Noel Arellano, Ph.D.
Affiliations: | 2008- | nanofabrication | IBM Almaden Research Center, San Jose, CA, United States |
Area:
nanofabricationWebsite:
http://researcher.watson.ibm.com/researcher/view.php?person=us-narellaGoogle:
"Noel Arellano"Mean distance: 12.65 | S | N | B | C | P |
Parents
Sign in to add mentor| Jeffrey Bokor | grad student | 2008 | UC Berkeley | |
| (Towards silicon nanowire based resonant systems.) | ||||
| Roger T. Howe | grad student | 2008 | UC Berkeley (BME Tree) | |
| (Towards silicon nanowire based resonant systems.) | ||||
| Roya Maboudian | grad student | 2008 | UC Berkeley (Chemistry Tree) | |
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Publications
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| Wojtecki R, Ma J, Cordova I, et al. (2021) Additive Lithography-Organic Monolayer Patterning Coupled with an Area-Selective Deposition. Acs Applied Materials & Interfaces |
| Spanu A, Colistra N, Farisello P, et al. (2020) A three-dimensional micro-electrode array for in-vitro neuronal interfacing. Journal of Neural Engineering |
| Sun W, Shen J, Zhao Z, et al. (2020) Precise pitch-scaling of carbon nanotube arrays within three-dimensional DNA nanotrenches. Science (New York, N.Y.). 368: 874-877 |
| Pattison TG, Hess AE, Arellano N, et al. (2020) Surface Initiated Polymer Thin Films for the Area Selective Deposition and Etching of Metal Oxides. Acs Nano |
| Mettry M, Hess AE, Goetting I, et al. (2019) Extending the compositional diversity of films in area selective atomic layer deposition through chemical functionalities Journal of Vacuum Science & Technology A. 37: 020923 |
| Wojtecki RJ, Mettry M, Fine Nathel NF, et al. (2018) 15nm Resolved Patterns in Selective Area Atomic Layer Deposition - Defectivity Reduction by Monolayer Design. Acs Applied Materials & Interfaces |
| Vora A, Schmidt K, Alva G, et al. (2016) Orientation Control of Block Copolymers using Surface Active, Phase-preferential Additives. Acs Applied Materials & Interfaces |
| Vora A, Alva G, Chunder A, et al. (2016) Synthesis and Thin-film Self-assembly of Cylinder-Forming High-χ Block Copolymers Journal of Photopolymer Science and Technology. 29: 685-688 |
| Tsai H, Miyazoe H, Vora A, et al. (2016) High chi block copolymer DSA to improve pattern quality for FinFET device fabrication Proceedings of Spie - the International Society For Optical Engineering. 9779 |
| Vora A, Chunder A, Tjio M, et al. (2015) Synthesis and characterization of polycarbonate-containing all-organic High-χ block copolymers for directed self-assembly Journal of Photopolymer Science and Technology. 28: 659-662 |