Donovan T. Lee, Ph.D.
Affiliations: | 2009 | University of California, Berkeley, Berkeley, CA, United States |
Area:
NanofabricationGoogle:
"Donovan Lee"Mean distance: 17.34
Parents
Sign in to add mentor| Tsu-Jae King Liu | grad student | 2009 | UC Berkeley | |
| (Nanoscale electromechanical systems devices and technology.) | ||||
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Publications
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| Islam R, Chen G, Ramesh P, et al. (2017) Investigation of the Changes in Electronic Properties of Nickel Oxide (NiOx) due to UV/Ozone Treatment. Acs Applied Materials & Interfaces |
| Laboriante I, Bush B, Lee D, et al. (2010) Interfacial adhesion between rough surfaces of polycrystalline silicon and its implications for M/NEMS technology Journal of Adhesion Science and Technology. 24: 2545-2556 |
| Lee D, Tran H, King Liu TJ. (2010) Characterization of nanometer-scale gap formation Journal of the Electrochemical Society. 157: H94-H98 |
| Lee D, Tran H, Ho B, et al. (2010) Electrical Characterization of Etch Rate for Micro- and Nano-Scale Gap Formation Ieee\/Asme Journal of Microelectromechanical Systems. 19: 1260-1263 |
| Lee D, Seidel T, Dalton J, et al. (2007) ALD refill of vanometer-scale gaps with high- κ dielectric for advanced CMOS technologies Electrochemical and Solid-State Letters. 10: 257-259 |