| Year |
Citation |
Score |
| 2019 |
Kambe Y, Arges CG, Czaplewski DA, Dolejsi M, Krishnan S, Stoykovich MP, de Pablo JJ, Nealey PF. Role of Defects in Ion Transport in Block Copolymer Electrolytes. Nano Letters. PMID 31250653 DOI: 10.1021/Acs.Nanolett.9B01758 |
0.674 |
|
| 2018 |
Chen X, Zhou C, Chen SJ, Craig GSW, Rincon-Delgadillo P, Dazai T, Miyagi K, Maehashi T, Yamazaki A, Gronheid R, Stoykovich M, Nealey PF. Ionic liquids as additives to polystyrene-b-poly(methyl methacrylate) enabling directed self-assembly of patterns with sub-10 nm features. Acs Applied Materials & Interfaces. PMID 29667409 DOI: 10.1021/Acsami.8B02990 |
0.49 |
|
| 2018 |
Chang G, Yang L, Yang J, Stoykovich MP, Xu D, Cui J, Wang D. High-Performance pH-Switchable Supramolecular Thermosets via Cation-π Interactions. Advanced Materials (Deerfield Beach, Fla.). PMID 29315882 DOI: 10.1002/Adma.201704234 |
0.306 |
|
| 2016 |
Wang D, Chin HY, He C, Stoykovich MP, Schwartz DK. Polymer Surface Transport Is a Combination of in-Plane Diffusion and Desorption-Mediated Flights Acs Macro Letters. 5: 509-514. DOI: 10.1021/Acsmacrolett.6B00183 |
0.387 |
|
| 2015 |
Shen L, He C, Qiu J, Lee SM, Kalita A, Cronin SB, Stoykovich MP, Yoon J. Nanostructured Silicon Photocathodes for Solar Water Splitting Patterned by the Self-Assembly of Lamellar Block Copolymers. Acs Applied Materials & Interfaces. PMID 26575400 DOI: 10.1021/Acsami.5B08661 |
0.374 |
|
| 2015 |
Diederichsen KM, Brow RR, Stoykovich MP. Percolating transport and the conductive scaling relationship in lamellar block copolymers under confinement. Acs Nano. 9: 2465-76. PMID 25756653 DOI: 10.1021/Acsnano.5B01321 |
0.454 |
|
| 2015 |
MacConaghy KI, Chadly DM, Stoykovich MP, Kaar JL. Optically diffracting hydrogels for screening kinase activity in vitro and in cell lysate: impact of material and solution properties. Analytical Chemistry. 87: 3467-75. PMID 25714913 DOI: 10.1021/Acs.Analchem.5B00442 |
0.336 |
|
| 2015 |
Wang D, He C, Stoykovich MP, Schwartz DK. Nanoscale topography influences polymer surface diffusion. Acs Nano. 9: 1656-64. PMID 25621372 DOI: 10.1021/Nn506376N |
0.32 |
|
| 2015 |
He C, Stoykovich MP. Photopatterning of cross-linkable epoxide-functionalized block copolymers and dual-tone nanostructure development for fabrication across the nano- and microscales. Small (Weinheim An Der Bergstrasse, Germany). 11: 2407-16. PMID 25611328 DOI: 10.1002/Smll.201403364 |
0.501 |
|
| 2015 |
Morrissey KL, Keirn MI, Inaba Y, Denham AJ, Henry GJ, Vogler BW, Posewitz MC, Stoykovich MP. Recyclable polyampholyte flocculants for the cost-effective dewatering of microalgae and cyanobacteria Algal Research. 11: 304-312. DOI: 10.1016/J.Algal.2015.07.009 |
0.311 |
|
| 2014 |
Rice KP, Keller RR, Stoykovich MP. Specimen-thickness effects on transmission Kikuchi patterns in the scanning electron microscope. Journal of Microscopy. 254: 129-36. PMID 24660836 DOI: 10.1111/Jmi.12124 |
0.377 |
|
| 2014 |
He C, Stoykovich MP. Self-Assembly: Profile Control in Block Copolymer Nanostructures using Bilayer Thin Films for Enhanced Pattern Transfer Processes (Adv. Funct. Mater. 45/2014) Advanced Functional Materials. 24: 7224-7224. DOI: 10.1002/Adfm.201470295 |
0.446 |
|
| 2014 |
He C, Stoykovich MP. Profile control in block copolymer nanostructures using bilayer thin films for enhanced pattern transfer processes Advanced Functional Materials. 24: 7078-7084. DOI: 10.1002/Adfm.201401810 |
0.427 |
|
| 2013 |
Campbell IP, He C, Stoykovich MP. Topologically Distinct Lamellar Block Copolymer Morphologies Formed by Solvent and Thermal Annealing. Acs Macro Letters. 2: 918-923. PMID 35607014 DOI: 10.1021/mz400269k |
0.352 |
|
| 2013 |
Campbell IP, He C, Stoykovich MP. Topologically distinct lamellar block copolymer morphologies formed by solvent and thermal annealing Acs Macro Letters. 2: 918-923. DOI: 10.1021/Mz400269K |
0.456 |
|
| 2013 |
Campbell IP, Hirokawa S, Stoykovich MP. Processing approaches for the defect engineering of lamellar-forming block copolymers in thin films Macromolecules. 46: 9599-9608. DOI: 10.1021/Ma401704M |
0.408 |
|
| 2012 |
Campbell IP, Lau GJ, Feaver JL, Stoykovich MP. Network connectivity and long-range continuity of lamellar morphologies in block copolymer thin films Macromolecules. 45: 1587-1594. DOI: 10.1021/Ma2025336 |
0.445 |
|
| 2012 |
Rice KP, Saunders AE, Stoykovich MP. Classifying the shape of colloidal nanocrystals by complex fourier descriptor analysis Crystal Growth and Design. 12: 825-831. DOI: 10.1021/Cg201156Q |
0.31 |
|
| 2012 |
Ahn DU, Wang Z, Campbell IP, Stoykovich MP, Ding Y. Morphological evolution of thin PS/PMMA films: Effects of surface energy and blend composition Polymer (United Kingdom). 53: 4187-4194. DOI: 10.1016/J.Polymer.2012.07.037 |
0.44 |
|
| 2010 |
Stoykovich MP, Daoulas KC, Müller M, Kang H, De Pablo JJ, Nealey PF. Remediation of line edge roughness in chemical nanopatterns bythe directed assembly of overlying block copolymer films Macromolecules. 43: 2334-2342. DOI: 10.1021/Ma902494V |
0.613 |
|
| 2009 |
Liu G, Stoykovich MP, Ji S, Stuen KO, Craig GSW, Nealey PF. Phase behavior and dimensional scaling of symmetric block copolymer-homopolymer ternary blends in thin films Macromolecules. 42: 3063-3072. DOI: 10.1021/Ma802773H |
0.729 |
|
| 2008 |
Ko HC, Stoykovich MP, Song J, Malyarchuk V, Choi WM, Yu CJ, Geddes JB, Xiao J, Wang S, Huang Y, Rogers JA. A hemispherical electronic eye camera based on compressible silicon optoelectronics. Nature. 454: 748-53. PMID 18685704 DOI: 10.1038/Nature07113 |
0.318 |
|
| 2008 |
Kang H, Detcheverry FA, Mangham AN, Stoykovich MP, Daoulas KCh, Hamers RJ, Müller M, de Pablo JJ, Nealey PF. Hierarchical assembly of nanoparticle superstructures from block copolymer-nanoparticle composites. Physical Review Letters. 100: 148303. PMID 18518077 DOI: 10.1103/Physrevlett.100.148303 |
0.539 |
|
| 2008 |
Daoulas KCh, Müller M, Stoykovich MP, Kang H, de Pablo JJ, Nealey PF. Directed copolymer assembly on chemical substrate patterns: a phenomenological and single-chain-in-mean-field simulations study of the influence of roughness in the substrate pattern. Langmuir : the Acs Journal of Surfaces and Colloids. 24: 1284-95. PMID 18067336 DOI: 10.1021/La702482Z |
0.603 |
|
| 2008 |
Stoykovich MP, Yoshimoto K, Nealey PF. Mechanical properties of polymer nanostructures: Measurements based on deformation in response to capillary forces Applied Physics a: Materials Science and Processing. 90: 277-283. DOI: 10.1007/S00339-007-4262-8 |
0.656 |
|
| 2007 |
Stoykovich MP, Kang H, Daoulas KCh, Liu G, Liu CC, de Pablo JJ, Müller M, Nealey PF. Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries. Acs Nano. 1: 168-75. PMID 19206647 DOI: 10.1021/Nn700164P |
0.727 |
|
| 2007 |
Keymeulen HR, Diaz A, Solak HH, David C, Pfeiffer F, Patterson BD, Van Der Veen JF, Stoykovich MP, Nealey PF. Measurement of the x-ray dose-dependent glass transition temperature of structured polymer films by x-ray diffraction Journal of Applied Physics. 102. DOI: 10.1063/1.2752548 |
0.515 |
|
| 2007 |
Edwards EW, Müller M, Stoykovich MP, Solak HH, De Pablo JJ, Nealey PF. Dimensions and shapes of block copolymer domains assembled on lithographically defined chemically patterned substrates Macromolecules. 40: 90-96. DOI: 10.1021/Ma0607564 |
0.621 |
|
| 2007 |
La YH, Stoykovich MP, Park SM, Nealey PF. Directed assembly of cylinder-forming block copolymers into patterned structures to fabricate arrays of spherical domains and nanoparticles Chemistry of Materials. 19: 4538-4544. DOI: 10.1021/Cm071208N |
0.56 |
|
| 2007 |
Ekinci Y, Solak HH, Padeste C, Gobrecht J, Stoykovich MP, Nealey PF. 20 nm Line/space patterns in HSQ fabricated by EUV interference lithography Microelectronic Engineering. 84: 700-704. DOI: 10.1016/J.Mee.2007.01.213 |
0.503 |
|
| 2007 |
Park SM, Stoykovich MP, Ruiz R, Zhang Y, Black CT, Nealey PF. Directed assembly of lamellae-forming block copolymers by using chemically and topographically patterned substrates Advanced Materials. 19: 607-611. DOI: 10.1002/Adma.200601421 |
0.655 |
|
| 2006 |
Stoykovich MP, Edwards EW, Solak HH, Nealey PF. Phase behavior of symmetric ternary block copolymer-homopolymer blends in thin films and on chemically patterned surfaces. Physical Review Letters. 97: 147802. PMID 17155291 DOI: 10.1103/Physrevlett.97.147802 |
0.544 |
|
| 2006 |
Daoulas KCh, Müller M, Stoykovich MP, Park SM, Papakonstantopoulos YJ, de Pablo JJ, Nealey PF, Solak HH. Fabrication of complex three-dimensional nanostructures from self-assembling block copolymer materials on two-dimensional chemically patterned templates with mismatched symmetry. Physical Review Letters. 96: 036104. PMID 16486737 DOI: 10.1103/Physrevlett.96.036104 |
0.681 |
|
| 2006 |
Edwards EW, Stoykovich MP, Nealey PF, Solak HH. Binary blends of diblock copolymers as an effective route to multiple length scales in perfect directed self-assembly of diblock copolymer thin films Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 340-344. DOI: 10.1116/1.2151226 |
0.646 |
|
| 2006 |
Kim SO, Kim BH, Kim K, Koo CM, Stoykovich MP, Nealey PF, Solak HH. Defect structure in thin films of a lamellar block copolymer self-assembled on neutral homogeneous and chemically nanopatterned surfaces Macromolecules. 39: 5466-5470. DOI: 10.1021/Ma060087U |
0.606 |
|
| 2006 |
Edwards EW, Stoykovich MP, Solak HH, Nealey PF. Long-range order and orientation of cylinder-forming block copolymers on chemically nanopatterned striped surfaces Macromolecules. 39: 3598-3607. DOI: 10.1021/Ma052335C |
0.614 |
|
| 2006 |
Stoykovich MP, Nealey PF. Block copolymers and conventional lithography Materials Today. 9: 20-29. DOI: 10.1016/S1369-7021(06)71619-4 |
0.565 |
|
| 2006 |
Daoulas KC, Müller M, Stoykovich MP, Papakonstantopoulos YJ, De Pablo JJ, Nealey PF, Park SM, Solak HH. Directed assembly of copolymer materials on patterned substrates: Balance of simple symmetries in complex structures Journal of Polymer Science, Part B: Polymer Physics. 44: 2589-2604. DOI: 10.1002/Polb.20904 |
0.685 |
|
| 2005 |
Stoykovich MP, Müller M, Kim SO, Solak HH, Edwards EW, de Pablo JJ, Nealey PF. Directed assembly of block copolymer blends into nonregular device-oriented structures. Science (New York, N.Y.). 308: 1442-6. PMID 15933196 DOI: 10.1126/Science.1111041 |
0.581 |
|
| 2005 |
Junarsa I, Stoykovich MP, Nealey PF, Ma Y, Cerrina F, Solak HH. Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 138-143. DOI: 10.1116/1.1849213 |
0.488 |
|
| 2005 |
Edwards EW, Stoykovich MP, Müller M, Solak HH, De Pablo JJ, Nealey PF. Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates Journal of Polymer Science, Part B: Polymer Physics. 43: 3444-3459. DOI: 10.1002/Polb.20643 |
0.634 |
|
| 2004 |
Junarsa I, Stoykovich MP, Yoshimoto K, Nealey PF. The use of surfactant in the rinse to improve collapse behavior of chemically amplified photoresists Proceedings of Spie - the International Society For Optical Engineering. 5376: 842-849. DOI: 10.1117/12.533776 |
0.448 |
|
| 2004 |
Yoshimoto K, Stoykovich MP, Cao HB, De Pablo JJ, Nealey PF, Drugan WJ. A two-dimensional model of the deformation of photoresist structures using elastoplastic polymer properties Journal of Applied Physics. 96: 1857-1865. DOI: 10.1063/1.1768614 |
0.61 |
|
| 2003 |
Kim SO, Solak HH, Stoykovich MP, Ferrier NJ, De Pablo JJ, Nealey PF. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates. Nature. 424: 411-4. PMID 12879065 DOI: 10.1038/Nature01775 |
0.623 |
|
| 2003 |
Stoykovich MP, Cao HB, Yoshimoto K, Ocola LE, Nealey PF. Deformation of nanoscopic polymer structures in response to well-defined capillary forces Advanced Materials. 15: 1180-1184. DOI: 10.1002/Adma.200305059 |
0.693 |
|
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