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Li Ling, Ph.D.

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2006 University of Maryland, College Park, College Park, MD 
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Gottlieb Oehrlein grad student 2006 University of Maryland
 (Plasma etching of dielectric materials using inductively and capacitively coupled fluorocarbon discharges: Mechanistic studies of the surface chemistry.)

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Zheng L, Ling L, Hua X, et al. (2005) Studies of film deposition in fluorocarbon plasmas employing a small gap structure Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 23: 634-642
Li X, Ling L, Hua X, et al. (2004) Properties of C 4F 8 inductively coupled plasmas. I. Studies of Ar/c-C 4F 8 magnetically confined plasmas for etching of SiO 2 Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 22: 500-510
Ling L, Hua X, Li X, et al. (2004) Study of C 4F 8/CO and C 4F 8/Ar/ CO plasmas for highly selective etching of organosilicate glass over Si 3N 4 and SiC Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 22: 236-244
Li X, Hua X, Ling L, et al. (2004) Surface chemical changes of aluminum during NF 3-based plasma processing used for in situ chamber cleaning Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 22: 158-164
Ling L, Hua X, Li X, et al. (2004) Investigation of surface modifications of 193 nm and 248 nm photoresist materials during low-pressure plasma etching Ieee International Conference On Plasma Science. 168
Li X, Ling L, Hua X, et al. (2003) Effects of Ar and O2 additives on SiO2 etching in C4F8-based plasmas Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 21: 284-293
Li X, Hua X, Ling L, et al. (2002) Fluorocarbon-based plasma etching of Sio2: Comparison of C4F6/Ar and C4F8/Ar discharges Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 20: 2052-2061
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