Thomas Cummins, Ph.D.

Affiliations: 
2014 Physics University College Dublin (Ireland) 
Area:
Fluid and Plasma Physics, Atomic Physics, General Physics
Google:
"Thomas Cummins"
Mean distance: (not calculated yet)
 

Parents

Sign in to add mentor
Padraig Dunne grad student 2014 University College Dublin (Ireland)
 (Studies of extreme ultraviolet emission from laser produced plasmas, as sources for next generation lithography.)
BETA: Related publications

Publications

You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect.

Cummins T, O'Gorman C, Dunne P, et al. (2014) Colliding laser-produced plasmas as targets for laser-generated extreme ultraviolet sources Applied Physics Letters. 105
O'Sullivan G, Cummins T, Dunne P, et al. (2013) Recent progress in source development for lithography at 6.x nm Physica Scripta
Donnelly T, Mazoyer M, Lynch A, et al. (2012) CO2 laser pulse shortening by laser ablation of a metal target. The Review of Scientific Instruments. 83: 035102
Otsuka T, Li B, O'Gorman C, et al. (2012) A 6.7-nm beyond EUV source as a future lithography source Proceedings of Spie. 8322: 832214
Higashiguchi T, Otsuka T, Yugami N, et al. (2012) Laser-produced plasma UTA emission in 3-7nm spectral region Proceedings of Spie. 8322
O’Gorman C, Otsuka T, Yugami N, et al. (2012) The effect of viewing angle on the spectral behavior of a Gd plasma source near 6.7 nm Applied Physics Letters. 100: 141108
Cummins T, Otsuka T, Yugami N, et al. (2012) Optimizing conversion efficiency and reducing ion energy in a laser-produced Gd plasma Applied Physics Letters. 100: 061118
Otsuka T, Kilbane D, Cummins T, et al. (2011) Shorter wavelength EUV source around 6.X nm by rare-earth plasma Proceedings of Spie. 8139
Li B, Endo A, Otsuka T, et al. (2011) Scaling of laser produced plasma UTA emission down to 3 nm for next generation lithography and short wavelength imaging Proceedings of Spie - the International Society For Optical Engineering. 8139
See more...