John Charles Corelli

Affiliations: 
1962- Physics Rensselaer Polytechnic Institute, Troy, NY, United States 
Area:
Nuclear engineering
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"John Charles Corelli"
Bio:

https://library.brown.edu/theses/theses.php?task=search&advisorid=1330
http://adsabs.harvard.edu/abs/1959PhDT........16C
DOI: 10.1103/PhysRev.116.1184

Mean distance: (not calculated yet)
 

Parents

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Peter Jocelyn Westervelt research assistant 1954 Brown
 (Sc.M. thesis: Acoustic streaming round a cylinder oscillating in quiescent fluids.)
Ernst Bleuler grad student 1959 Purdue
 (Scattering of 19-MEV Alpha-Particles by Carbon -12, OXYGEN-16 and SULFUR-32.)

Children

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John Edward Fischer grad student 1966 RPI (E-Tree)
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Publications

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Balakrishnan S, Corelli JC, Rajan K. (1991) Study of palladium silicide formed using a focused ion beam machine Journal of Vacuum Science & Technology B. 9: 2687-2691
Lin HT, Balakrishnan S, McDonald JF, et al. (1990) Ion beam profiling and end-point detection with microfocused secondary ion mass spectroscopy Journal of Vacuum Science and Technology. 8: 93-98
Balakrishnan S, Rajan K, Corelli JC. (1989) Radiation effects on compound formation in palladium-implanted silicon using a focused ion beam machine Journal of Nuclear Materials. 169: 79-85
Yapsir AS, Hadizad P, Lu T, et al. (1988) Defect centers and changes in the electrical characteristics of Al/n-type Si Schottky diodes induced by hydrogen-ion implantations. Physical Review. B, Condensed Matter. 37: 8982-8987
Corelli JC, Higuchi‐Rusli R, Balakrishnan S, et al. (1988) Summary Abstract: Liquid metal ion sources and applications in focused ion beam systems Journal of Vacuum Science & Technology B. 6: 936-936
Choi JO, Moore JA, Corelli JC, et al. (1988) Degradation of poly(methylmethacrylate) by deep ultraviolet, x‐ray, electron beam, and proton beam irradiations Journal of Vacuum Science & Technology B. 6: 2286-2289
Yapsir AS, Lu TM, Hadizad P, et al. (1988) Electrical characteristics of hydrogen implanted silicon Schottky diodes having large difference in metal work function Journal of Applied Physics. 63: 5040-5043
Higuchi-Rusli RH, Corelli JC, Steckl AJ, et al. (1988) Characteristics and surface analysis of ion beam deposition from binary boron platinum (Pt58B42) liquid‐metal ion source Journal of Applied Physics. 63: 878-886
Lin HT, McDonald JF, Corelli JC, et al. (1988) Focused electron and ion beam repair strategies for wafer-scale interconnections in thin film packaging Thin Solid Films. 166: 121-130
Yapsir AS, Hadizad P, Lu TM, et al. (1987) The Effects of High and Low Dose Hydrogen Ion Implantations on Al/n-Si Schottky Diodes Mrs Proceedings. 104
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