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David B. Graves - Publications

Affiliations: 
Chemistry University of California, Berkeley, Berkeley, CA, United States 
Area:
Plasma processing and electronic materials
Website:
http://chemistry.berkeley.edu/faculty/cbe/graves
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232 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2020 Hessel V, Graves DB, Kim H. Special issue on nitrogen fixation in plasma: from fundamentals to sustainability Journal of Physics D. 53: 420201. DOI: 10.1088/1361-6463/Ab93Cd  0.405
2020 Pei X, Gidon D, Graves DB. Specific energy cost for nitrogen fixation as NO x using DC glow discharge in air Journal of Physics D. 53: 44002. DOI: 10.1088/1361-6463/Ab5095  0.797
2019 Bauer G, Sersenová D, Graves DB, Machala Z. Dynamics of Singlet Oxygen-Triggered, RONS-Based Apoptosis Induction after Treatment of Tumor Cells with Cold Atmospheric Plasma or Plasma-Activated Medium. Scientific Reports. 9: 13931. PMID 31558835 DOI: 10.1038/S41598-019-50329-3  0.331
2019 Witman M, Gidon D, Graves DB, Smit B, Mesbah A. Sim-to-real transfer reinforcement learning for control of thermal effects of an atmospheric pressure plasma jet Plasma Sources Science and Technology. 28: 95019. DOI: 10.1088/1361-6595/Ab3C15  0.792
2019 Gidon D, Graves DB, Mesbah A. Predictive control of 2D spatial thermal dose delivery in atmospheric pressure plasma jets Plasma Sources Science and Technology. 28: 85001. DOI: 10.1088/1361-6595/Ab2C66  0.804
2019 Gidon D, Graves DB, Mesbah A. Spatial thermal dose delivery in atmospheric pressure plasma jets Plasma Sources Science and Technology. 28: 25006-25006. DOI: 10.1088/1361-6595/Aafff6  0.806
2019 Elg DT, Graves DB. Perfluorodecalin to enhance reactive species delivery in plasma-biomaterial interactions Journal of Physics D. 52: 355204-355204. DOI: 10.1088/1361-6463/Ab2A62  0.443
2019 Mesbah A, Graves DB. Machine learning for modeling, diagnostics, and control of non-equilibrium plasmas Journal of Physics D. 52. DOI: 10.1088/1361-6463/Ab1F3F  0.541
2019 Im Y, Xiong Z, Elg DT, Graves DB. Uptake and diffusion of plasma-generated reactive nitrogen species through keratinized membrane Journal of Physics D. 52: 195201-195201. DOI: 10.1088/1361-6463/Ab0867  0.374
2019 Pei X, Gidon D, Yang Y, Xiong Z, Graves DB. Reducing energy cost of NOx production in air plasmas Chemical Engineering Journal. 362: 217-228. DOI: 10.1016/J.Cej.2019.01.011  0.804
2019 Graves DB, Bakken LB, Jensen MB, Ingels R. Plasma Activated Organic Fertilizer Plasma Chemistry and Plasma Processing. 39: 1-19. DOI: 10.1007/S11090-018-9944-9  0.352
2018 Graves DB. Lessons From Tesla for Plasma Medicine Ieee Transactions On Radiation and Plasma Medical Sciences. 2: 594-607. DOI: 10.1109/TRPMS.2018.2866373  0.305
2018 Gidon D, Curtis B, Paulson JA, Graves DB, Mesbah A. Model-Based Feedback Control of a kHz-Excited Atmospheric Pressure Plasma Jet Ieee Transactions On Radiation and Plasma Medical Sciences. 2: 129-137. DOI: 10.1109/TRPMS.2017.2764629  0.804
2018 Pei X, Gidon D, Graves DB. Propeller arc: design and basic characteristics Plasma Sources Science and Technology. 27: 125007-125007. DOI: 10.1088/1361-6595/Aaf7Ef  0.808
2018 Pei X, Gidon D, Graves DB. Biologically Active NOx Production By Nano-Second Pin-Plate Discharge In Air Clinical Plasma Medicine. 9: 41. DOI: 10.1016/J.Cpme.2017.12.064  0.79
2018 Graves D, Gidon D, Curtis B, Elg D, Mesbah A. Advanced Control Of Plasma Medical Devices Clinical Plasma Medicine. 9: 2. DOI: 10.1016/J.Cpme.2017.12.002  0.796
2017 Machala Z, Graves DB. Frugal Biotech Applications of Low-Temperature Plasma. Trends in Biotechnology. PMID 28870409 DOI: 10.1016/J.Tibtech.2017.07.013  0.428
2017 Graves DB. Mechanisms of Plasma Medicine: Coupling Plasma Physics, Biochemistry, and Biology Ieee Transactions On Radiation and Plasma Medical Sciences. 1: 281-292. DOI: 10.1109/TRPMS.2017.2710880  0.301
2017 Gidon D, Graves DB, Mesbah A. Effective dose delivery in atmospheric pressure plasma jets for plasma medicine: a model predictive control approach Plasma Sources Science and Technology. 26: 85005-85005. DOI: 10.1088/1361-6595/Aa7C5D  0.807
2017 Elg DT, Yang I, Graves DB. Production of TEMPO by O atoms in atmospheric pressure non-thermal plasma?liquid interactions Journal of Physics D. 50: 475201. DOI: 10.1088/1361-6463/Aa8F8C  0.437
2017 Adamovich I, Baalrud SD, Bogaerts A, Bruggeman PJ, Cappelli M, Colombo V, Czarnetzki U, Ebert U, Eden JG, Favia P, Graves DB, Hamaguchi S, Hieftje G, Hori M, Kaganovich ID, et al. The 2017 Plasma Roadmap: Low temperature plasma science and technology Journal of Physics D: Applied Physics. 50: 323001. DOI: 10.1088/1361-6463/Aa76F5  0.394
2017 Szili EJ, Gaur N, Hong S, Kurita H, Oh J, Ito M, Mizuno A, Hatta A, Cowin AJ, Graves DB, Short RD. The assessment of cold atmospheric plasma treatment of DNA in synthetic models of tissue fluid, tissue and cells Journal of Physics D. 50: 274001. DOI: 10.1088/1361-6463/Aa7501  0.391
2017 Xiong Z, Graves DB. A novel cupping-assisted plasma treatment for skin disinfection Journal of Physics D. 50: 6. DOI: 10.1088/1361-6463/50/5/05Lt01  0.443
2017 Davydova A, Despiau-Pujo E, Cunge G, Graves DB. H+ ion-induced damage and etching of multilayer graphene in H2 plasmas Journal of Applied Physics. 121: 133301. DOI: 10.1063/1.4979023  0.362
2016 Bartis EAJ, Luan P, Knoll AJ, Graves DB, Seog J, Oehrlein GS. A comparative study of biomolecule and polymer surface modifications by a surface microdischarge Topical Issue: Recent Breakthroughs in Microplasma Science and Technology Kurt Becker, Jose Lopez, David Staack, Klaus-Dieter Weltmann and Wei Dong Zhu European Physical Journal D. 70. DOI: 10.1140/Epjd/E2015-60446-3  0.43
2016 Sirard S, Azarnouche L, Gurer E, Durand W, Maher M, Mori K, Blachut G, Janes D, Asano Y, Someya Y, Hymes D, Graves D, Ellison C, Willson G. Plasma etch of block copolymers for lithography Spie Newsroom. DOI: 10.1117/2.1201603.006351  0.439
2016 Sirard S, Azarnouche L, Gurer E, Durand W, Maher M, Mori K, Blachut G, Janes D, Asano Y, Someya Y, Hymes D, Graves D, Ellison CJ, Willson CG. Interactions between plasma and block copolymers used in directed self-assembly patterning Proceedings of Spie. 9782. DOI: 10.1117/12.2220305  0.414
2016 Azarnouche L, Sirard SM, Durand WJ, Blachut G, Gurer E, Hymes DJ, Ellison CJ, Willson CG, Graves DB. Plasma and photon interactions with organosilicon polymers for directed self-assembly patterning applications Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 34: 061602. DOI: 10.1116/1.4964885  0.394
2016 Bruggeman PJ, Kushner MJ, Locke BR, Gardeniers JGE, Graham WG, Graves DB, Hofman-Caris RCHM, Maric D, Reid JP, Ceriani E, Fernandez Rivas D, Foster JE, Garrick SC, Gorbanev Y, Hamaguchi S, et al. Plasma–liquid interactions: a review and roadmap Plasma Sources Science and Technology. 25: 053002. DOI: 10.1088/0963-0252/25/5/053002  0.331
2016 Gopalakrishnan R, Kawamura E, Lichtenberg AJ, Lieberman MA, Graves DB. Solvated electrons at the atmospheric pressure plasma–water anodic interface Journal of Physics D: Applied Physics. 49: 295205. DOI: 10.1088/0022-3727/49/29/295205  0.417
2016 Lindsay AD, Graves DB, Shannon SC. Fully coupled simulation of the plasma liquid interface and interfacial coefficient effects Journal of Physics D. 49: 235204-235204. DOI: 10.1088/0022-3727/49/23/235204  0.375
2016 Oh JS, Strudwick X, Short RD, Ogawa K, Hatta A, Furuta H, Gaur N, Hong SH, Cowin AJ, Fukuhara H, Inoue K, Ito M, Charles C, Boswell RW, Bradley JW, ... Graves DB, et al. How plasma induced oxidation, oxygenation, and de-oxygenation influences viability of skin cells Applied Physics Letters. 109: 203701. DOI: 10.1063/1.4967880  0.338
2016 Lu X, Naidis GV, Laroussi M, Reuter S, Graves DB, Ostrikov K. Reactive species in non-equilibrium atmospheric-pressure plasmas: Generation, transport, and biological effects Physics Reports. DOI: 10.1016/J.Physrep.2016.03.003  0.449
2016 Anderson CE, Cha NR, Lindsay AD, Clark DS, Graves DB. The Role of Interfacial Reactions in Determining Plasma–Liquid Chemistry Plasma Chemistry and Plasma Processing. 36: 1393-1415. DOI: 10.1007/s11090-016-9742-1  0.358
2016 Despiau-Pujo E, Davydova A, Cunge G, Graves DB. Hydrogen Plasmas Processing of Graphene Surfaces Plasma Chemistry and Plasma Processing. 36: 213-229. DOI: 10.1007/S11090-015-9683-0  0.378
2016 Xiong Z, Roe J, Grammer TC, Graves DB. Cover Picture: Plasma Process. Polym. 6∕2016 Plasma Processes and Polymers. 13: 579. DOI: 10.1002/Ppap.201670018  0.378
2016 Dai XJ, Corr CS, Ponraj SB, Maniruzzaman M, Ambujakshan AT, Chen Z, Kviz L, Lovett R, Rajmohan GD, Celis DRd, Wright ML, Lamb PR, Krasik YE, Graves DB, Graham WG, et al. Cover Picture: Plasma Process. Polym. 3∕2016 Plasma Processes and Polymers. 13: 301-301. DOI: 10.1002/Ppap.201670009  0.378
2016 Xiong Z, Roe J, Grammer TC, Graves DB. Plasma Treatment of Onychomycosis Plasma Processes and Polymers. DOI: 10.1002/Ppap.201600010  0.398
2016 Bartis EAJ, Luan P, Knoll AJ, Graves DB, Seog J, Oehrlein GS. Biodeactivation of lipopolysaccharide correlates with surface-bound NO3 after cold atmospheric plasma treatment Plasma Processes and Polymers. 13: 410-418. DOI: 10.1002/Ppap.201500072  0.43
2015 Graves D, Hamaguchi S, O'Connell D. In Focus: Plasma Medicine. Biointerphases. 10: 029301. PMID 26112457 DOI: 10.1116/1.4922357  0.421
2015 Lindsay A, Anderson C, Slikboer E, Shannon S, Graves D. Momentum, heat, and neutral mass transport in convective atmospheric pressure plasma-liquid systems and implications for aqueous targets Journal of Physics D: Applied Physics. 48. DOI: 10.1088/0022-3727/48/42/424007  0.616
2015 Davydova A, Despiau-Pujo E, Cunge G, Graves DB. Etching mechanisms of graphene nanoribbons in downstream H2 plasmas: Insights from molecular dynamics simulations Journal of Physics D: Applied Physics. 48: 195202. DOI: 10.1088/0022-3727/48/19/195202  0.332
2015 Gaur N, Szili EJ, Oh JS, Hong SH, Michelmore A, Graves DB, Hatta A, Short RD. Combined effect of protein and oxygen on reactive oxygen and nitrogen species in the plasma treatment of tissue Applied Physics Letters. 107. DOI: 10.1063/1.4930874  0.335
2014 Schwabe M, Zhdanov S, Räth C, Graves DB, Thomas HM, Morfill GE. Collective effects in vortex movements in complex plasmas. Physical Review Letters. 112: 115002. PMID 24702381 DOI: 10.1103/Physrevlett.112.115002  0.388
2014 Pavlovich MJ, Clark DS, Graves DB. Quantification of air plasma chemistry for surface disinfection Plasma Sources Science and Technology. 23. DOI: 10.1088/0963-0252/23/6/065036  0.819
2014 Kawamura E, Lieberman MA, Graves DB. Fast 2D fluid-analytical simulation of ion energy distributions and electromagnetic effects in multi-frequency capacitive discharges Plasma Sources Science and Technology. 23. DOI: 10.1088/0963-0252/23/6/064003  0.403
2014 Pavlovich MJ, Ono T, Galleher C, Curtis B, Clark DS, Machala Z, Graves DB. Air spark-like plasma source for antimicrobial NOx generation Journal of Physics D: Applied Physics. 47. DOI: 10.1088/0022-3727/47/50/505202  0.813
2014 Bartis EAJ, Barrett C, Chung TY, Ning N, Chu JW, Graves DB, Seog J, Oehrlein GS. Deactivation of lipopolysaccharide by Ar and H2 inductively coupled low-pressure plasma Journal of Physics D: Applied Physics. 47. DOI: 10.1088/0022-3727/47/4/045202  0.426
2014 Chang HW, Hsu CC, Ahmed M, Liu SY, Fang Y, Seog J, Oehrlein GS, Graves DB. Plasma flux-dependent lipid A deactivation Journal of Physics D: Applied Physics. 47. DOI: 10.1088/0022-3727/47/22/224015  0.385
2014 Graves DB. Oxy-nitroso shielding burst model of cold atmospheric plasma therapeutics Clinical Plasma Medicine. 2: 38-49. DOI: 10.1016/J.Cpme.2014.11.001  0.419
2014 Graves DB. Reactive species from cold atmospheric plasma: Implications for cancer therapy Plasma Processes and Polymers. 11: 1120-1127. DOI: 10.1002/Ppap.201400068  0.355
2013 Schwabe M, Graves DB. Simulating the dynamics of complex plasmas. Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics. 88: 023101. PMID 24032946 DOI: 10.1103/Physreve.88.023101  0.442
2013 Lee J, Kazi H, Gaddam S, Kelber JA, Graves DB. Effects of He and Ar ion kinetic energies in protection of organosilicate glass from O2 plasma damage Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 31. DOI: 10.1116/1.4809579  0.582
2013 Lee J, Graves DB. Roles of plasma-generated vacuum-ultraviolet photons and oxygen radicals in damaging nanoporous low-k films Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 31. DOI: 10.1116/1.4807299  0.542
2013 Sakiyama Y, Graves DB. Efficient modeling of atmospheric pressure surface micro-discharge plasma chemistry Plasma Sources Science and Technology. 22. DOI: 10.1088/0963-0252/22/1/012003  0.406
2013 Bartis EAJ, Graves DB, Seog J, Oehrlein GS. Atmospheric pressure plasma treatment of lipopolysaccharide in a controlled environment Journal of Physics D: Applied Physics. 46. DOI: 10.1088/0022-3727/46/31/312002  0.442
2013 Pavlovich MJ, Chang HW, Sakiyama Y, Clark DS, Graves DB. Ozone correlates with antibacterial effects from indirect air dielectric barrier discharge treatment of water Journal of Physics D: Applied Physics. 46. DOI: 10.1088/0022-3727/46/14/145202  0.802
2013 Pavlovich MJ, Sakiyama Y, Clark DS, Graves DB. Antimicrobial synergy between ambient-gas plasma and UVA treatment of aqueous solution Plasma Processes and Polymers. 10: 1051-1060. DOI: 10.1002/Ppap.201300065  0.793
2013 Chung TY, Ning N, Chu JW, Graves DB, Bartis E, Joonil Seog, Oehrlein GS. Plasma deactivation of endotoxic biomolecules: Vacuum ultraviolet photon and radical beam effects on lipid A Plasma Processes and Polymers. 10: 167-180. DOI: 10.1002/Ppap.201200087  0.614
2013 Pavlovich MJ, Chen Z, Sakiyama Y, Clark DS, Graves DB. Effect of discharge parameters and surface characteristics on ambient-gas plasma disinfection Plasma Processes and Polymers. 10: 69-76. DOI: 10.1002/Ppap.201200073  0.804
2013 Pavlovich MJ, Galleher C, Ono T, Machala Z, Clark DS, Graves DB. Ambient-air plasmas for frugal and sustainable water disinfection in the developing world Sustainable Engineering Forum 2013 - Core Programming Area At the 2013 Aiche Annual Meeting: Global Challenges For Engineering a Sustainable Future. 233.  0.773
2013 Pavlovich MJ, Galleher C, Ono T, Machala Z, Clark DS, Graves DB. Ambient-air plasmas for frugal and sustainable water disinfection in the developing world Sustainable Engineering Forum 2013 - Core Programming Area At the 2013 Aiche Annual Meeting: Global Challenges For Engineering a Sustainable Future. 233.  0.773
2012 Weilnboeck F, Kumar N, Oehrlein GS, Chung T, Graves D, Li M, Hudson EA, Benck EC. Real-time measurements of plasma photoresist modifications: The role of plasma vacuum ultraviolet radiation and ions Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 30: 031807. DOI: 10.1116/1.3697752  0.439
2012 Shimizu T, Sakiyama Y, Graves DB, Zimmermann JL, Morfill GE. The dynamics of ozone generation and mode transition in air surface micro-discharge plasma at atmospheric pressure New Journal of Physics. 14. DOI: 10.1088/1367-2630/14/10/103028  0.37
2012 Kawamura E, Lieberman MA, Lichtenberg AJ, Graves DB. Two-dimensional simulation of inductive-capacitive transition instability in an electronegative plasma Plasma Sources Science and Technology. 21. DOI: 10.1088/0963-0252/21/4/045014  0.435
2012 Orazov M, Sakiyama Y, Graves DB. Wound healing modeling: Investigating ambient gas plasma treatment efficacy Journal of Physics D: Applied Physics. 45. DOI: 10.1088/0022-3727/45/44/445201  0.379
2012 Sakiyama Y, Graves DB, Chang HW, Shimizu T, Morfill GE. Plasma chemistry model of surface microdischarge in humid air and dynamics of reactive neutral species Journal of Physics D: Applied Physics. 45. DOI: 10.1088/0022-3727/45/42/425201  0.362
2012 Graves DB. The emerging role of reactive oxygen and nitrogen species in redox biology and some implications for plasma applications to medicine and biology Journal of Physics D: Applied Physics. 45. DOI: 10.1088/0022-3727/45/26/263001  0.311
2012 Babaeva NY, Ning N, Graves DB, Kushner MJ. Ion activation energy delivered to wounds by atmospheric pressure dielectric-barrier discharges: Sputtering of lipid-like surfaces Journal of Physics D: Applied Physics. 45. DOI: 10.1088/0022-3727/45/11/115203  0.391
2012 Brault P, Caillard A, Charles C, Boswell RW, Graves DB. Platinum nanocluster growth on vertically aligned carbon nanofiber arrays: Sputtering experiments and molecular dynamics simulations Applied Surface Science. 263: 352-356. DOI: 10.1016/J.Apsusc.2012.09.059  0.313
2011 Oehrlein GS, Phaneuf RJ, Graves DB. Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 29: 0108011-01080135. DOI: 10.1116/1.3532949  0.454
2011 Kawamura E, Graves DB, Lieberman MA. Fast 2D hybrid fluid-analytical simulation of inductive/capacitive discharges Plasma Sources Science and Technology. 20. DOI: 10.1088/0963-0252/20/3/035009  0.424
2011 Titus MJ, Graves DB, Yamaguchi Y, Hudson EA. Effects of vacuum ultraviolet photons, ion energy and substrate temperature on line width roughness and RMS surface roughness of patterned 193nm photoresist Journal of Physics D: Applied Physics. 44. DOI: 10.1088/0022-3727/44/8/085204  0.758
2011 Traylor MJ, Pavlovich MJ, Karim S, Hait P, Sakiyama Y, Clark DS, Graves DB. Long-term antibacterial efficacy of air plasma-activated water Journal of Physics D: Applied Physics. 44. DOI: 10.1088/0022-3727/44/47/472001  0.781
2011 Lee J, Graves DB. The effect of VUV radiation from Ar/O2 plasmas on low-k SiOCH films Journal of Physics D: Applied Physics. 44. DOI: 10.1088/0022-3727/44/32/325203  0.436
2011 Fox-Lyon N, Oehrlein GS, Ning N, Graves DB. Hydrogenation and surface density changes in hydrocarbon films during erosion using Ar/H2 plasmas Journal of Applied Physics. 110. DOI: 10.1063/1.3662953  0.418
2011 Chung TY, Graves DB, Weilnboeck F, Bruce RL, Oehrlein GS, Li M, Hudson EA. Ion and vacuum ultraviolet photon beam effects in 193nm photoresist surface roughening: The role of the adamantyl pendant group Plasma Processes and Polymers. 8: 1068-1079. DOI: 10.1002/Ppap.201100071  0.626
2010 Weilnboeck F, Bruce RL, Engelmann S, Oehrlein GS, Nest D, Chung TY, Graves D, Li M, Wang D, Andes C, Hudson EA. Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 993-1004. DOI: 10.1116/1.3484249  0.802
2010 Titus MJ, Hsu CC, Graves DB. "sensArray" voltage sensor analysis in an inductively coupled plasma Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 28: 139-146. DOI: 10.1116/1.3268615  0.707
2010 Végh JJ, Graves DB. Molecular dynamics simulations of sub-10 nm wavelength surface rippling by CF3 + ion beams Plasma Sources Science and Technology. 19. DOI: 10.1088/0963-0252/19/4/045005  0.383
2010 Nest D, Chung TY, Végh JJ, Graves DB, Bruce RL, Lin T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG. Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: A beam system study of P4MS and PαMS Journal of Physics D: Applied Physics. 43. DOI: 10.1088/0022-3727/43/8/085204  0.815
2010 Lee J, Graves DB. Synergistic damage effects of vacuum ultraviolet photons and O2 in SiCOH ultra-low-k dielectric films Journal of Physics D: Applied Physics. 43. DOI: 10.1088/0022-3727/43/42/425201  0.354
2010 Chung TY, Nest D, Graves DB, Weilnboeck F, Bruce RL, Oehrlein GS, Wang D, Li M, Hudson EA. Electron, ion and vacuum ultraviolet photon effects in 193 nm photoresist surface roughening Journal of Physics D: Applied Physics. 43. DOI: 10.1088/0022-3727/43/27/272001  0.793
2010 Sakiyama Y, Knake N, Schröder D, Winter J, Schulz-Von Der Gathen V, Graves DB. Gas flow dependence of ground state atomic oxygen in plasma needle discharge at atmospheric pressure Applied Physics Letters. 97. DOI: 10.1063/1.3496041  0.362
2010 Behera S, Lee J, Gaddam S, Pokharel S, Wilks J, Pasquale F, Graves D, Kelber JA. Interaction of vacuum ultraviolet light with a low-k organosilicate glass film in the presence of NH3 Applied Physics Letters. 97. DOI: 10.1063/1.3466905  0.496
2010 Bruce RL, Weilnboeck F, Lin T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG, Vegh JJ, Nest D, Graves DB. Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films Journal of Applied Physics. 107. DOI: 10.1063/1.3373587  0.834
2010 Sakiyama Y, Graves DB, Jarrige J, Laroussi M. Finite element analysis of ring-shaped emission profile in plasma bullet Applied Physics Letters. 96. DOI: 10.1063/1.3298639  0.426
2009 Grimbergen M, Nest DG, Yu K, Becky Leung TY, Chandrachood M, Ouye A, Singh S, Ibrahim I, Kumar A, Graves D. Plasma characterization of tetra™ III chrome etch system Proceedings of Spie - the International Society For Optical Engineering. 7488. DOI: 10.1117/12.833490  0.8
2009 Engelmann S, Bruce RL, Weilnboeck F, Sumiya M, Kwon T, Phaneuf R, Oehrlein GS, Andes C, Graves D, Nest D, Hudson EA. Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C4 F 8 - And CF4 -based discharges Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 27: 1165-1179. DOI: 10.1116/1.3137012  0.807
2009 Bruce RL, Engelmann S, Lin T, Kwon T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG, V́gh JJ, Nest D, Graves DB, Alizadeh A. Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 27: 1142-1155. DOI: 10.1116/1.3136864  0.808
2009 Engelmann S, Bruce RL, Sumiya M, Kwon T, Phaneuf R, Oehrlein GS, Andes C, Graves D, Nest D, Hudson EA. Plasma-surface interactions of advanced photoresists with C4 F8 Ar discharges: Plasma parameter dependencies Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 92-106. DOI: 10.1116/1.3054342  0.817
2009 Sakiyama Y, Graves DB. Neutral gas flow and ring-shaped emission profile in non-thermal RF-excited plasma needle discharge at atmospheric pressure Plasma Sources Science and Technology. 18. DOI: 10.1088/0963-0252/18/2/025022  0.441
2009 Titus MJ, Nest DG, Chung TY, Graves DB. Comparing 193 nm photoresist roughening in an inductively coupled plasma system and vacuum beam system Journal of Physics D: Applied Physics. 42. DOI: 10.1088/0022-3727/42/24/245205  0.814
2009 Choudhary GK, Végh JJ, Graves DB. Molecular dynamics simulations of oxygen-containing polymer sputtering and the Ohnishi parameter Journal of Physics D: Applied Physics. 42. DOI: 10.1088/0022-3727/42/24/242001  0.722
2009 Végh JJ, Graves DB. A molecular dynamics study of H radical bombardment of CH3 : SSi(1 0 0) - Comparison of simulation and experiment Journal of Physics D: Applied Physics. 42. DOI: 10.1088/0022-3727/42/22/222001  0.358
2009 Graves DB, Brault P. Molecular dynamics for low temperature plasma-surface interaction studies Journal of Physics D: Applied Physics. 42. DOI: 10.1088/0022-3727/42/19/194011  0.465
2009 Titus MJ, Nest DG, Graves DB. Modelling vacuum ultraviolet photon penetration depth and C=O bond depletion in 193 nm photoresist Journal of Physics D: Applied Physics. 42. DOI: 10.1088/0022-3727/42/15/152001  0.776
2009 Goldman MA, Graves DB, Antonelli GA, Behera SP, Kelber JA. Oxygen radical and plasma damage of low- k organosilicate glass materials: Diffusion-controlled mechanism for carbon depletion Journal of Applied Physics. 106. DOI: 10.1063/1.3168428  0.306
2009 Titus MJ, Nest D, Graves DB. Absolute vacuum ultraviolet flux in inductively coupled plasmas and chemical modifications of 193 nm photoresist Applied Physics Letters. 94. DOI: 10.1063/1.3125260  0.824
2009 Végh JJ, Graves DB. Plasma Process. Polym. 5/2009 Plasma Processes and Polymers. 6. DOI: 10.1002/Ppap.200990008  0.737
2009 Lee JK, Kong MG, Graves DB. Modeling and simulation of low-temperature plasmas Plasma Processes and Polymers. 6: 278. DOI: 10.1002/Ppap.200907000  0.404
2009 Nest D, Chung TY, Graves DB, Engelmann S, Bruce RL, Weilnboeck F, Oehrlein GS, Wang D, Andes C, Hudson EA. Understanding the roughening and degradation of 193 nm photoresist during plasma processing: synergistic roles of vacuum ultraviolet radiation and ion bombardment Plasma Processes and Polymers. 6: 649-657. DOI: 10.1002/Ppap.200900039  0.831
2009 Engelmann S, Bruce RL, Weilnboeck F, Oehrlein GS, Nest D, Graves DB, Andes C, Hudson EA. Dependence of polymer surface roughening rate on deposited energy density during plasma processing Plasma Processes and Polymers. 6: 484-489. DOI: 10.1002/Ppap.200900004  0.799
2009 Végh JJ, Graves DB. Molecular dynamics simulations of Ar+-organic polymer interactions Plasma Processes and Polymers. 6: 320-334. DOI: 10.1002/Ppap.200800223  0.717
2008 Titus MJ, Graves DB. Wafer heating mechanisms in a molecular gas, inductively coupled plasma: In situ, real time wafer surface measurements and three-dimensional thermal modeling Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 1154-1160. DOI: 10.1116/1.2953713  0.741
2008 Despiau-Pujo E, Chabert P, Graves DB. Molecular dynamics simulations of GaAs sputtering under low-energy argon ion bombardment Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 274-280. DOI: 10.1116/1.2836408  0.424
2008 Végh JJ, Humbird D, Graves DB. Silicon etch in the presence of a fluorocarbon overlayer: The role of fluorocarbon cluster ejection Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 26: 52-61. DOI: 10.1116/1.2812444  0.792
2008 Stoffels E, Sakiyama Y, Graves DB. Cold atmospheric plasma: Charged species and their interactions with cells and tissues Ieee Transactions On Plasma Science. 36: 1441-1457. DOI: 10.1109/Tps.2008.2001084  0.416
2008 Lee I, Graves DB, Lieberman MA. Modeling electromagnetic effects in capacitive discharges Plasma Sources Science and Technology. 17. DOI: 10.1088/0963-0252/17/1/015018  0.382
2008 Sakiyama Y, Graves DB, Stoffels E. Influence of electrical properties of treated surface on RF-excited plasma needle at atmospheric pressure Journal of Physics D: Applied Physics. 41. DOI: 10.1088/0022-3727/41/9/095204  0.432
2008 Corr CS, Despiau-Pujo E, Chabert P, Graham WG, Marro FG, Graves DB. Comparison between fluid simulations and experiments in inductively coupled argon/chlorine plasmas Journal of Physics D: Applied Physics. 41. DOI: 10.1088/0022-3727/41/18/185202  0.42
2008 V́gh JJ, Nest D, Graves DB, Bruce R, Engelmann S, Kwon T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG. Molecular dynamics simulations of near-surface modification of polystyrene: Bombardment with Ar+ and Ar+ /radical chemistries Journal of Applied Physics. 104. DOI: 10.1063/1.2963708  0.781
2008 Nest D, Graves DB, Engelmann S, Bruce RL, Weilnboeck F, Oehrlein GS, Andes C, Hudson EA. Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193 nm photoresist roughening and degradation Applied Physics Letters. 92. DOI: 10.1063/1.2912028  0.794
2008 Graves DB, Vegh JJ. Atomistic simulations of feature scale etch profile evolution Aiche Annual Meeting, Conference Proceedings.  0.674
2008 Végh JJ, Graves DB. Molecular dynamics simulations of plasma-surface interactions: Nanoscale feature etching on a silicon substrate Aiche Annual Meeting, Conference Proceedings.  0.312
2007 Kabouzi Y, Graves DB, Castaños-Martínez E, Moisan M. Modeling of atmospheric-pressure plasma columns sustained by surface waves. Physical Review. E, Statistical, Nonlinear, and Soft Matter Physics. 75: 016402. PMID 17358263 DOI: 10.1103/Physreve.75.016402  0.314
2007 Engelmann S, Bruce RL, Kwon T, Phaneuf R, Oehrlein GS, Bae YC, Andes C, Graves D, Nest D, Hudson EA, Lazzeri P, Iacob E, Anderle M. Plasma-surface interactions of model polymers for advanced photoresists using C4 F8 Ar discharges and energetic ion beams Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 1353-1364. DOI: 10.1116/1.2759935  0.814
2007 Pargon E, Nest D, Graves DB. Ar+ bombardment of 193 nm photoresist: Morphological effects Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 1236-1243. DOI: 10.1116/1.2747630  0.771
2007 Winters HF, Graves DB, Humbird D, Tougaard S. Penetration of fluorine into the silicon lattice during exposure to F atoms, F2, and Xe F2: Implications for spontaneous etching reactions Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 25: 96-103. DOI: 10.1116/1.2400680  0.328
2007 Sakiyama Y, Graves DB. Nonthermal atmospheric RF plasma in 1-D spherical coordinates: A parametric study Ieee Transactions On Plasma Science. 35: 1279-1286. DOI: 10.1109/Tps.2007.906129  0.362
2007 V́gh JJ, Nest D, Graves DB, Bruce R, Engelmann S, Kwon T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG. Near-surface modification of polystyrene by Ar+: Molecular dynamics simulations and experimental validation Applied Physics Letters. 91. DOI: 10.1063/1.2821226  0.793
2007 Sakiyama Y, Graves DB. Nonthermal atmospheric rf plasma in one-dimensional spherical coordinates: Asymmetric sheath structure and the discharge mechanism Journal of Applied Physics. 101. DOI: 10.1063/1.2715745  0.328
2006 Hsu CC, Coburn JW, Graves DB. Etching of ruthenium coatings in O 2- and Cl 2- containing plasmas Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 24: 1-8. DOI: 10.1116/1.2121751  0.327
2006 Sakiyama Y, Graves DB. Finite element analysis of an atmospheric pressure RF-excited plasma needle Journal of Physics D: Applied Physics. 39: 3451-3456. DOI: 10.1088/0022-3727/39/16/S01  0.418
2006 Sakiyama Y, Graves DB. Corona-glow transition in the atmospheric pressure RF-excited plasma needle Journal of Physics D: Applied Physics. 39: 3644-3652. DOI: 10.1088/0022-3727/39/16/018  0.408
2006 Hsu CC, Nierode MA, Coburn JW, Graves DB. Comparison of model and experiment for Ar, Ar/O2 and Ar/O 2/Cl2 inductively coupled plasmas Journal of Physics D: Applied Physics. 39: 3272-3284. DOI: 10.1088/0022-3727/39/15/009  0.801
2005 Végh JJ, Humbird D, Graves DB. Silicon etch by fluorocarbon and argon plasmas in the presence of fluorocarbon films Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 23: 1598-1604. DOI: 10.1116/1.2049304  0.79
2005 Humbird D, Graves DB. Atomistic simulations of Ar +M -ion-assisted etching of silicon by fluorine and chlorine Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 23: 31-38. DOI: 10.1116/1.1814106  0.795
2005 Humbird D, Graves DB. Molecular dynamics simulations of plasma-surface interactions: Importance of visualization tools Ieee Transactions On Plasma Science. 33: 226-227. DOI: 10.1109/Tps.2005.844953  0.392
2005 Booth JP, Abada H, Chabert P, Graves DB. CF and CF2 radical kinetics and transport in a pulsed CF 4 ICP Plasma Sources Science and Technology. 14: 273-282. DOI: 10.1088/0963-0252/14/2/008  0.315
2005 Hsu DD, Graves DB. Microhollow cathode discharge reactor chemistry Plasma Chemistry and Plasma Processing. 25: 1-17. DOI: 10.1007/S11090-004-8831-8  0.608
2004 Humbird D, Graves DB. Improved interatomic potentials for silicon-fluorine and silicon-chlorine. The Journal of Chemical Physics. 120: 2405-12. PMID 15268380 DOI: 10.1063/1.1636722  0.769
2004 Kimura Y, Coburn JW, Graves DB. Vacuum beam studies of fluorocarbon radicals and argon ions on Si and SiO 2 surfaces Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 22: 2508-2516. DOI: 10.1116/1.1810166  0.608
2004 Vartanian V, Goolsby B, Chatterjee R, Kachmarik R, Babbitt D, Reif R, Tonnis EJ, Graves D. Reduction of semiconductor process emissions by reactive gas optimization Ieee Transactions On Semiconductor Manufacturing. 17: 483-490. DOI: 10.1109/TSM.2004.837004  0.8
2004 Humbird D, Graves DB. Molecular dynamics simulations of Si-F surface chemistry with improved interatomic potentials Plasma Sources Science and Technology. 13: 548-552. DOI: 10.1088/0963-0252/13/3/022  0.765
2004 Humbird D, Graves DB. Mechanism of silicon etching in the presence of CF 2, F, and Ar + Journal of Applied Physics. 96: 2466-2471. DOI: 10.1063/1.1769602  0.78
2004 Humbird D, Graves DB. Atomistic simulations of spontàneous etching of silicon by fluorine and chlorine Journal of Applied Physics. 96: 791-798. DOI: 10.1063/1.1753657  0.779
2004 Humbird D, Graves DB. Fluorocarbon plasma etching of silicon: Factors controlling etch rate Journal of Applied Physics. 96: 65-70. DOI: 10.1063/1.1736321  0.799
2004 Humbird D, Graves DB, Hua X, Oehrlein GS. Molecular dynamics simulations of Ar +-induced transport of fluorine through fluorocarbon films Applied Physics Letters. 84: 1073-1075. DOI: 10.1063/1.1644338  0.772
2003 Graves DB, Kushner MJ. Influence of modeling and simulation on the maturation of plasma technology: Feature evolution and reactor design Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 21: S152-S156. DOI: 10.1116/1.1600447  0.376
2003 Greer F, Fraser D, Cobum JW, Graves DB. Fundamental beam studies of deuterium and fluorine radical reaction kinetics on surfaces Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 1391-1402. DOI: 10.1116/1.1585065  0.312
2003 Radtke MT, Coburn JW, Graves DB. C4F8 dissociation in an inductively coupled plasma Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 21: 1038-1047. DOI: 10.1116/1.1582456  0.312
2003 Kiehlbauch MW, Graves DB. Inductively coupled plasmas in oxygen: Modeling and experiment Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 21: 660-670. DOI: 10.1116/1.1564024  0.808
2003 Satake K, Graves DB. Molecular dynamics simulation of ion bombardment on hydrogen terminated Si(001)2 × 1 surface Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 21: 484-490. DOI: 10.1116/1.1554939  0.353
2003 Kiehlbauch MW, Graves DB. Effect of neutral transport on the etch product lifecycle during plasma etching of silicon in chlorine gas Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 21: 116-126. DOI: 10.1116/1.1527952  0.784
2003 Greer F, Fraser D, Coburn JW, Graves DB. Fundamental beam studies of radical enhanced atomic layer deposition of TiN Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 21: 96-105. DOI: 10.1116/1.1524145  0.314
2003 Hsu DD, Graves DB. Microhollow cathode discharge stability with flow and reaction Journal of Physics D: Applied Physics. 36: 2898-2907. DOI: 10.1088/0022-3727/36/23/006  0.663
2003 Greer F, Fraser D, Coburn JW, Graves DB. Fluorine atom subsurface diffusion and reaction in photoresist Journal of Applied Physics. 94: 7453-7461. DOI: 10.1063/1.1625782  0.317
2003 Satake K, Graves DB. Silicon epitaxial growth on the Si(001)2×1 surface from silane using dynamic Monte Carlo simulations Journal of Chemical Physics. 118: 6503-6511. DOI: 10.1063/1.1559151  0.337
2002 Humbird D, Graves DB. Ion-induced damage and annealing of silicon. Molecular dynamics simulations Pure and Applied Chemistry. 74: 419-422. DOI: 10.1351/Pac200274030419  0.783
2002 Tonnis EJ, Graves DB. Neutral gas temperatures measured within a high-density, inductively coupled plasma abatement device Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 20: 1787-1795. DOI: 10.1116/1.1503901  0.809
2002 Greer F, Van L, Fraser D, Coburn JW, Graves DB. Argon and oxygen ion chemistry effects in photoresist etching Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 1901-1906. DOI: 10.1116/1.1501578  0.354
2002 Greer F, Coburn JW, Graves DB. Deuterium and fluorine radical reaction kinetics on photoresist Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 145-153. DOI: 10.1116/1.1430242  0.312
2002 Humbird D, Graves DB. Controlling surfaces in plasma processing: Role of ions via molecular dynamics simulations of surface chemistry Plasma Sources Science and Technology. 11: A191-A195. DOI: 10.1088/0963-0252/11/3A/328  0.8
2002 Kiehlbauch MW, Graves DB. Modeling argon inductively coupled plasmas: The electron energy distribution function and metastable kinetics Journal of Applied Physics. 91: 3539-3546. DOI: 10.1063/1.1452772  0.795
2002 Graves DB, Humbird D. Surface chemistry associated with plasma etching processes Applied Surface Science. 192: 72-87. DOI: 10.1016/S0169-4332(02)00021-1  0.808
2001 Singh H, Coburn JW, Graves DB. Measurements of neutral and ion composition, neutral temperature, and electron energy distribution function in a CF4 inductively coupled plasma Journal of Vacuum Science and Technology, Part a: Vacuum, Surfaces and Films. 19: 718-729. DOI: 10.1116/1.1354603  0.606
2001 Kiehlbauch MW, Graves DB. Temperature resolved modeling of plasma abatement of perfluorinated compounds Journal of Applied Physics. 89: 2047-2057. DOI: 10.1063/1.1337088  0.82
2001 Graves DB, Abrams CF. Molecular dynamics simulations of ion-surface interactions with applications to plasma processing Advances in Chemical Engineering. 28: 149-201. DOI: 10.1016/S0065-2377(01)28006-5  0.645
2000 Vyvoda MA, Li M, Graves DB, Lee H, Malyshev MV, Klemens FP, Lee JTC, Donnelly VM. Role of sidewall scattering in feature profile evolution during Cl2 and HBr plasma etching of silicon Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 820-833. DOI: 10.1116/1.591282  0.362
2000 Tanaka J, Abrams CF, Graves DB. New C-F interatomic potential for molecular dynamics simulation of fluorocarbon film formation Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 18: 938-945. DOI: 10.1116/1.582279  0.582
2000 Abrams CF, Graves DB. On the active surface layer in CF3 + etching of Si: atomistic simulation and a simple mass balance model Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 18: 411-416. DOI: 10.1116/1.582202  0.598
2000 Tonnis EJ, Graves DB, Vartanian VH, Beu L, Lii T, Jewett R. Inductively coupled, point-of-use plasma abatement of perfluorinated compounds and hydrofluorinated compounds from etch processes utilizing O2 and H2O as additive gases Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 18: 393-400. DOI: 10.1116/1.582199  0.81
2000 Singh H, Coburn JW, Graves DB. Appearance potential mass spectrometry: discrimination of dissociative ionization products Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 18: 299-305. DOI: 10.1116/1.582183  0.484
2000 Singh H, Coburn JW, Graves DB. Surface loss coefficients of CFx and F radicals on stainless steel Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 18: 2680-2684. DOI: 10.1116/1.1308585  0.551
2000 Greer F, Coburn JW, Graves DB. Vacuum beam studies of photoresist etching kinetics Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 18: 2288-2294. DOI: 10.1116/1.1287721  0.458
2000 Singh H, Graves DB. Measurements of the electron energy distribution function in molecular gases in a shielded inductively coupled plasma Journal of Applied Physics. 88: 3889-3898. DOI: 10.1063/1.373036  0.568
2000 Singh H, Coburn JW, Graves DB. Recombination coefficients of O and N radicals on stainless steel Journal of Applied Physics. 88: 3748-3755. DOI: 10.1063/1.1289046  0.521
2000 Abrams CF, Graves DB. Molecular dynamics simulations of Si etching with energetic F+: Sensitivity of results to the interatomic potential Journal of Applied Physics. 88: 3734-3738. DOI: 10.1063/1.1288701  0.593
2000 Abrams CF, Graves DB. Atomistic simulation of silicon bombardment by energetic CF3 +: Product distributions and energies Thin Solid Films. 374: 150-156. DOI: 10.1016/S0040-6090(00)01145-7  0.582
1999 Singh H, Coburn JW, Graves DB. Mass spectrometric detection of reactive neutral species: Beam-to-background ratio Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 17: 2447-2455. DOI: 10.1116/1.581981  0.484
1999 Helmer BA, Graves DB. Molecular dynamics simulations of Cl2 + impacts onto a chlorinated silicon surface: Energies and angles of the reflected Cl2 and Cl fragments Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 17: 2759-2770. DOI: 10.1116/1.581942  0.722
1999 Kota GP, Coburn JW, Graves DB. Heterogeneous recombination of atomic bromine and fluorine Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 17: 282-290. DOI: 10.1116/1.581582  0.751
1999 Abrams CF, Graves DB. Three-dimensional spatiokinetic distributions of sputtered and scattered products of Ar+ and Cu+ impacts onto the Cu surface: Molecular dynamics simulations Ieee Transactions On Plasma Science. 27: 1426-1432. DOI: 10.1109/27.799821  0.481
1999 Reeves CT, Ferguson BA, Mullins CB, Sitz GO, Helmer BA, Graves DB. Trapping dynamics of ethane on Si(100)-(2×1): Molecular beam experiments and molecular dynamics simulations Journal of Chemical Physics. 111: 7567-7575. DOI: 10.1063/1.480083  0.71
1999 Abrams CF, Graves DB. Molecular dynamics simulations of Si etching by energetic CF+ 3 Journal of Applied Physics. 86: 5938-5948. DOI: 10.1063/1.371637  0.614
1999 Abrams CF, Graves DB. Cu sputtering and deposition by off-normal, near-threshold Cu+ bombardment: Molecular dynamics simulations Journal of Applied Physics. 86: 2263-2267. DOI: 10.1063/1.371040  0.561
1999 Fiala A, Kiehlbauch M, Mahnovski S, Graves DB. Model of point-of-use plasma abatement of perfluorinated compounds with an inductively coupled plasma Journal of Applied Physics. 86: 152-162. DOI: 10.1063/1.370711  0.801
1999 Kota GP, Coburn JW, Graves DB. Heteronuclear and homonuclear surface abstraction reactions of Cl, Br, and F Journal of Applied Physics. 85: 74-86. DOI: 10.1063/1.369423  0.761
1998 Abrams CF, Graves DB. Energetic ion bombardment of SiO2 surfaces: Molecular dynamics simulations Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 16: 3006-3019. DOI: 10.1116/1.581452  0.612
1998 Kota GP, Coburn JW, Graves DB. Role of oxygen in ion-enhanced etching of poly-Si and WSix with chlorine Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 16: 2215-2221. DOI: 10.1116/1.581330  0.761
1998 Helmer BA, Graves DB. Molecular dynamics simulations of Ar+ and Cl+ impacts onto silicon surfaces: Distributions of reflected energies and angles Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 16: 3502-3514. DOI: 10.1116/1.580993  0.746
1998 Kota GP, Coburn JW, Graves DB. The recombination of chlorine atoms at surfaces Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 16: 270-277. DOI: 10.1116/1.580982  0.751
1998 Vyvoda MA, Lee H, Malyshev MV, Klemens FP, Cerullo M, Donnelly VM, Graves DB, Kornblit A, Lee JTC. Effects of plasma conditions on the shapes of features etched in Cl 2 and HBr plasmas. I. Bulk crystalline silicon etching Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 16: 3247-3258.  0.347
1997 Helmer BA, Graves DB. Molecular dynamics simulations of fluorosilyl species impacting fluorinated silicon surfaces with energies from 0.1 to 100 eV Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 15: 2252-2261. DOI: 10.1116/1.580542  0.743
1997 Wu HM, Graves DB, Kilgore M. Two-dimensional simulation of compact ECR plasma sources Plasma Sources Science and Technology. 6: 231-239. DOI: 10.1088/0963-0252/6/2/017  0.679
1997 Li M, Chen Y, Graves DB. Drag on an ellipsoid particle in free-molecular plasma flow Plasma Chemistry and Plasma Processing. 17: 21-37. DOI: 10.1007/Bf02766820  0.353
1996 Schmidt UI, Graves DB. In situ characterization of the transient behavior of particles in low pressure plasmas Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 14: 595-602. DOI: 10.1116/1.580151  0.313
1996 Barone ME, Robinson TO, Graves DB. Molecular dynamics simulations of direct reactive ion etching: surface roughening of silicon by chlorine Ieee Transactions On Plasma Science. 24: 77-78. DOI: 10.1109/27.491699  0.439
1996 Barone ME, Graves DB. Molecular dynamics simulations of plasma-surface chemistry Plasma Sources Science and Technology. 5: 187-192. DOI: 10.1088/0963-0252/5/2/011  0.425
1996 Bukowski JD, Graves DB, Vitello P. Two-dimensional fluid model of an inductively coupled plasma with comparison to experimental spatial profiles Journal of Applied Physics. 80: 2614-2623. DOI: 10.1063/1.363169  0.609
1996 Lee C, Graves DB, Lieberman MA. Role of etch products in polysilicon etching in a high-density chlorine discharge Plasma Chemistry and Plasma Processing. 16: 99-120. DOI: 10.1007/Bf01465219  0.47
1995 Helmer BA, Graves DB, Barone ME. Parameters for feature evolution models in plasma etching from molecular dynamics simulation Materials Research Society Symposium - Proceedings. 389: 23-28. DOI: 10.1557/Proc-389-23  0.726
1995 Nitschke TE, Graves DB. Matching an RF Sheath Model to a Bulk Plasma Model Ieee Transactions On Plasma Science. 23: 717-727. DOI: 10.1109/27.467994  0.473
1995 Stewart RA, Vitello P, Graves DB, Jaeger EF, Berry LA. Plasma uniformity in high-density inductively coupled plasma tools Plasma Sources Science and Technology. 4: 36-46. DOI: 10.1088/0963-0252/4/1/005  0.435
1995 Wu HM, Graves DB, Porteous RK. Comparison between a two-dimensional simulation and a global conservation model for a compact ECR plasma source Plasma Sources Science and Technology. 4: 22-30. DOI: 10.1088/0963-0252/4/1/003  0.446
1995 Barone ME, Graves DB. Molecular-dynamics simulations of direct reactive ion etching of silicon by fluorine and chlorine Journal of Applied Physics. 78: 6604-6615. DOI: 10.1063/1.360482  0.414
1995 Daugherty JE, Graves DB. Derivation and experimental verification of a particulate transport model for a glow discharge Journal of Applied Physics. 78: 2279-2287. DOI: 10.1063/1.360145  0.553
1995 Barone ME, Graves DB. Chemical and physical sputtering of fluorinated silicon Journal of Applied Physics. 77: 1263-1274. DOI: 10.1063/1.358928  0.386
1994 Lee C, Graves DB, Lieberman MA, Hess DW. Global model of plasma chemistry in a high density oxygen discharge Journal of the Electrochemical Society. 141: 1546-1555. DOI: 10.1149/1.2054960  0.438
1994 Kilgore MD, Daugherty JE, Porteous RK, Graves DB. Transport and heating of small particles in high density plasma sources Journal of Vacuum Science & Technology B. 12: 486-493. DOI: 10.1116/1.587103  0.395
1994 Stewart RA, Vitello P, Graves DB. Two‐dimensional fluid model of high density inductively coupled plasma sources Journal of Vacuum Science & Technology B. 12: 478-485. DOI: 10.1116/1.587102  0.444
1994 Graves DB. Plasma Processing Ieee Transactions On Plasma Science. 22: 31-42. DOI: 10.1109/27.281547  0.356
1994 Han-Ming W, Graves DB, Porteous RK, Ming L. Behavior Of Ar Plasma Formed In A High Density Plasma Source–An ECR Reactor Acta Physica Sinica (Overseas Edition). 3: 746-757. DOI: 10.1088/1004-423X/3/10/004  0.367
1994 Graves DB, Daugherty JE, Kilgore MD, Porteous RK. Charging, transport and heating of particles in radiofrequency and electron cyclotron resonance plasmas Plasma Sources Science and Technology. 3: 433-441. DOI: 10.1088/0963-0252/3/3/029  0.627
1994 Porteous RK, Wu HM, Graves DB. A two-dimensional, axisymmetric model of a magnetized glow discharge plasma Plasma Sources Science and Technology. 3: 25-39. DOI: 10.1088/0963-0252/3/1/004  0.317
1994 Hargis PJ, Greenberg KE, Miller PA, Gerardo JB, Torczynski JR, Riley ME, Hebner GA, Roberts JR, Olthoff JK, Whetstone JR, Van Brunt RJ, Sobolewski MA, Anderson HM, Splichal MP, Mock JL, ... ... Graves DB, et al. The Gaseous Electronics Conference radio-frequency reference cell: A defined parallel-plate radio-frequency system for experimental and theoretical studies of plasma-processing discharges Review of Scientific Instruments. 65: 140-154. DOI: 10.1063/1.1144770  0.353
1994 Graves DB. Film deposition by plasma techniques. By Mitsuharu Konuma, Springer‐Verlag, 1992, 221 pp. Aiche Journal. 40: 1924-1924. DOI: 10.1002/Aic.690401117  0.345
1993 Graves DB, Wu H, Porteous RK. Modeling and simulation of high density plasmas Japanese Journal of Applied Physics. 32: 2999-3006. DOI: 10.1143/Jjap.32.2999  0.48
1993 Daugherty JE, Graves DB. Particulate Temperature in Radio Frequency Glow Discharges Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 11: 1126-1131. DOI: 10.1116/1.578452  0.523
1993 Kilgore MD, Daugherty JE, Porteous RK, Graves DB. Ion drag on an isolated particulate in a low-pressure discharge Journal of Applied Physics. 73: 7195-7202. DOI: 10.1063/1.352392  0.581
1992 Daugherty JE, Porteous RK, Kilgore MD, Graves DB. Sheath structure around particles in low-pressure discharges Journal of Applied Physics. 72: 3934-3942. DOI: 10.1063/1.352245  0.548
1992 Surendra M, Graves DB, Plano LS. Self-consistent dc glow-discharge simulations applied to diamond film deposition reactors Journal of Applied Physics. 71: 5189-5198. DOI: 10.1063/1.350575  0.685
1991 Surendra M, Graves DB. Electron acoustic waves in capacitively coupled, low-pressure rf glow discharges. Physical Review Letters. 66: 1469-1472. PMID 10043217 DOI: 10.1103/Physrevlett.66.1469  0.682
1991 Graves DB, Gottscho RA. Computer Applications in Plasma Materials Processing Mrs Bulletin. 16: 16-22. DOI: 10.1557/S0883769400057602  0.372
1991 Graves DB, Surendra M. Modeling and simulation of plasma processes Technical Digest - International Electron Devices Meeting, Iedm. 1991: 887-890. DOI: 10.1109/IEDM.1991.235283  0.653
1991 Porteous RK, Graves DB. Modeling and simulation of magnetically confined low-pressure plasmas in two dimensions Ieee Transactions On Plasma Science. 19: 204-213. DOI: 10.1109/27.106815  0.388
1991 Surendra M, Graves DB. Particle Simulations of Radio-Frequency Glow Discharges Ieee Transactions On Plasma Science. 19: 144-157. DOI: 10.1109/27.106808  0.698
1991 Jellum GM, Daugherty JE, Graves DB. Particle thermophoresis in low pressure glow discharges Journal of Applied Physics. 69: 6923-6934. DOI: 10.1063/1.347630  0.306
1991 Surendra M, Graves DB. Capacitively coupled glow discharges at frequencies above 13.56 MHz Applied Physics Letters. 59: 2091-2093. DOI: 10.1063/1.106112  0.691
1990 Surendra M, Graves DB, Jellum GM. Self-consistent model of a direct-current glow discharge: Treatment of fast electrons. Physical Review. A. 41: 1112-1125. PMID 9903193 DOI: 10.1103/Physreva.41.1112  0.635
1990 Jellum GM, Graves DB. Particulates in aluminum sputtering discharges Journal of Applied Physics. 67: 6490-6496. DOI: 10.1063/1.346081  0.317
1990 Surendra M, Graves DB, Morey IJ. Electron heating in low-pressure rf glow discharges Applied Physics Letters. 56: 1022-1024. DOI: 10.1063/1.102604  0.686
1989 Gottscho RA, Mitchell A, Scheller GR, Chan YY, Graves DB. Electric field reversals in dc negative glow discharges. Physical Review. A. 40: 6407-6414. PMID 9902037 DOI: 10.1103/Physreva.40.6407  0.309
1989 Graves DB. Plasma processing in microelectronics manufacturing Aiche Journal. 35: 1-29. DOI: 10.1002/Aic.690350102  0.42
1988 Gottscho RA, Scheller GR, Intrator T, Graves DB. Space–time resolved kinetics of mixed rare‐gas‐attaching gas plasmas Journal of Vacuum Science and Technology. 6: 1393-1396. DOI: 10.1116/1.575711  0.396
1988 Scheller GR, Gottscho RA, Graves DB, Intrator T. Quenching rates of Ar metastables in radio-frequency glow discharges Journal of Applied Physics. 64: 598-606. DOI: 10.1063/1.341948  0.398
1988 Scheller GR, Gottscho RA, Intrator T, Graves DB. Nonlinear excitation and dissociation kinetics in discharges through mixtures of rare and attaching gases Journal of Applied Physics. 64: 4384-4397. DOI: 10.1063/1.341287  0.39
1987 Graves DB. Fluid model simulations of a 13.56‐MHz rf discharge: Time and space dependence of rates of electron impact excitation Journal of Applied Physics. 62: 88-94. DOI: 10.1063/1.339111  0.317
1986 Graves DB, Jensen KF. Theoretical and Computational Problems in Modeling Glow Discharges Mrs Proceedings. 68. DOI: 10.1557/Proc-68-219  0.552
1986 Graves DB, Jensen KF. A Continuum Model of DC and RF Discharges Ieee Transactions On Plasma Science. 14: 78-91. DOI: 10.1109/Tps.1986.4316510  0.516
1986 Dalvie M, Jensen KF, Graves DB. Modelling of reactors for plasma processing I. Silicon etching by CF4 in a radial flow reactor Chemical Engineering Science. 41: 653-660. DOI: 10.1016/0009-2509(86)87142-1  0.489
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