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Navneet Kumar, Ph.D. - Publications

Affiliations: 
2009 University of Illinois, Urbana-Champaign, Urbana-Champaign, IL 
Area:
Materials Science Engineering
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14 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2013 Babar S, Kumar N, Zhang P, Abelson JR, Dunbar AC, Daly SR, Girolami GS. Growth inhibitor to homogenize nucleation and obtain smooth HfB2 thin films by chemical vapor deposition Chemistry of Materials. 25: 662-667. DOI: 10.1021/Cm303205U  0.738
2012 Schmucker SW, Kumar N, Abelson JR, Daly SR, Girolami GS, Bischof MR, Jaeger DL, Reidy RF, Gorman BP, Alexander J, Ballard JB, Randall JN, Lyding JW. Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography. Nature Communications. 3: 935. PMID 22760634 DOI: 10.1038/Ncomms1907  0.54
2012 Tayebi N, Yanguas-Gil A, Kumar N, Zhang Y, Abelson JR, Nishi Y, Ma Q, Rao VR. Hard HfB2 tip-coatings for ultrahigh density probe-based storage Applied Physics Letters. 101: 091909. DOI: 10.1063/1.4748983  0.556
2010 Ye W, Peña Martin PA, Kumar N, Daly SR, Rockett AA, Abelson JR, Girolami GS, Lyding JW. Direct writing of sub-5 nm hafnium diboride metallic nanostructures. Acs Nano. 4: 6818-24. PMID 20964393 DOI: 10.1021/Nn1018522  0.569
2010 Chatterjee A, Kumar N, Abelson JR, Bellon P, Polycarpou AA. Nanowear of Hafnium Diboride thin films Tribology Transactions. 53: 731-738. DOI: 10.1080/10402001003753341  0.743
2009 Yanguas-Gil A, Kumar N, Yang Y, Abelson JR. Highly conformal film growth by chemical vapor deposition. II. Conformality enhancement through growth inhibition Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 27: 1244-1248. DOI: 10.1116/1.3207746  0.627
2009 Yanguas-Gil A, Yang Y, Kumar N, Abelson JR. Highly conformal film growth by chemical vapor deposition. I. A conformal zone diagram based on kinetics Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 27: 1235-1243. DOI: 10.1116/1.3207745  0.701
2009 Kumar N, Yanguas-Gil A, Daly SR, Girolami GS, Abelson JR. Remote plasma treatment of Si surfaces: Enhanced nucleation in low-temperature chemical vapor deposition Applied Physics Letters. 95. DOI: 10.1063/1.3243980  0.621
2009 Kumar N, Noh W, Daly SR, Girolami GS, Abelson JR. Low temperature chemical vapor deposition of hafnium nitride - Boron nitride nanocomposite films Chemistry of Materials. 21: 5601-5606. DOI: 10.1021/Cm901774V  0.749
2008 Kumar N, Yanguas-Gil A, Daly SR, Girolami GS, Abelson JR. Growth inhibition to enhance conformal coverage in thin film chemical vapor deposition. Journal of the American Chemical Society. 130: 17660-1. PMID 19067582 DOI: 10.1021/Ja807802R  0.747
2008 Chatterjee A, Kumar N, Abelson JR, Bellon P, Polycarpou AA. Nanoscratch and nanofriction behavior of hafnium diboride thin films Wear. 265: 921-929. DOI: 10.1016/J.Wear.2008.02.002  0.746
2007 Lazarz TS, Yang Y, Kumar N, Kim DY, Noh W, Girolami GS, Abelson JR. Low temperature CVD of Ru from C6H8Ru(CO)3 Materials Research Society Symposium Proceedings. 990: 103-108. DOI: 10.1557/Proc-0990-B09-06  0.521
2007 Kumar N, Yang Y, Noh W, Girolami GS, Abelson JR. Titanium diboride thin films by low-temperature chemical vapor deposition from the single source precursor Ti(BH 4) 3(1,2- dimethoxyethane) Chemistry of Materials. 19: 3802-3807. DOI: 10.1021/Cm070277Z  0.753
2006 Chatterjee A, Jayaraman S, Gerbi JE, Kumar N, Abelson JR, Bellon P, Polycarpou AA, Chevalier JP. Tribological behavior of hafnium diboride thin films Surface and Coatings Technology. 201: 4317-4322. DOI: 10.1016/J.Surfcoat.2006.08.086  0.765
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