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Emi Kawamura, Ph.D. - Publications

Affiliations: 
University of California, Berkeley, Berkeley, CA, United States 
Area:
electron beam plasma physics, plasma sciences
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7 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2020 Kawamura E, Lieberman MA, Lichtenberg AJ, Chabert P. Particle-in-cell simulations and passive bulk model of collisional capacitive discharge Journal of Vacuum Science and Technology. 38: 23003. DOI: 10.1116/1.5135575  0.431
2013 Gudmundsson JT, Kawamura E, Lieberman MA. A benchmark study of a capacitively coupled oxygen discharge of the oopd1 particle-in-cell Monte Carlo code Plasma Sources Science and Technology. 22. DOI: 10.1088/0963-0252/22/3/035011  0.397
2012 Kawamura E, Lieberman MA, Lichtenberg AJ, Graves DB. Two-dimensional simulation of inductive-capacitive transition instability in an electronegative plasma Plasma Sources Science and Technology. 21. DOI: 10.1088/0963-0252/21/4/045014  0.314
2005 Kawamura E, Birdsall CK. Effect of Coulomb scattering on low-pressure high-density electronegative discharges. Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics. 71: 026403. PMID 15783425  0.557
2005 Kawamura E, Birdsall CK. Effect of Coulomb scattering on low-pressure high-density electronegative discharges Physical Review E - Statistical, Nonlinear, and Soft Matter Physics. 71. DOI: 10.1103/PhysRevE.71.026403  0.471
2000 Kawamura E, Birdsall CK, Vahedi V. Physical and numerical methods of speeding up particle codes and paralleling as applied to RF discharges Plasma Sources Science and Technology. 9: 413-428. DOI: 10.1088/0963-0252/9/3/319  0.509
1999 Kawamura E, Vahedi V, Lieberman MA, Birdsall CK. Ion energy distributions in rf sheaths; review, analysis and simulation Plasma Sources Science and Technology. 8: R45-R64. DOI: 10.1088/0963-0252/8/3/202  0.521
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