Kazutoshi Takenoshita, Ph.D.
Affiliations: | 2006 | University of Central Florida, Orlando, FL, United States |
Area:
Fluid and Plasma Physics, Electronics and Electrical EngineeringGoogle:
"Kazutoshi Takenoshita"Mean distance: (not calculated yet)
Parents
Sign in to add mentorMartin C. Richardson | grad student | 2006 | University of Central Florida | |
(Debris characterization and mitigation of droplet laser plasma sources for EUV lithography.) |
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Publications
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Hou KC, George S, Mordovanakis AG, et al. (2008) High power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets. Optics Express. 16: 965-74 |
Kamtaprasad RD, Bernath RT, Takenoshita K, et al. (2008) EUV spectroscopy of tin-doped laser plasma source Frontiers in Optics |
Kamtaprasad R, Bernath R, Takenoshita K, et al. (2008) EUV spectroscopy of tin-doped laser plasma source Optics Infobase Conference Papers |
George SA, Hou KC, Takenoshita K, et al. (2007) 13.5 nm EUV generation from tin-doped droplets using a fiber laser. Optics Express. 15: 16348-56 |
George SA, Silfvast WT, Takenoshita K, et al. (2007) Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas. Optics Letters. 32: 997-9 |
Richardson MC, Takenoshita K, Schmid T. (2007) Tin inventory for HVM EUVL sources Proceedings of Spie - the International Society For Optical Engineering. 6517 |
Takenoshita K, George SA, Schmid T, et al. (2007) Characterization of the tin-doped droplet laser plasma EUVL sources for HVM Proceedings of Spie - the International Society For Optical Engineering. 6517 |
Schmid T, George SA, Cunado J, et al. (2007) High repetition-rate LPP-source facility for EUVL Proceedings of Spie - the International Society For Optical Engineering. 6517 |
Takenoshita K, Schmid T, George SA, et al. (2007) High power EUVL source demonstration of tin-doped droplet laser plasma generated by industrial solid state lasers Optics Infobase Conference Papers |
Cunado J, Takenoshita K, George SA, et al. (2007) Stabilized droplet target delivery for high power EUV generation for lithography Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-Leos. 484-485 |