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Noel Arellano, Ph.D. - Publications

Affiliations: 
2008- nanofabrication IBM Almaden Research Center, San Jose, CA, United States 
Area:
nanofabrication
Website:
http://researcher.watson.ibm.com/researcher/view.php?person=us-narella
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24 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2021 Wojtecki R, Ma J, Cordova I, Arellano N, Lionti K, Magbitang T, Pattison TG, Zhao X, Delenia E, Lanzillo N, Hess AE, Nathel NF, Bui H, Rettner C, Wallraff G, et al. Additive Lithography-Organic Monolayer Patterning Coupled with an Area-Selective Deposition. Acs Applied Materials & Interfaces. PMID 33471496 DOI: 10.1021/acsami.0c16817  0.405
2020 Spanu A, Colistra N, Farisello P, Friz A, Arellano N, Rettner CT, Bonfiglio A, Bozano L, Martinoia S. A three-dimensional micro-electrode array for in-vitro neuronal interfacing. Journal of Neural Engineering. PMID 32480394 DOI: 10.1088/1741-2552/Ab9844  0.306
2020 Sun W, Shen J, Zhao Z, Arellano N, Rettner C, Tang J, Cao T, Zhou Z, Ta T, Streit JK, Fagan JA, Schaus T, Zheng M, Han SJ, Shih WM, et al. Precise pitch-scaling of carbon nanotube arrays within three-dimensional DNA nanotrenches. Science (New York, N.Y.). 368: 874-877. PMID 32439790 DOI: 10.1126/Science.Aaz7440  0.314
2020 Pattison TG, Hess AE, Arellano N, Lanzillo N, Nguyen S, Bui H, Rettner C, Truong H, Friz A, Topuria T, Fong A, Hughes B, Tek AT, DeSilva A, Miller RD, et al. Surface Initiated Polymer Thin Films for the Area Selective Deposition and Etching of Metal Oxides. Acs Nano. PMID 32167284 DOI: 10.1021/Acsnano.9B09637  0.351
2019 Mettry M, Hess AE, Goetting I, Arellano N, Friz A, Tek A, Wojtecki RJ. Extending the compositional diversity of films in area selective atomic layer deposition through chemical functionalities Journal of Vacuum Science & Technology A. 37: 020923. DOI: 10.1116/1.5080119  0.417
2018 Wojtecki RJ, Mettry M, Fine Nathel NF, Friz A, De Silva A, Arellano N, Shobha H. 15nm Resolved Patterns in Selective Area Atomic Layer Deposition - Defectivity Reduction by Monolayer Design. Acs Applied Materials & Interfaces. PMID 30335930 DOI: 10.1021/Acsami.8B13896  0.412
2016 Vora A, Schmidt K, Alva G, Arellano N, Magbitang TP, Chunder A, Thompson L, Lofano E, Pitera JW, Cheng JY, Sanders DP. Orientation Control of Block Copolymers using Surface Active, Phase-preferential Additives. Acs Applied Materials & Interfaces. PMID 27700028 DOI: 10.1021/Acsami.6B11293  0.417
2016 Vora A, Alva G, Chunder A, Schmidt K, Magbitang T, Lofano E, Arellano N, Cheng J, Sanders DP. Synthesis and Thin-film Self-assembly of Cylinder-Forming High-χ Block Copolymers Journal of Photopolymer Science and Technology. 29: 685-688. DOI: 10.2494/Photopolymer.29.685  0.428
2016 Tsai H, Miyazoe H, Vora A, Magbitang T, Arellano N, Liu CC, Maher MJ, Durand WJ, Dawes SJ, Bucchignano JJ, Gignac L, Sanders DP, Joseph EA, Colburn ME, Willson CG, et al. High chi block copolymer DSA to improve pattern quality for FinFET device fabrication Proceedings of Spie - the International Society For Optical Engineering. 9779. DOI: 10.1117/12.2219544  0.477
2015 Vora A, Chunder A, Tjio M, Magbitang T, Lofano E, Arellano N, Schmidt K, Nguyen K, Cheng J, Sanders DP. Synthesis and characterization of polycarbonate-containing all-organic High-χ block copolymers for directed self-assembly Journal of Photopolymer Science and Technology. 28: 659-662. DOI: 10.2494/Photopolymer.28.659  0.474
2015 Hirahara E, Paunescu M, Polishchuk O, Jeong E, Ng E, Shan J, Kim J, Hong S, Baskaran D, Lin G, Vora A, Tjio M, Arellano N, Rettner CT, Lofano E, et al. Directed self-assembly of topcoat-free, integration-friendly high-χ block copolymers Proceedings of Spie - the International Society For Optical Engineering. 9425. DOI: 10.1117/12.2087398  0.477
2015 Cheng J, Doerk GS, Rettner CT, Singh G, Tjio M, Truong H, Arellano N, Balakrishnan S, Brink M, Tsai H, Liu CC, Guillorn M, Sanders DP. Customization and design of directed self-assembly using hybrid prepatterns Proceedings of Spie - the International Society For Optical Engineering. 9423. DOI: 10.1117/12.2086973  0.701
2015 Arellano N, Berman D, Frommer J, Imaino W, Jiang X, Jubert PO, McClelland G, Rettner C, Topuria T. Bit-Patterned Media on Plastic Tape with Feature Density of 100 Gigadot/in2 Ieee Transactions On Magnetics. 51. DOI: 10.1109/Tmag.2015.2394447  0.388
2014 Doerk GS, Cheng JY, Singh G, Rettner CT, Pitera JW, Balakrishnan S, Arellano N, Sanders DP. Enabling complex nanoscale pattern customization using directed self-assembly. Nature Communications. 5: 5805. PMID 25512171 DOI: 10.1038/Ncomms6805  0.712
2014 Komura K, Hishiro Y, Wakamatsu G, Takimoto Y, Nagai T, Kimura T, Yamaguchi Y, Shimokawa T, Breyta G, Arellano N, Balakarishnan S, Bozano LD, Sankaranarayanan A, Bajjuri KM, Sanders DP, et al. Spin-on organic hardmask for topo-patterned substrate Proceedings of Spie - the International Society For Optical Engineering. 9051. DOI: 10.1117/12.2046357  0.348
2013 Doerk GS, Liu CC, Cheng JY, Rettner CT, Pitera JW, Krupp LE, Topuria T, Arellano N, Sanders DP. Pattern placement accuracy in block copolymer directed self-assembly based on chemical epitaxy. Acs Nano. 7: 276-85. PMID 23199006 DOI: 10.1021/Nn303974J  0.712
2013 Doerk GS, Cheng JY, Rettner CT, Balakrishnan S, Arellano N, Sanders DP. Deterministically isolated gratings through the directed self-assembly of block copolymers Proceedings of Spie - the International Society For Optical Engineering. 8680. DOI: 10.1117/12.2011629  0.715
2012 Liu CC, Pitera J, Lafferty N, Lai K, Rettner C, Tjio M, Arellano N, Cheng J. Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916525  0.4
2012 Doerk GS, Liu CC, Cheng JY, Rettner CT, Pitera JW, Krupp L, Topuria T, Arellano N, Sanders DP. Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns Proceedings of Spie - the International Society For Optical Engineering. 8323. DOI: 10.1117/12.916421  0.7
2012 Wakamatsu G, Goto K, Hishiro Y, Furukawa T, Murakami S, Motonari M, Yamaguchi Y, Shimokawa T, Breyta G, Desilva A, Arellano N, Bozano LD, Sooriyakumaran R, Larson CE, Glodde M. Investigation of pattern wiggling for spin-on organic hardmask materials Proceedings of Spie - the International Society For Optical Engineering. 8325. DOI: 10.1117/12.915698  0.362
2012 Ayothi R, Singh L, Hishiro Y, Pitera JW, Sundberg LK, Sanchez MI, Bozano L, Virwani K, Truong HD, Arellano N, Petrillo K, Wallraff GM, Hinsberg WD, Hua Y. Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 30. DOI: 10.1116/1.4767235  0.315
2011 Bass JD, Schaper CD, Rettner CT, Arellano N, Alharbi FH, Miller RD, Kim HC. Transfer molding of nanoscale oxides using water-soluble templates. Acs Nano. 5: 4065-72. PMID 21469708 DOI: 10.1021/Nn2006514  0.344
2008 Arellano N, Quévy EP, Provine J, Maboudian R, Howe RT. Silicon nanowire coupled micro-resonators Proceedings of the Ieee International Conference On Micro Electro Mechanical Systems (Mems). 721-724. DOI: 10.1109/MEMSYS.2008.4443758  0.55
2007 Paulo AS, Arellano N, Plaza JA, He R, Carraro C, Maboudian R, Howe RT, Bokor J, Yang P. Suspended mechanical structures based on elastic silicon nanowire arrays. Nano Letters. 7: 1100-4. PMID 17375964 DOI: 10.1021/Nl062877N  0.63
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