Year |
Citation |
Score |
2004 |
Yamada S, Cho S, Lee JH, Zhang T, Zampini A. Design and Study of Silicone-based Materials for Bilayer Resist Application Journal of Photopolymer Science and Technology. 17: 511-518. DOI: 10.2494/Photopolymer.17.511 |
0.691 |
|
2004 |
Yamada S, Mrozek T, Rager T, Owens J, Rangel J, Willson CG, Byers J. Toward environmentally friendly photolithographic materials: A new class of water-soluble photoresists Macromolecules. 37: 377-384. DOI: 10.1021/Ma034461R |
0.653 |
|
2002 |
Tran HV, Hung RJ, Chiba T, Yamada S, Mrozek T, Hsieh YT, Chambers CR, Osborn BP, Trinque BC, Pinnow MJ, MacDonald SA, Willson CG, Sanders DP, Connor EF, Grubbs RH, et al. Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging results Macromolecules. 35: 6539-6549. DOI: 10.1021/Ma0122371 |
0.74 |
|
2001 |
Tran HV, Hung RJ, Chiba T, Yamada S, Mrozek T, Hsieh Y, Chambers CR, Osborn BP, Trinque BC, Pinnow MJ, Sanders DP, Connor EF, Grubbs RH, Conley W, MacDonald SA, et al. Fluoropolymer Resist Materials for 157nm Microlithography. Journal of Photopolymer Science and Technology. 14: 669-674. DOI: 10.2494/Photopolymer.14.669 |
0.753 |
|
2000 |
Chiba T, Hung RJ, Yamada S, Trinque B, Yamachika M, Brodsky C, Patterson K, Heyden AV, Jamison A, Lin SH, Somervell M, Byers J, Conley W, Willson CG. 157 nm Resist Materials: A Progress Report. Journal of Photopolymer Science and Technology. 13: 657-664. DOI: 10.2494/Photopolymer.13.657 |
0.738 |
|
2000 |
Brodsky C, Byers J, Conley W, Hung R, Yamada S, Patterson K, Somervell M, Trinque B, Tran HV, Cho S, Chiba T, Lin SH, Jamieson A, Johnson H, Vander Heyden T, et al. 157 nm resist materials: Progress report Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3396-3401. DOI: 10.1116/1.1321762 |
0.657 |
|
1999 |
Yamachika M, Patterson K, Cho S, Rager T, Yamada S, Byers J, Paniez PJ, Mortini B, Gally S, Sassoulas PO, Willson CG. Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists Journal of Photopolymer Science and Technology. 12: 553-560. DOI: 10.2494/Photopolymer.12.553 |
0.791 |
|
1999 |
Havard JM, Vladimirov N, Fréchet JMJ, Yamada S, Willson CG, Byers JD. Photoresists with Reduced Environmental Impact: Water-Soluble Resists Based on Photo-Cross-Linking of a Sugar-Containing Polymethacrylate Macromolecules. 32: 86-94. DOI: 10.1021/Ma981372J |
0.456 |
|
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