Jon Orloff - US grants

This award will support ten U.S. participants in a joint U.S.- Japan seminar on the subject of high resolution focused ion beams (FIB), a field which has developed primarily in the United States and Japan. FIB technology has been applied to integrated circuit fabrication, mask repair, and surface analysis. It has potential applications in low-energy implantation during molecular beam epitaxy and in nanostructure fabrication. Focused ion beams produced with field-ionization- type sources can have large current densities with small beam sizes. Such beams can be used to alter surfaces in a variety of ways, including micromachining, implantation, and deposition. The applications of focused ion beams to integrated circuit fabrication include (1) direct, maskless, resistless implantation of dopants in Si or GaAs, (2) micromachining or ion milling, (3) ion beam lithography, (4) ion-assisted etching or deposition, (5) microanalysis, and (6) scanning ion microscopy. Because of the significant technological promise of the field, as well as its potential application to the study of basic scientific problems in electronic materials, the seminar organizers believe the time is opportune for the convening of this workshop. It will bring many of the main workers in FIB together to exchange and discuss their recent research results and to consider possible joint research projects. The directions of research in FIB technology are somewhat different in the U.S. and Japan, and the seminar will thus allow workers from complementary areas in the two countries to compare results. Both the U.S. and Japan should benefit from such an exchange. A particular effort will be made to ensure attendance by U.S. graduate students. Though there will be some discussion of ion sources and optics at the seminar, the emphasis will be on the novel applications possible only with high resolution focused ion beams. The seminar will be held December 3-6, 1990, in Portland, Oregon. Seminar co-organizers are Dr. Jon Orloff, Oregon Graduate Institute of Science and Technology, and Dr. Kenji Gamo, Department of Electrical Engineering, Osaka University, Japan.

Proposal Number: ECS-9705679 Principal Investigator: Jon Orloff Title: Development of a Cs electrohydrodynamic source for high spatial resolution secondary ion mass spectroscopy In this research, pursued under the NSF GOALI Program, an ion source for use in a secondary ion mass spectrometer (SIMS) system will be developed. The ion source will be based on cesium liquid metal materials, with ion emission through interaction of the liquid metal skin over a blunt field emitter solid tip in the presence of an intense electric field. A variety of cesium compounds that contain bromine, iodine and chlorine as well as oxygen will be studied. The source is expected to overcome the major limitations of present SIMS ion sources, in that it will be both high brightness and high resolution (0.1 micron). Current cesium-based sources only have a broad resolution of about one micron; gallium sources have high resolution but such low brightness that their use in a spectrometer system is limited. A high brightness, high spatial resolution ion source and spectrometer would have many applications in the microelectronics industry for direct surface analysis of circuits with dimensions of less than 0.25 microns.

PROPOSAL NO.: 0230628
PRINCIPAL INVESTIGATOR: Goldsman, Neil
INSTITUTION NAME: University of Maryland College Park
TITLE: A Multidisciplinary Integrated Capstone Design Curriculum for Electrical and Computer Engineering

Abstract

The Department of Electrical and Computer Engineering (ECE) at the University
of Maryland at College Park (UMCP) is in the process of planning a major curriculum
revision for its undergraduate program. This planning grant will address the Capstone design
program, which will be greatly revised to provide a multidisciplinary design experience
for senior students and to integrate juniors and sophomores into the Capstone experience.
The team will assess the outcomes of the Capstone experience to generate data to guide the revision of our curriculum in general.

A major objective of the Capstone design courses is for the students to work on a
design project at a professional level. The project makes use of most of the knowledge
that students have acquired in the previous two to three years of the ECE curriculum.
Therefore, the outcome of the Capstone design experience should be an excellent
indicator of the how well the education process in the ECE Department is preparing
students for their professional career. A year-to-year assessment of the outcomes of the
Capstone design courses will enable us to make continuous improvements in the
sophomore, junior, and also the senior year curricula. This being the case, the revision of
the Capstone program will serve as the engine to drive curriculum revision for the entire
ECE program.