Navneet Kumar, Ph.D.
Affiliations: | 2009 | University of Illinois, Urbana-Champaign, Urbana-Champaign, IL |
Area:
Materials Science EngineeringGoogle:
"Navneet Kumar"Mean distance: (not calculated yet)
Parents
Sign in to add mentor| John R Abelson | grad student | 2009 | UIUC | |
| (Control of reaction surface in low temperature CVD to enhance nucleation and conformal coverage.) | ||||
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Publications
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| Babar S, Kumar N, Zhang P, et al. (2013) Growth inhibitor to homogenize nucleation and obtain smooth HfB2 thin films by chemical vapor deposition Chemistry of Materials. 25: 662-667 |
| Schmucker SW, Kumar N, Abelson JR, et al. (2012) Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography. Nature Communications. 3: 935 |
| Tayebi N, Yanguas-Gil A, Kumar N, et al. (2012) Hard HfB2 tip-coatings for ultrahigh density probe-based storage Applied Physics Letters. 101: 091909 |
| Ye W, Peña Martin PA, Kumar N, et al. (2010) Direct writing of sub-5 nm hafnium diboride metallic nanostructures. Acs Nano. 4: 6818-24 |
| Chatterjee A, Kumar N, Abelson JR, et al. (2010) Nanowear of Hafnium Diboride thin films Tribology Transactions. 53: 731-738 |
| Yanguas-Gil A, Kumar N, Yang Y, et al. (2009) Highly conformal film growth by chemical vapor deposition. II. Conformality enhancement through growth inhibition Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 27: 1244-1248 |
| Yanguas-Gil A, Yang Y, Kumar N, et al. (2009) Highly conformal film growth by chemical vapor deposition. I. A conformal zone diagram based on kinetics Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 27: 1235-1243 |
| Kumar N, Yanguas-Gil A, Daly SR, et al. (2009) Remote plasma treatment of Si surfaces: Enhanced nucleation in low-temperature chemical vapor deposition Applied Physics Letters. 95 |
| Kumar N, Noh W, Daly SR, et al. (2009) Low temperature chemical vapor deposition of hafnium nitride - Boron nitride nanocomposite films Chemistry of Materials. 21: 5601-5606 |
| Kumar N, Yanguas-Gil A, Daly SR, et al. (2008) Growth inhibition to enhance conformal coverage in thin film chemical vapor deposition. Journal of the American Chemical Society. 130: 17660-1 |