Steven McClellan George
Affiliations: | University of Colorado, Boulder, Boulder, CO, United States |
Area:
surface chemistry, thin film growth and nanostructure engineeringWebsite:
http://www.colorado.edu/che/faculty/george.htmlGoogle:
"Steven George"Mean distance: 7.89 | S | N | B | C | P |
Parents
Sign in to add mentor| Charles Bonner Harris | grad student | 1983 | UC Berkeley | |
| (Picosecond studies of vibrational linewidth broadening in liquids) | ||||
Children
Sign in to add trainee| Jamison A. Smith | grad student | 2001 | CU Boulder |
| Zachary A. Sechrist | grad student | 2006 | CU Boulder |
| Xiaohua Du | grad student | 2007 | CU Boulder |
| Jarod A. McCormick | grad student | 2007 | CU Boulder |
| Beau B. Burton | grad student | 2008 | CU Boulder |
| Dragos Seghete | grad student | 2010 | CU Boulder |
| Andrew S. Cavanagh | grad student | 2011 | CU Boulder (Physics Tree) |
| Aziz I. Abdulagatov | grad student | 2012 | CU Boulder |
| Jacob A. Bertrand | grad student | 2006-2012 | CU Boulder |
| Daniel James Higgs | grad student | 2016 | CU Boulder |
| Jeffrey W. Elam | post-doc | CU Boulder |
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Publications
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| Welch BC, Antonio EN, Chaney TP, et al. (2024) Building Semipermeable Films One Monomer at a Time: Structural Advantages via Molecular Layer Deposition vs Interfacial Polymerization. Chemistry of Materials : a Publication of the American Chemical Society. 36: 1362-1374 |
| Moeini B, Avval TG, Brongersma HH, et al. (2023) Area-Selective Atomic Layer Deposition of ZnO on Si\SiO Modified with Tris(dimethylamino)methylsilane. Materials (Basel, Switzerland). 16 |
| George SM. (2020) Mechanisms of Thermal Atomic Layer Etching. Accounts of Chemical Research. 53: 1151-1160 |
| Young MJ, Yanguas-Gil A, Letourneau S, et al. (2020) Probing the atomic-scale structure of amorphous aluminum oxide grown by atomic layer deposition. Acs Applied Materials & Interfaces |
| Welch BC, McIntee OM, Ode AB, et al. (2020) Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition Journal of Vacuum Science and Technology. 38: 52409 |
| Parsons GN, Elam JW, George SM, et al. (2020) Erratum: “History of atomic layer deposition and its relationship with the American Vacuum Society” [J. Vac. Sci. Technol. A 31, 050818 (2013)] Journal of Vacuum Science & Technology A. 38: 037001 |
| Abdulagatov AI, George SM. (2020) Thermal atomic layer etching of silicon nitride using an oxidation and “conversion etch” mechanism Journal of Vacuum Science & Technology A. 38: 022607 |
| Fischer A, Routzahn A, Lee Y, et al. (2020) Thermal etching of AlF3 and thermal atomic layer etching of Al2O3 Journal of Vacuum Science and Technology. 38: 22603 |
| Murdzek JA, George SM. (2020) Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide Journal of Vacuum Science & Technology A. 38: 022608 |
| Mahuli N, Cavanagh AS, George SM. (2020) Atomic layer deposition of aluminum oxyfluoride thin films with tunable stoichiometry Journal of Vacuum Science & Technology A. 38: 022407 |