Kevin L. Sequoia, Ph.D.
Affiliations: | 2009 | Engineering Sciences (Engineering Physics) | University of California, San Diego, La Jolla, CA |
Area:
Fluid and Plasma PhysicsGoogle:
"Kevin Sequoia"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Mark S. Tillack | grad student | 2009 | UCSD | |
| (Extreme-ultraviolet radiation transport in small scale length laser-produced tin plasmas.) | ||||
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Publications
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| Yuspeh S, Sequoia KL, Tao Y, et al. (2010) Heating dynamics and extreme ultraviolet radiation emission of laser-produced Sn plasmas Applied Physics Letters. 96 |
| Burdt RA, Yuspeh S, Sequoia KL, et al. (2009) Ablation depth in planar Sn targets during the interaction with a Nd:YAG laser for extreme ultraviolet lithography Proceedings of Spie - the International Society For Optical Engineering. 7271 |
| Yuspeh S, Sequoia KL, Tao Y, et al. (2009) Effects of the ratio of sphere size to laser focal spot on the dominant in-band EUV emitting regio Proceedings of Spie - the International Society For Optical Engineering. 7271 |
| Burdt RA, Tao Y, Tillack MS, et al. (2009) Investigation of the ion spectrum from 1 μm and 10 μm laser produced plasmas for extreme ultraviolet lithography Ieee International Conference On Plasma Science |
| Burdt RA, Yuspeh S, Sequoia KL, et al. (2009) Experimental scaling law for mass ablation rate from a Sn plasma generated by a 1064 nm laser Journal of Applied Physics. 106 |
| Yuspeh S, Sequoia KL, Tao Y, et al. (2008) Optimization of the size ratio of Sn sphere and laser focal spot for an extreme ultraviolet light source Applied Physics Letters. 93 |
| Tao Y, Tillack MS, Sequoia KL, et al. (2008) Efficient 13.5 nm extreme ultraviolet emission from Sn plasma irradiated by a long CO2 laser pulse Applied Physics Letters. 92 |
| Sequoia KL, Tao Y, Yuspeh S, et al. (2008) Two dimensional expansion effects on angular distribution of 13.5nm in-band extreme ultraviolet emission from laser-produced Sn plasma Applied Physics Letters. 92: 221505 |
| Tao Y, Tillack MS, Harilal SS, et al. (2007) Mass-limited Sn target irradiated by dual laser pulses for an extreme ultraviolet lithography source. Optics Letters. 32: 1338-40 |
| Tao Y, Tillack MS, Sequoia KL, et al. (2007) Dynamics of laser-produced Sn-based plasmas for a monochromatic 13.5 nm extreme ultraviolet source Proceedings of Spie - the International Society For Optical Engineering. 6703 |