Gwo-Ching Wang

Affiliations: 
Physics Rensselaer Polytechnic Institute, Troy, NY, United States 
Area:
Condensed Matter Physics, Materials Science Engineering, Nanoscience
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"Gwo-Ching Wang"
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Children

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John B. Wedding grad student 2000 RPI
Jason T. Drotar grad student 2002 RPI
Deli Liu grad student 2004 RPI
Samuk Pimanpang grad student 2006 RPI
Fu Tang grad student 2006 RPI
Xueti Tang grad student 2007 RPI
Churamani Gaire grad student 2008 RPI
Paul-Shane Morrow grad student 2008 RPI
Patrick W. Snow grad student 2011 RPI
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Publications

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Wen X, Lu Z, Valdman L, et al. (2020) High-Crystallinity Epitaxial Sb2Se3 Thin Film on Mica for Flexible Near-Infrared Photodetectors. Acs Applied Materials & Interfaces
Zhang Y, Wang GC, Lu TM, et al. (2019) Chemical reaction induced carrier localization in nanometer-thin Al/Ru, Al/Co, and Al/Mo superlattices. Nanotechnology
Chen Z, Wang Y, Sun X, et al. (2018) Remote Phononic Effects in Epitaxial Ruddlesden-Popper Halide Perovskites. The Journal of Physical Chemistry Letters
Lu Z, Sun X, Xue W, et al. (2018) Remote epitaxy of copper on sapphire through monolayer graphene buffer. Nanotechnology
Sun X, Lu Z, Xiang Y, et al. (2018) Van der Waals Epitaxy of Antimony Islands, Sheets, and Thin Films on Single-Crystalline Graphene. Acs Nano
Lu Z, Sun X, Xiang Y, et al. (2017) Revealing the Crystalline Integrity of Wafer Scale Graphene on SiO2/Si: An Azimuthal RHEED Approach. Acs Applied Materials & Interfaces
Wang Y, Sun X, Shivanna R, et al. (2016) Photon Transport in One-Dimensional Incommensurately Epitaxial CsPbX3 Arrays. Nano Letters. 16: 7974-7981
Timalsina YP, Horning A, Spivey RF, et al. (2015) Effects of nanoscale surface roughness on the resistivity of ultrathin epitaxial copper films. Nanotechnology. 26: 075704
Liu Y, Wang GC. (2012) Air stability of low-temperature dehydrogenation of Pd-decorated Mg blades. Nanotechnology. 23: 025401
Gaire C, Snow P, Chan TL, et al. (2010) Morphology and texture evolution of nanostructured CaF2 films on amorphous substrates under oblique incidence flux. Nanotechnology. 21: 445701
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