Year |
Citation |
Score |
2017 |
Yamaguchi S, Bayindir Z, He X, Uppal S, Srinivasan P, Yong C, Choi D, Joshi M, Yang HS, Hu O, Samavedam S, Sohn DK. Effective work-function control technique applicable to p-type FinFET high-k/metal gate devices Microelectronics Reliability. 72: 80-84. DOI: 10.1016/J.Microrel.2017.04.004 |
0.31 |
|
2013 |
Kawde AY, O'Toole AW, He X, Phillips R, Lemke A, Murray T, Geer R, Eisenbraun E. Electrochemical catalytic behavior for platinum functionalized TiO2 nanotube arrays in PEM fuel cells Prehospital and Disaster Medicine. 1497. DOI: 10.1557/Opl.2013.328 |
0.558 |
|
2013 |
He X, Phillips R, Kawde A, Hansen R, Lee JH, Lund I, Eisenbraun E, Geer RE. Si/TiOx core/shell nanowires with branched cathode support structures for Pt catalysts in PEM fuel cells Prehospital and Disaster Medicine. 1497. DOI: 10.1557/Opl.2013.327 |
0.647 |
|
2013 |
Phillips R, O'Toole A, He X, Hansen R, Geer R, Eisenbraun E. Processing and functionalization of conductive substoichiometric TiO 2 catalyst supports for PEM fuel cell applications Journal of Materials Research. 28: 461-467. DOI: 10.1557/Jmr.2012.324 |
0.598 |
|
2012 |
He X, Geer RE. High total-dose proton radiation tolerance in TiN/HfO2/TiN ReRAM devices Materials Research Society Symposium Proceedings. 1430: 165-170. DOI: 10.1557/Opl.2012.1101 |
0.679 |
|
2012 |
He X, Wang W, Butcher B, Tanachutiwat S, Geer RE. Superior TID hardness in TiN/HfO 2/TiN ReRAMs after proton radiation Ieee Transactions On Nuclear Science. 59: 2550-2555. DOI: 10.1109/Tns.2012.2208480 |
0.673 |
|
2011 |
He X, Tokranova NA, Wang W, Geer RE. Improved resistive switching properties in HfO2-based ReRAMs by Hf/Au doping Materials Research Society Symposium Proceedings. 1394: 81-86. DOI: 10.1557/Opl.2012.530 |
0.678 |
|
2010 |
Butcher B, He X, Huang M, Wang Y, Liu Q, Lv H, Liu M, Wang W. Proton-based total-dose irradiation effects on Cu/HfO2:Cu/Pt ReRAM devices. Nanotechnology. 21: 475206. PMID 21030760 DOI: 10.1088/0957-4484/21/47/475206 |
0.522 |
|
2009 |
Liu M, Abid Z, Wang W, He X, Liu Q, Guan W. Multilevel resistive switching with ionic and metallic filaments Applied Physics Letters. 94: 233106. DOI: 10.1063/1.3151822 |
0.474 |
|
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