Florian G. Weilnboeck, Ph.D.
Affiliations: | 2011 | Material Science and Engineering | University of Maryland, College Park, College Park, MD |
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Parents
Sign in to add mentor| Gottlieb Oehrlein | grad student | 2011 | University of Maryland | |
| (Plasma interactions with masking materials for nanofabrication.) | ||||
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| Metzler D, Weilnboeck F, Engelmann S, et al. (2016) He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 34 |
| Metzler D, Weilnboeck F, Hernández SC, et al. (2015) Formation of nanometer-thick delaminated amorphous carbon layer by two-step plasma processing of methacrylate-based polymer Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 33 |
| Weilnboeck F, Bartis E, Shachar S, et al. (2012) Differences in erosion mechanism and selectivity between Ti and TiN in fluorocarbon plasmas for dielectric etch Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30 |
| Weilnboeck F, Kumar N, Oehrlein GS, et al. (2012) Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 30: 031807 |
| Weilnboeck F, Bartis E, Shachar S, et al. (2012) Study of Ti etching and selectivity mechanism in fluorocarbon plasmas for dielectric etch Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30 |
| Bruce RL, Weilnboeck F, Lin T, et al. (2011) On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 29 |
| Weilnboeck F, Metzler D, Kumar N, et al. (2011) Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity Applied Physics Letters. 99 |
| Chung TY, Graves DB, Weilnboeck F, et al. (2011) Ion and vacuum ultraviolet photon beam effects in 193nm photoresist surface roughening: The role of the adamantyl pendant group Plasma Processes and Polymers. 8: 1068-1079 |
| Zhang X, Metting CJ, Briber RM, et al. (2011) Poly(2-vinylnaphthalene)-block-poly(acrylic acid) block copolymer: Self-assembled pattern formation, alignment, and transfer into silicon via plasma etching Macromolecular Chemistry and Physics. 212: 1735-1741 |
| Weilnboeck F, Bruce RL, Engelmann S, et al. (2010) Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 993-1004 |