Ryoung-han Kim, Ph.D.

Affiliations: 
2005 Texas A & M University, College Station, TX, United States 
Area:
Electronics and Electrical Engineering
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Ohannes Eknoyan grad student 2005 Texas A & M
 (Design and fabrication of highly efficient electrooptic modulators using Bragg grating reflectors.)
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Publications

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Hay D, Bagge P, Khaw I, et al. (2016) Thin absorber EUV photomask based on mixed Ni and TaN material Proceedings of Spie - the International Society For Optical Engineering. 9984
Mohanty N, Farrell R, Periera C, et al. (2016) LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL) Proceedings of Spie - the International Society For Optical Engineering. 9782
Wang Y, Kim RH, Yuan L, et al. (2015) Study of cut mask lithography options for sub-20nm metal routing Proceedings of Spie - the International Society For Optical Engineering. 9426
Kim RH, McLellan E, Yin Y, et al. (2010) Spacer defined double patterning for sub-72 nm pitch logic technology Proceedings of Spie - the International Society For Optical Engineering. 7640
Kim RH, Holmes S, Halle S, et al. (2010) 22-nm-node technology active-layer patterning for planar transistor devices Journal of Micro/Nanolithography, Mems, and Moems. 9
Kim RH, Holmes S, Halle S, et al. (2009) 22 nm technology node active layer patterning for planar transistor devices Proceedings of Spie - the International Society For Optical Engineering. 7274
La Fontaine B, Deng Y, Kim RH, et al. (2008) The use of EUV lithography to produce demonstration devices Proceedings of Spie - the International Society For Optical Engineering. 6921
Kim RH, Park HH, Joo GT. (2001) Growth of LiNbO3 (0 0 6) on MgO (0 0 1) and LiTaO3 (0 1 2) substrates by sol-gel procedure Applied Surface Science. 169: 564-569
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