Chiew-Seng Koay, Ph.D.

Affiliations: 
2006 University of Central Florida, Orlando, FL, United States 
Area:
Optics Physics, Materials Science Engineering
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Martin C. Richardson grad student 2006 University of Central Florida
 (Radiation studies of the tin -doped microscopic droplet laser plasma light source specific to EUV lithography.)
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Publications

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Koay CS, Felix N, Hamieh B, et al. (2016) Assessments of image-based and scatterometry-based overlay targets Proceedings of Spie - the International Society For Optical Engineering. 9778
Petrillo K, Saulnier N, Johnson R, et al. (2015) Towards production ready processing with a state-of-the-art EUV cluster Proceedings of Spie - the International Society For Optical Engineering. 9422
Saulnier N, Koay CS, Colburn M, et al. (2013) Feasibility study of resist slimming for SIT Proceedings of Spie - the International Society For Optical Engineering. 8682
Chen ST, Kim TS, Nam SW, et al. (2013) 48nm pitch Cu dual-damascene interconnects using self aligned double patterning scheme Proceedings of the 2013 Ieee International Interconnect Technology Conference, Iitc 2013
Mehta SS, Xu Y, Landie G, et al. (2012) Assessment of negative tone development challenges Proceedings of Spie - the International Society For Optical Engineering. 8325
Wood O, Arnold J, Brunner T, et al. (2012) Insertion strategy for EUV lithography Proceedings of Spie - the International Society For Optical Engineering. 8322
Chen JHC, Waskiewicz C, Fan SSC, et al. (2012) 56 nm pitch copper dual-damascene interconnects with triple pitch split metal and double pitch split via 2012 Ieee International Interconnect Technology Conference, Iitc 2012
Halle SD, Hotta S, Koay CS, et al. (2012) Enhanced process control of pitch split double patterning by use of CD-SEM critical dimension uniformity and local overlay metrics Asmc (Advanced Semiconductor Manufacturing Conference) Proceedings. 321-326
Kim RH, Koay CS, Burns SD, et al. (2011) Spacer-defined double patterning for 20-nm and beyond logic BEOL technology Proceedings of Spie - the International Society For Optical Engineering. 7973
Holmes SJ, Tang C, Burns S, et al. (2011) Optimization of pitch-split double patterning photoresist for applications at the 16nm node Proceedings of Spie - the International Society For Optical Engineering. 7972
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