Michael David Henry

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2010 Applied Physics California Institute of Technology, Pasadena, CA 
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Axel Scherer grad student 2010 Caltech
 (ICP etching of silicon for micro and nanoscale devices.)
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Publications

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Henry MD, Douglas EA. (2016) Chemical downstream etching of Ge, Si, and SiNx films Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics. 34
Nordquist CD, Henry MD, Nguyen JH, et al. (2016) Inductive coupling for increased bandwidth of aluminum nitride contour-mode microresonator filters Ieee Mtt-S International Microwave Symposium Digest. 2016
Henry MD, Young T, Hollowell AE, et al. (2015) Wafer-level packaging of aluminum nitride RF MEMS filters Proceedings - Electronic Components and Technology Conference. 2015: 1331-1337
Henry MD, Nguyen J, Young TR, et al. (2014) Frequency trimming of aluminum nitride microresonators using rapid thermal annealing Journal of Microelectromechanical Systems. 23: 620-627
Henry MD, Wolfley S, Monson T, et al. (2014) Ga lithography in sputtered niobium for superconductive micro and nanowires Applied Physics Letters. 105
Walavalkar SS, Homyk AP, Henry MD, et al. (2013) Three-dimensional etching of silicon for the fabrication of low-dimensional and suspended devices. Nanoscale. 5: 927-31
Henry MD, Ahlers CR. (2013) Platinum diffusion barrier breakdown in a-Si/Au eutectic wafer bonding Ieee Transactions On Components, Packaging and Manufacturing Technology. 3: 899-903
Henry MD, Shaner E, Jarecki R. (2013) Silicon nanowire pirani sensor fabricated using FIB lithography Device Research Conference - Conference Digest, Drc. 91-92
Welch CC, Olynick DL, Liu Z, et al. (2012) Formation of nanoscale structures by inductively coupled plasma etching Proceedings of Spie - the International Society For Optical Engineering. 8700
Henry MD, Greth KD, Nguyen J, et al. (2012) Hermetic wafer-level packaging for RF MEMs: Effects on resonator performance Proceedings - Electronic Components and Technology Conference. 362-369
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