I, Akai K, Hayakawa T. Pattern scaling with directed self assembly through lithography and etch process integration Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916311  0.703
2011 Gronheid R, Pret AV, Rathsack B, Hooge J, Scheer S, Nafus K, Shite H, Kitano J. Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist Journal of Micro/Nanolithography, Mems, and Moems. 10. DOI: 10.1117/1.3555090  0.369
2010 Gronheid R, Vaglio Pret A, Rathsack B, Hooge J, Scheer S, Nafus K, Shite H, Kitano J. EUV RLS performance tradeoffs for a polymer bound PAG resist Proceedings of Spie - the International Society For Optical Engineering. 7639. DOI: 10.1117/12.847489  0.37
2004 Meiring JE, Schmid MJ, Grayson SM, Rathsack BM, Johnson DM, Kirby R, Kannappan R, Manthiram K, Hsia B, Hogan ZL, Ellington AD, Pishko MV, Willson CG. Hydrogel biosensor array platform indexed by shape Chemistry of Materials. 16: 5574-5580. DOI: 10.1021/Cm049488J  0.694
2004 Tattersall PI, Breslin D, Grayson SM, Heath WH, Lou K, McAdams CL, McKean D, Rathsack BM, Willson CG. Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists Chemistry of Materials. 16: 1770-1774. DOI: 10.1021/Cm034638W  0.585
2002 Mark Ma Z, Kim W, Rathsack B, Xing G, Somervell M, Hong H. CD variations from non-trivial mask related factors Proceedings of Spie - the International Society For Optical Engineering. 4754: 677-683. DOI: 10.1117/12.476928  0.616
2001 Albelo JA, Rathsack BM, Pirogovsky PY. Process development for 257 nm photomask fabrication using environmentally stable chemically amplified photoresists Proceedings of Spie - the International Society For Optical Engineering. 4186: 73-84. DOI: 10.1117/12.410734  0.305
1998 Henderson CL, Scheer SA, Tsiartas PC, Rathsack BM, Sagan JP, Dammel RR, Erdmann A, Willson CG. Modeling parameter extraction for DNQ-novolak thick film resists Proceedings of Spie - the International Society For Optical Engineering. 3333: 256-267. DOI: 10.1117/12.312415  0.451
1998 Dammel RR, Sagan JP, Kokinda E, Eilbeck N, Mack CA, Arthur GG, Henderson CL, Scheer SA, Rathsack BM, Willson CG. Improved simulation of photoresists using new development models Proceedings of Spie - the International Society For Optical Engineering. 3333: 401-416. DOI: 10.1117/12.312399  0.439
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