Ryoung-han Kim, Ph.D.
Affiliations: | 2005 | Texas A & M University, College Station, TX, United States |
Area:
Electronics and Electrical EngineeringGoogle:
"Ryoung-han Kim"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| Ohannes Eknoyan | grad student | 2005 | Texas A & M | |
| (Design and fabrication of highly efficient electrooptic modulators using Bragg grating reflectors.) | ||||
BETA: Related publications
See more...
Publications
|
You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect. |
| Hay D, Bagge P, Khaw I, et al. (2016) Thin absorber EUV photomask based on mixed Ni and TaN material Proceedings of Spie - the International Society For Optical Engineering. 9984 |
| Mohanty N, Farrell R, Periera C, et al. (2016) LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL) Proceedings of Spie - the International Society For Optical Engineering. 9782 |
| Wang Y, Kim RH, Yuan L, et al. (2015) Study of cut mask lithography options for sub-20nm metal routing Proceedings of Spie - the International Society For Optical Engineering. 9426 |
| Kim RH, McLellan E, Yin Y, et al. (2010) Spacer defined double patterning for sub-72 nm pitch logic technology Proceedings of Spie - the International Society For Optical Engineering. 7640 |
| Kim RH, Holmes S, Halle S, et al. (2010) 22-nm-node technology active-layer patterning for planar transistor devices Journal of Micro/Nanolithography, Mems, and Moems. 9 |
| Kim RH, Holmes S, Halle S, et al. (2009) 22 nm technology node active layer patterning for planar transistor devices Proceedings of Spie - the International Society For Optical Engineering. 7274 |
| La Fontaine B, Deng Y, Kim RH, et al. (2008) The use of EUV lithography to produce demonstration devices Proceedings of Spie - the International Society For Optical Engineering. 6921 |
| Kim RH, Park HH, Joo GT. (2001) Growth of LiNbO |