Jason B. Corliss, Ph.D.
Affiliations: | 2011 | University of Wisconsin, Madison, Madison, WI |
Area:
Optics Physics, Astronomy and AstrophysicsGoogle:
"Jason Corliss"Mean distance: (not calculated yet)
Parents
Sign in to add mentorJames Edward Lawler | grad student | 2011 | UW Madison | |
(Large-field high resolution spectroscopy: Development of all-reflective spatial heterodyne spectrometers, and, Astronomical results using an image slicer from the McMath-Pierce main spectrograph.) |
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Publications
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Corliss JB, Harris WM, Mierkiewicz EJ, et al. (2015) Development and field tests of a narrowband all-reflective spatial heterodyne spectrometer. Applied Optics. 54: 8835-43 |
Vincent FE, Harris WM, Beasley M, et al. (2011) Identification and treatment of an efficiency anomaly in a symmetrically ruled grating illuminated at normal incidence Journal of Electron Spectroscopy and Related Phenomena. 184: 346-349 |
Harlander JM, Lawler JE, Corliss J, et al. (2010) First results from an all-reflection spatial heterodyne spectrometer with broad spectral coverage. Optics Express. 18: 6205-10 |
Bétrémieux Y, Corliss J, Vincent MB, et al. (2010) Description and ray-tracing simulations of HYPE, a far-ultraviolet polarimetric Spatial-Heterodyne spectrometer Proceedings of Spie - the International Society For Optical Engineering. 7732 |
Harris W, Roesler F, Ben-Jaffel L, et al. (2005) Applications of spatial heterodyne spectroscopy for remote sensing of diffuse UV-vis emission line sources in the solar system Journal of Electron Spectroscopy and Related Phenomena. 144: 973-977 |
Harris WM, Roesler FL, Harlander J, et al. (2004) Applications of reflective spatial heterodyne spectroscopy to UY exploration in the Solar System Proceedings of Spie - the International Society For Optical Engineering. 5488: 886-897 |
Harris WM, Roesler FL, Nordsieck KH, et al. (2002) Studies of H Ly-α emissions in the solar neighborhood with the techniques of polarimetry and spatial hetrodyne spectroscopy (SHS) Proceedings of Spie - the International Society For Optical Engineering. 4854: 676-685 |