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Amy E. Wendt

Affiliations: 
University of Wisconsin, Madison, Madison, WI 
Area:
Materials Science Engineering, Electronics and Electrical Engineering, Fluid and Plasma Physics
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"Amy Wendt"
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Rardchawadee Silapunt grad student 2004 UW Madison
Marlann M. Patterson grad student 2005 UW Madison
Ruhang Ding grad student 2008 UW Madison
Yuk-Hong J. Ting grad student 2011 UW Madison

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Publications

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Boffard JB, Lin CC, Wendt AE. (2017) Application of Excitation Cross-Section Measurements to Optical Plasma Diagnostics Advances in Atomic Molecular and Optical Physics. 67: 1-76
Boffard JB, Lin CC, Wang S, et al. (2015) Comparison of surface vacuum ultraviolet emissions with resonance level number densities. II. Rare-gas plasmas and Ar-molecular gas mixtures Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 33
Boffard JB, Wang S, Lin CC, et al. (2015) Detection of fast electrons in pulsed argon inductively-coupled plasmas using the 420.1–419.8 nm emission line pair Plasma Sources Science and Technology. 24: 65005
Boffard JB, Lin CC, Culver C, et al. (2014) Comparison of surface vacuum ultraviolet emissions with resonance level number densities. I. Argon plasmas Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 32
Wang S, Wendt AE, Boffard JB, et al. (2013) Noninvasive, real-time measurements of plasma parameters via optical emission spectroscopy Journal of Vacuum Science and Technology. 31: 21303
Boffard JB, Jung RO, Lin CC, et al. (2012) Argon 420.1–419.8 nm emission line ratio for measuring plasma effective electron temperatures Journal of Physics D: Applied Physics. 45: 045201
Boffard JB, Jung RO, Lin CC, et al. (2012) Evidence of weak plasma series resonance heating in the H-mode of neon and neon/argon inductively coupled plasmas Journal of Physics D. 45: 382001
Chen F, Jiang H, Kiefer AM, et al. (2011) Fabrication of ultrahigh-density nanowires by electrochemical nanolithography. Nanoscale Research Letters. 6: 444
Boffard JB, Jung RO, Lin CC, et al. (2011) Optical diagnostics for characterization of electron energy distributions: argon inductively coupled plasmas Plasma Sources Science and Technology. 20: 055006
Ting YH, Liu CC, Park SM, et al. (2010) Surface roughening of polystyrene and poly(methyl methacrylate) in Ar/O2 plasma etching Polymers. 2: 649-663
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