Marcel A. Wall, Ph.D.

Affiliations: 
2003 University of Illinois, Urbana-Champaign, Urbana-Champaign, IL 
Area:
Materials Science Engineering
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David G. Cahill grad student 2003 UIUC
 (Nucleation kinetics during homoepitaxial growth of titanium nitride(001) by reactive magnetron sputtering.)
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Publications

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Wall MA, Cahill DG, Petrov I, et al. (2005) Nucleation kinetics versus nitrogen partial pressure during homoepitaxial growth of stoichiometric TiN(0 0 1): A scanning tunneling microscopy study Surface Science. 581: L122-L127
Wall MA, Cahill DG, Petrov I, et al. (2004) Nucleation kinetics during homoepitaxial growth of TiN(001) by reactive magnetron sputtering Physical Review B - Condensed Matter and Materials Physics. 70: 035413-1-035413-8
Costescu RM, Wall MA, Cahill DG. (2003) Thermal conductance of epitaxial interfaces Physical Review B - Condensed Matter and Materials Physics. 67: 543021-543025
Gall D, Kodambaka S, Wall MA, et al. (2003) Pathways of atomistic processes on TiN(001) and (111) surfaces during film growth: An ab initio study Journal of Applied Physics. 93: 9086-9094
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