Simi A. George, Ph.D.

Affiliations: 
2007 University of Central Florida, Orlando, FL, United States 
Area:
Fluid and Plasma Physics, Atomic Physics, Optics Physics
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Parents

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Martin C. Richardson grad student 2007 University of Central Florida
 (Spectroscopic studies of laser plasmas for EUV sources.)
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Publications

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George SA, Hayden JS. (2014) Spectroscopy of Nd-doped laser materials Proceedings of Spie - the International Society For Optical Engineering. 8959
George SA, Davis MJ, Carlie N, et al. (2013) Spectroscopic studies of Er3+ emission in co-doped phosphate glasses Cleo: Science and Innovations, Cleo_si 2013. CTu3D.4
George SA, Davis MJ, Carlie N, et al. (2013) Spectroscopic studies of Er3+ emission in co-doped phosphate glasses Cleo: Science and Innovations, Cleo_si 2013. CTu3D.4
McClinton BM, Chen RJ, George SA, et al. (2012) 50X, 75X mask cleaning effects on EUV lithography process and lifetime: Lines and spaces, contacts, and LER Proceedings of Spie - the International Society For Optical Engineering. 8322
Naulleau PP, George SA. (2011) Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations. Applied Optics. 50: 3346-50
Chen RJ, McClinton BM, George SA, et al. (2011) Effect of repetitive acid-based cleaning on EUV mask lifetime and lithographic performance Proceedings of Spie - the International Society For Optical Engineering. 8166
Anderson CN, Baclea-An LM, Denham PE, et al. (2011) The SEMATECH Berkeley MET: Extending EUV learning to 16-nm half pitch Proceedings of Spie - the International Society For Optical Engineering. 7969
George SA, Chen RJ, Baclea-An LM, et al. (2011) 22X mask cleaning effects on EUV lithography process and lifetime Proceedings of Spie - the International Society For Optical Engineering. 7969
George SA, Naulleau PP, Gullikson EM, et al. (2011) Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness Proceedings of Spie - the International Society For Optical Engineering. 7969
George SA, Naulleau PP. (2011) Out of band radiation effects on resist patterning Proceedings of Spie - the International Society For Optical Engineering. 7969
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