Seoyong Ha, Ph.D.

Affiliations: 
2002 Carnegie Mellon University, Pittsburgh, PA 
Area:
Materials Science Engineering, Condensed Matter Physics
Google:
"Seoyong Ha"
Mean distance: (not calculated yet)
 

Parents

Sign in to add mentor
Marek Skowronski grad student 2002 Carnegie Mellon
 (Plastic deformation of silicon carbide crystals during the sublimation bulk growth process.)
BETA: Related publications

Publications

You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect.

Zhang X, Ha S, Hanlumnyang Y, et al. (2007) Morphology of basal plane dislocations in 4H-SiC homoepitaxial layers grown by chemical vapor deposition Journal of Applied Physics. 101
Zhang X, Ha SY, Benamara M, et al. (2006) Structure of Carrot Defects in 4H-SiC Epilayers Materials Science Forum. 327-332
Sumakeris JJ, Bergman JP, Das MK, et al. (2006) Techniques for Minimizing the Basal Plane Dislocation Density in SiC Epilayers to Reduce Vf Drift in SiC Bipolar Power Devices Materials Science Forum. 141-146
Sumakeris JJ, Hull BA, O'Loughlin MJ, et al. (2006) Do You Really Expect To Grow Epilayers On That? A Rationale For Growing Epilayers On Roughened Surfaces Mrs Proceedings. 911
Skowronski M, Ha S. (2006) Degradation of hexagonal silicon-carbide-based bipolar devices Journal of Applied Physics. 99
Sumakeris JJ, Das MK, Ha SY, et al. (2005) Development of Epitaxial SiC Processes Suitable for Bipolar Power Devices Materials Science Forum. 155-158
Ha S, Bergman JP. (2005) Degradation of SiC High-Voltage pin Diodes Mrs Bulletin. 30: 305-307
Ha S, Skowronski M, Sumakeris JJ, et al. (2004) Driving force of stacking-fault formation in SiC p-i-n diodes. Physical Review Letters. 92: 175504
Sumakeris JJ, Das MK, Hobgood HM, et al. (2004) Approaches to Stabilizing the Forward Voltage of Bipolar SiC Devices Materials Science Forum. 1113-1116
Zhang X, Ha S, Benamara M, et al. (2004) Cross-sectional structure of carrot defects in 4H–SiC epilayers Applied Physics Letters. 85: 5209-5211
See more...